Shigeru Yokoi

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming resist pattern and negative resist composition
- Patent number 8,859,187
- Issue date Oct 14, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping solution and a method of stripping photoresis...
- Patent number 8,697,345
- Issue date Apr 15, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning liquid used in photolithography and a method for treating...
- Patent number 8,685,910
- Issue date Apr 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for stripping photoresist
- Patent number 8,354,215
- Issue date Jan 15, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid for lithography and method for forming wiring
- Patent number 8,354,365
- Issue date Jan 15, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ohhashi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist stripping solution and a method of stripping photoresis...
- Patent number 8,192,923
- Issue date Jun 5, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid used in process for forming dual damascene structur...
- Patent number 8,158,568
- