Shigeru Tahara

Person

  • Nirashaki-shi, JP

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    Selective Etching with Fluorine, Oxygen and Noble Gas Containing Pl...

    • Publication number 20220199418
    • Publication date Jun 23, 2022
    • TOKYO ELECTRON LIMITED
    • Du Zhang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD AND ETCHING APPARATUS

    • Publication number 20220102160
    • Publication date Mar 31, 2022
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING OXIDE SEMICONDUCTOR FILM AND PLASMA PROCESSING A...

    • Publication number 20210242036
    • Publication date Aug 5, 2021
    • TOKYO ELECTRON LIMITED
    • Masahiro YAMAZAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD

    • Publication number 20210028356
    • Publication date Jan 28, 2021
    • TOKYO ELECTRON LIMITED
    • Ken ANDO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS, PROCESSING SYSTEM, AND METHOD OF ETCHI...

    • Publication number 20200411293
    • Publication date Dec 31, 2020
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD

    • Publication number 20200402814
    • Publication date Dec 24, 2020
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF ETCHING POROUS FILM

    • Publication number 20200395221
    • Publication date Dec 17, 2020
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD

    • Publication number 20200381264
    • Publication date Dec 3, 2020
    • TOKYO ELECTRON LIMITED
    • Koichi YATSUDA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    POROUS FILM SEALING METHOD AND POROUS FILM SEALING MATERIAL

    • Publication number 20200010630
    • Publication date Jan 9, 2020
    • L'Air Liquide, Société Anonyme pour I'Etude et I'xpoloitation des Procédés Ge...
    • Keiichiro URABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD

    • Publication number 20190295856
    • Publication date Sep 26, 2019
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING COPPER LAYER

    • Publication number 20190272997
    • Publication date Sep 5, 2019
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA ETCHING APPARATUS AND METHOD

    • Publication number 20190115192
    • Publication date Apr 18, 2019
    • TOKYO ELECTRON LIMITED
    • Akira KOSHIISHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF ETCHING POROUS FILM

    • Publication number 20180082823
    • Publication date Mar 22, 2018
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING MAGNETIC LAYER

    • Publication number 20180033958
    • Publication date Feb 1, 2018
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF PROCESSING WORKPIECE

    • Publication number 20170133206
    • Publication date May 11, 2017
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR CLEANING A PROCESS CHAMBER

    • Publication number 20170069472
    • Publication date Mar 9, 2017
    • IMEC vzw
    • Shigeru TAHARA
    • B08 - CLEANING
  • Information Patent Application

    METHOD OF ETCHING POROUS FILM

    • Publication number 20160307732
    • Publication date Oct 20, 2016
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF PROCESSING TARGET OBJECT TO BE PROCESSED

    • Publication number 20160307734
    • Publication date Oct 20, 2016
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DEPOSIT REMOVING METHOD AND GAS PROCESSING APPARATUS

    • Publication number 20150064925
    • Publication date Mar 5, 2015
    • TOKYO ELECTRON LIMITED
    • Shigeru TAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING APPARATUS AND METHOD

    • Publication number 20150000843
    • Publication date Jan 1, 2015
    • TOKYO ELECTRON LIMITED
    • Akira KOSHIISHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR ETCHING POROUS ORGANOSILICA LOW-K MATERIALS

    • Publication number 20140291289
    • Publication date Oct 2, 2014
    • TOKYO ELECTRON LIMITED
    • Frederic LAZZARINO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEPOSIT REMOVAL METHOD

    • Publication number 20140206198
    • Publication date Jul 24, 2014
    • KABUSHIKI KAISHA TOSHIBA
    • Shigeru TAHARA
    • B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
  • Information Patent Application

    Etching Method Using Block-Copolymers

    • Publication number 20140131839
    • Publication date May 15, 2014
    • TOKYO ELECTRON LIMITED
    • Boon Teik Chan
    • B82 - NANO-TECHNOLOGY
  • Information Patent Application

    Etching of Block-Copolymers

    • Publication number 20140091435
    • Publication date Apr 3, 2014
    • TOKYO ELECTRON LIMITED
    • Boon Teik Chan
    • B81 - MICRO-STRUCTURAL TECHNOLOGY
  • Information Patent Application

    DEPOSIT REMOVAL METHOD

    • Publication number 20140083979
    • Publication date Mar 27, 2014
    • TOKYO ELECTRON LIMITED
    • Shigeru Tahara
    • B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
  • Information Patent Application

    ETCHING APPARATUS

    • Publication number 20130118688
    • Publication date May 16, 2013
    • TOKYO ELECTRON LIMITED
    • Shigeru Tahara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROCESSING CONDITION INSPECTION AND OPTIMIZATION METHOD OF DAMAGE R...

    • Publication number 20130025537
    • Publication date Jan 31, 2013
    • Reiko SASAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CLEANING METHOD OF PLASMA PROCESSING APPARATUS AND PLASMA PROCESSIN...

    • Publication number 20120270406
    • Publication date Oct 25, 2012
    • TOKYO ELECTRON LIMITED
    • Shigeru Tahara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    • Publication number 20120190207
    • Publication date Jul 26, 2012
    • TOKYO ELECTRON LIMITED
    • Eiichi NISHIMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING APPARATUS

    • Publication number 20120160416
    • Publication date Jun 28, 2012
    • TOKYO ELECTRON LIMITED
    • Shigeru Tahara
    • H01 - BASIC ELECTRIC ELEMENTS