Shigeru Nobe

Person

Hitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing agent and method for polishing substrate using the polish...
- Patent number 10,040,971
- Issue date Aug 7, 2018
- Hitachi Chemical Company, Ltd.
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Grant
Photosensitive resin composition, method for producing patterned cu...
- Patent number 9,633,848
- Issue date Apr 25, 2017
- Hitachi Chemical Company, Ltd.
- Yu Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for manufacturing patterne...
- Patent number 9,395,626
- Issue date Jul 19, 2016
- Hitachi Chemical Company, Ltd.
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polishing agent and method for polishing substrate using the polish...
- Patent number 9,165,777
- Issue date Oct 20, 2015
- Hitachi Chemical Company, Ltd.
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing agent and method for polishing substrate using the polish...
- Patent number 9,129,900
- Issue date Sep 8, 2015
- Hitachi Chemical Company, Ltd.
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing solution for CMP and polishing method using the polishing...
- Patent number 9,022,834
- Issue date May 5, 2015
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry for metal films and polishing method
- Patent number 8,901,002
- Issue date Dec 2, 2014
- Hitachi Chemical Company, Ltd.
- Takaaki Tanaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive photosensitive resin composition, method of creating resis...
- Patent number 8,836,089
- Issue date Sep 16, 2014
- Hitachi Chemical Company, Ltd.
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal polishing slurry and polishing method
- Patent number 8,821,750
- Issue date Sep 2, 2014
- Hitachi Chemical Co., Ltd.
- Jin Amanokura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing agent and method for polishing substrate using the polish...
- Patent number 8,617,275
- Issue date Dec 31, 2013
- Hitachi Chemical Company, Ltd.
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing slurry for metal films and polishing method
- Patent number 8,609,541
- Issue date Dec 17, 2013
- Hitachi Chemical Co., Ltd.
- Takaaki Tanaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing solution for CMP and polishing method using the polishing...
- Patent number 8,592,317
- Issue date Nov 26, 2013
- Hitachi Chemical Co., Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silica based coating film, silica based coa...
- Patent number 7,687,590
- Issue date Mar 30, 2010
- Hitachi Chemical Company, Ltd.
- Haruaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silica based coating film, silica based coa...
- Patent number 7,682,701
- Issue date Mar 23, 2010
- Hitachi Chemical Co., Ltd.
- Haruaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silica based coating film, silica based coa...
- Patent number 7,358,300
- Issue date Apr 15, 2008
- Hitachi Chemical Co., Ltd.
- Haruaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
POLISHING SLURRY FOR CMP AND POLISHING METHOD
- Publication number 20170267895
- Publication date Sep 21, 2017
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...
- Publication number 20170009102
- Publication date Jan 12, 2017
- Hitachi Chemical Company, Ltd.
- Yousuke HOSHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...
- Publication number 20150361303
- Publication date Dec 17, 2015
- Hitachi Chemical Company, Ltd.
- Yousuke HOSHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CU...
- Publication number 20150325431
- Publication date Nov 12, 2015
- Hitachi Chemical Company, Ltd.
- Yu AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING SLURRY FOR CMP AND POLISHING METHOD
- Publication number 20150315419
- Publication date Nov 5, 2015
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNE...
- Publication number 20140322635
- Publication date Oct 30, 2014
- Hitachi Chemical Company, Ltd.
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLISHING SLURRY FOR CMP AND POLISHING METHOD
- Publication number 20140065825
- Publication date Mar 6, 2014
- HITACHI CHEMICAL CO., Ltd.
- Takashi Shinoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD
- Publication number 20140065826
- Publication date Mar 6, 2014
- HITACHI CHEMICAL CO., Ltd.
- Takaaki Tanaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...
- Publication number 20130252426
- Publication date Sep 26, 2013
- Hitachi Chemical Company, Ltd.
- Yousuke HOSHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIS...
- Publication number 20130168859
- Publication date Jul 4, 2013
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...
- Publication number 20110275285
- Publication date Nov 10, 2011
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...
- Publication number 20110275217
- Publication date Nov 10, 2011
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLSHI...
- Publication number 20110039475
- Publication date Feb 17, 2011
- Yousuke Hoshi
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD
- Publication number 20110009033
- Publication date Jan 13, 2011
- HITACHI CHEMICAL CO., Ltd.
- Takaaki Tanaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL POLISHING SLURRY AND POLISHING METHOD
- Publication number 20100120250
- Publication date May 13, 2010
- HITACHI CHEMICAL CO., Ltd.
- Jin Amanokura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLISHING SLURRY FOR CMP
- Publication number 20090283715
- Publication date Nov 19, 2009
- Shigeru Nobe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP Polishing Liquid and Polishing Method
- Publication number 20090094901
- Publication date Apr 16, 2009
- Hitachi Chemical Co. Ltd.
- Takashi Shinoda
- B24 - GRINDING POLISHING
Information Patent Application
Polishing slurry for CMP and polishing method
- Publication number 20070117394
- Publication date May 24, 2007
- HITACHI CHEMICAL CO., Ltd.
- Takashi Shinoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition, methods for forming low-permittivity film using the co...
- Publication number 20060199021
- Publication date Sep 7, 2006
- Takenori Narita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming silica based coating film, silica based coa...
- Publication number 20060052566
- Publication date Mar 9, 2006
- HITACHI CHEMICAL CO., Ltd.
- Haruaki Sakurai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for forming silica based coating film, silica based coa...
- Publication number 20050255326
- Publication date Nov 17, 2005
- HITACHI CHEMICAL CO., Ltd.
- Haruaki Sakurai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for forming silica based coating film, silica based coa...
- Publication number 20050119394
- Publication date Jun 2, 2005
- Haruaki Sakurai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition, methods for forming low-permittivity film using the co...
- Publication number 20040253462
- Publication date Dec 16, 2004
- HITACHI CHEMICAL CO., Ltd.
- Takenori Narita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Shigeru Nobe

