Shigeru SHIRAYONE

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for releasing sample and plasma processing apparatus using same
- Patent number 10,490,412
- Issue date Nov 26, 2019
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,395,935
- Issue date Aug 27, 2019
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,941,133
- Issue date Apr 10, 2018
- Hitachi High-Technologies Corporation
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,607,874
- Issue date Mar 28, 2017
- Hitachi High-Technologies Corporation
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and vacuum processing method of sample
- Patent number 7,947,189
- Issue date May 24, 2011
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20200058511
- Publication date Feb 20, 2020
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190333772
- Publication date Oct 31, 2019
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180190502
- Publication date Jul 5, 2018
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME
- Publication number 20170194157
- Publication date Jul 6, 2017
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160336185
- Publication date Nov 17, 2016
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160172161
- Publication date Jun 16, 2016
- Hitachi High-Technologies Corporation
- Kazuyuki IKENAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160079043
- Publication date Mar 17, 2016
- Hitachi High-Technologies Corporation
- Hiroyuki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160027615
- Publication date Jan 28, 2016
- Hitachi High-Technologies Corporation
- Masaki ISHIGURO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100193130
- Publication date Aug 5, 2010
- Masatoshi KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum prcessing apparatus and vacuum processing method of sample
- Publication number 20090000741
- Publication date Jan 1, 2009
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum Processing Apparatus And Vacuum Processing Method Of Sample
- Publication number 20070170149
- Publication date Jul 26, 2007
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus and vacuum processing method of sample
- Publication number 20060237391
- Publication date Oct 26, 2006
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shigeru SHIRAYONE

Person

Patents Grantslast 30 patents

Method for releasing sample and plasma processing apparatus using same

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Vacuum processing apparatus and vacuum processing method of sample

Patents Applicationslast 30 patents

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR RELEASING SAMPLE AND PLASMA PROCESSING APPARATUS USING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Vacuum prcessing apparatus and vacuum processing method of sample

Vacuum Processing Apparatus And Vacuum Processing Method Of Sample

Vacuum processing apparatus and vacuum processing method of sample