Shigeru Maruyama

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,646,275
- Issue date Nov 11, 2003
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,486,479
- Issue date Nov 26, 2002
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for exposing an exposure pattern on an object by...
- Patent number 6,118,129
- Issue date Sep 12, 2000
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,977,548
- Issue date Nov 2, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system
- Patent number 5,920,077
- Issue date Jul 6, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Transmission mask for charged particle beam exposure apparatuses, a...
- Patent number 5,814,423
- Issue date Sep 29, 1998
- Fujitsu Limited
- Shigeru Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,614,725
- Issue date Mar 25, 1997
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,528,048
- Issue date Jun 18, 1996
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment of mask and semiconductor wafer using linear Fresnel zone...
- Patent number 4,999,487
- Issue date Mar 12, 1991
- Fujitsu Limited
- Shigeru Maruyama
- G02 - OPTICS
Information Patent Grant
Alignment of mask and semiconductor wafer using linear fresnel zone...
- Patent number 4,948,983
- Issue date Aug 14, 1990
- Fujitsu Limited
- Shigeru Maruyama
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Charged particle beam exposure system and method
- Publication number 20030025088
- Publication date Feb 6, 2003
- FUJITSU LIMITED
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY

Shigeru Maruyama

Person

Patents Grantslast 30 patents

Charged particle beam exposure system and method

Charged particle beam exposure system and method

Method and system for exposing an exposure pattern on an object by...

Charged particle beam exposure system and method

Charged particle beam exposure system

Transmission mask for charged particle beam exposure apparatuses, a...

Charged particle beam exposure system and method

Charged particle beam exposure system and method

Alignment of mask and semiconductor wafer using linear Fresnel zone...

Alignment of mask and semiconductor wafer using linear fresnel zone...

Patents Applicationslast 30 patents

Charged particle beam exposure system and method