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Shigeo Tanaka
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Niigata-ken, JP
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Patents Grants
last 30 patents
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Patent Grant
Positive resist compositions and patterning process
Patent number
7,638,260
Issue date
Dec 29, 2009
Shin-Etsu Chemical Co., Ltd.
Akihiro Seki
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist compositions and patterning process
Patent number
7,618,764
Issue date
Nov 17, 2009
Shin-Etsu Chemical Co., Ltd.
Shigeo Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Sulfonyldiazomethane compounds, photoacid generator, resist materia...
Patent number
7,282,316
Issue date
Oct 16, 2007
Shin-Etsu Chemical Co., Ltd.
Katsuhiro Kobayashi
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
Positive resist compositions and patterning process
Publication number
20080268370
Publication date
Oct 30, 2008
Shin-Etsu Chemical Co., Ltd.
Shigeo Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist compositions and patterning process
Publication number
20080124653
Publication date
May 29, 2008
Shin-Etsu Chemical Co., Ltd.
Akihiro Seki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist compositions and patterning process
Publication number
20080118863
Publication date
May 22, 2008
Shin-Etsu Chemical Co., Ltd.
Shigeo Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Novel sulfonyldiazomethane compounds, photoacid generator, resist m...
Publication number
20050048395
Publication date
Mar 3, 2005
Shin-Etsu Chemical Co., Ltd.
Katsuhiro Kobayashi
C07 - ORGANIC CHEMISTRY