Shigeru Nishimatsu

Person

Kokubunji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Surface analyzing method and apparatus
- Patent number 5,220,169
- Issue date Jun 15, 1993
- Hitachi, Ltd.
- Ken Ninomiya
- G01 - MEASURING TESTING
Information Patent Grant
Method of semiconductor surface measurment and an apparatus for rea...
- Patent number 5,140,272
- Issue date Aug 18, 1992
- Hitachi, Ltd.
- Shigeru Nishimatsu
- G01 - MEASURING TESTING
Information Patent Grant
Surface analysis method and apparatus
- Patent number 5,138,158
- Issue date Aug 11, 1992
- Hitachi, Ltd.
- Ken Ninomiya
- G01 - MEASURING TESTING
Information Patent Grant
Surface treatment method
- Patent number 5,108,778
- Issue date Apr 28, 1992
- Hitachi, Ltd.
- Keizo Suzuki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of surface treatment
- Patent number 5,108,543
- Issue date Apr 28, 1992
- Hitachi, Ltd.
- Keizo Suzuki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Surface analysis method and a device therefor
- Patent number 5,028,778
- Issue date Jul 2, 1991
- Hitachi, Ltd.
- Ken Ninomiya
- G01 - MEASURING TESTING
Information Patent Grant
Surface treatment apparatus
- Patent number 4,901,667
- Issue date Feb 20, 1990
- Hitachi, Ltd.
- Keizo Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treatment and apparatus therefor
- Patent number 4,886,571
- Issue date Dec 12, 1989
- Hitachi, Ltd.
- Keizo Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Laser surface treatment method and apparatus for practicing same
- Patent number 4,828,874
- Issue date May 9, 1989
- Hitachi, Ltd.
- Susumu Hiraoka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for microwave plasma processing
- Patent number 4,705,595
- Issue date Nov 10, 1987
- Hitachi, Ltd.
- Sadayuki Okudaira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-processing apparatus
- Patent number 4,624,214
- Issue date Nov 25, 1986
- Hitachi, Ltd.
- Keizo Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for monitoring etching
- Patent number 4,609,426
- Issue date Sep 2, 1986
- Hitachi, Ltd.
- Yoshifumi Ogawa
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for surface treatment by plasma
- Patent number 4,579,623
- Issue date Apr 1, 1986
- Hitachi, Ltd.
- Keizo Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma etching apparatus
- Patent number 4,559,100
- Issue date Dec 17, 1985
- Hitachi, Ltd.
- Ken Ninomiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment apparatus
- Patent number 4,522,674
- Issue date Jun 11, 1985
- Hitachi, Ltd.
- Ken Ninomiya
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for growing silicon-including film by employing plasma depos...
- Patent number 4,481,229
- Issue date Nov 6, 1984
- Hitachi, Ltd.
- Keizo Suzuki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Microwave plasma etching
- Patent number 4,462,863
- Issue date Jul 31, 1984
- Hitachi, Ltd.
- Shigeru Nishimatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with multi-layered electrodes
- Patent number 4,451,841
- Issue date May 29, 1984
- Hitachi, Ltd.
- Ryoichi Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform etching of silicon (doped and undoped) utilizing ions
- Patent number 4,436,581
- Issue date Mar 13, 1984
- Hitachi, Ltd.
- Sadayuki Okudaira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source
- Patent number 4,433,228
- Issue date Feb 21, 1984
- Hitachi, Ltd.
- Shigeru Nishimatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma etching apparatus having fan-shaped discharge
- Patent number 4,430,138
- Issue date Feb 7, 1984
- Hitachi, Ltd.
- Keizo Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making a memory device
- Patent number 4,361,949
- Issue date Dec 7, 1982
- Hitachi, Ltd.
- Ryoichi Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for plasma etching
- Patent number 4,330,384
- Issue date May 18, 1982
- Hitachi, Ltd.
- Sadayuki Okudaira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching apparatus
- Patent number 4,298,419
- Issue date Nov 3, 1981
- Hitachi, Ltd.
- Keizo Suzuki
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Semiconductor device and process for making the same
- Patent number 4,270,262
- Issue date Jun 2, 1981
- Hitachi, Ltd.
- Ryoichi Hori
- H01 - BASIC ELECTRIC ELEMENTS

Shigeru Nishimatsu

Person

Patents Grantslast 30 patents

Surface analyzing method and apparatus

Method of semiconductor surface measurment and an apparatus for rea...

Surface analysis method and apparatus

Surface treatment method

Method of surface treatment

Surface analysis method and a device therefor

Surface treatment apparatus

Surface treatment and apparatus therefor

Laser surface treatment method and apparatus for practicing same

Method for microwave plasma processing

Dry-processing apparatus

Method and apparatus for monitoring etching

Method and apparatus for surface treatment by plasma

Microwave plasma etching apparatus

Surface treatment apparatus

Method for growing silicon-including film by employing plasma depos...

Microwave plasma etching

Semiconductor device with multi-layered electrodes

Uniform etching of silicon (doped and undoped) utilizing ions

Microwave plasma source

Microwave plasma etching apparatus having fan-shaped discharge

Process for making a memory device

Process for plasma etching

Dry etching apparatus

Semiconductor device and process for making the same