Shigeru Hasebe

Person

Oita, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Dimension assurance of mask using plurality of types of pattern amb...
- Patent number 8,336,004
- Issue date Dec 18, 2012
- Kabushiki Kaisha Toshiba
- Shigeki Nojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure quantity calculating system using the exp...
- Patent number 7,575,835
- Issue date Aug 18, 2009
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of creating predictive model, method of managing process ste...
- Patent number 7,473,495
- Issue date Jan 6, 2009
- Kabushiki Kaisha Toshiba
- Satoshi Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Projection exposure mask acceptance decision system, projection exp...
- Patent number 7,446,852
- Issue date Nov 4, 2008
- Kabushiki Kaisha Toshiba
- Yukiyasu Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure quantity calculating system using the exp...
- Patent number 7,118,834
- Issue date Oct 10, 2006
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a photo mask and method of manufacturing a...
- Patent number 7,090,949
- Issue date Aug 15, 2006
- Kabushiki Kaisha Toshiba
- Shigeki Nojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming photomask and method of manufacturing semiconduct...
- Patent number 6,333,213
- Issue date Dec 25, 2001
- Kabushiki Kaisha Toshiba
- Shigeru Hasebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DEFECT INSPECTION SUPPORTING APPARATUS AND DEFECT INSPECTION SUPPOR...
- Publication number 20120198404
- Publication date Aug 2, 2012
- Kabushiki Kaisha Toshiba
- Shigeru HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120192127
- Publication date Jul 26, 2012
- Kabushiki Kaisha Toshiba
- Satoshi USUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK VERIFYING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE...
- Publication number 20110201138
- Publication date Aug 18, 2011
- Shigeki Nojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure mask acceptance decision system, projection exp...
- Publication number 20070182941
- Publication date Aug 9, 2007
- Yukiyasu Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, exposure quantity calculating system using the exp...
- Publication number 20060292460
- Publication date Dec 28, 2006
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern extracting system, method for extracting measuring points,...
- Publication number 20060190875
- Publication date Aug 24, 2006
- Yukiyasu Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of creating predictive model, method of managing process ste...
- Publication number 20050089768
- Publication date Apr 28, 2005
- Satoshi Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Exposure method, exposure quantity calculating system using the exp...
- Publication number 20040253553
- Publication date Dec 16, 2004
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing a photo mask and method of manufacturing a...
- Publication number 20040146788
- Publication date Jul 29, 2004
- Shigeki Nojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming photomask and method of manufacturing semiconduct...
- Publication number 20010005619
- Publication date Jun 28, 2001
- Kabushiki Kaisha Toshiba
- Shigeru Hasebe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Shigeru Hasebe

Person

Patents Grantslast 30 patents

Dimension assurance of mask using plurality of types of pattern amb...

Exposure method, exposure quantity calculating system using the exp...

Method of creating predictive model, method of managing process ste...

Projection exposure mask acceptance decision system, projection exp...

Exposure method, exposure quantity calculating system using the exp...

Method of manufacturing a photo mask and method of manufacturing a...

Method of forming photomask and method of manufacturing semiconduct...

Patents Applicationslast 30 patents

DEFECT INSPECTION SUPPORTING APPARATUS AND DEFECT INSPECTION SUPPOR...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

MASK VERIFYING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE...

Projection exposure mask acceptance decision system, projection exp...

Exposure method, exposure quantity calculating system using the exp...

Pattern extracting system, method for extracting measuring points,...

Method of creating predictive model, method of managing process ste...

Exposure method, exposure quantity calculating system using the exp...

Method of manufacturing a photo mask and method of manufacturing a...

Method of forming photomask and method of manufacturing semiconduct...