Person

Patents Grantslast 30 patents

Polishing agent and method for polishing substrate using the polish...

Photosensitive resin composition, method for producing patterned cu...

Photosensitive resin composition, method for manufacturing patterne...

Polishing agent and method for polishing substrate using the polish...

Polishing agent and method for polishing substrate using the polish...

Polishing solution for CMP and polishing method using the polishing...

Polishing slurry for metal films and polishing method

Positive photosensitive resin composition, method of creating resis...

Metal polishing slurry and polishing method

Polishing agent and method for polishing substrate using the polish...

Polishing slurry for metal films and polishing method

Polishing solution for CMP and polishing method using the polishing...

Composition for forming silica based coating film, silica based coa...

Composition for forming silica based coating film, silica based coa...

Composition for forming silica based coating film, silica based coa...

Patents Applicationslast 30 patents

POLISHING SLURRY FOR CMP AND POLISHING METHOD

POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...

POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CU...

POLISHING SLURRY FOR CMP AND POLISHING METHOD

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNE...

POLISHING SLURRY FOR CMP AND POLISHING METHOD

POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD

POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLISH...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIS...

POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...

POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...

POLISHING AGENT AND METHOD FOR POLISHING SUBSTRATE USING THE POLSHI...

POLISHING SLURRY FOR METAL FILMS AND POLISHING METHOD

METAL POLISHING SLURRY AND POLISHING METHOD

POLISHING SLURRY FOR CMP

CMP Polishing Liquid and Polishing Method

Polishing slurry for CMP and polishing method

Composition, methods for forming low-permittivity film using the co...

Composition for forming silica based coating film, silica based coa...

Composition for forming silica based coating film, silica based coa...

Composition for forming silica based coating film, silica based coa...

Composition, methods for forming low-permittivity film using the co...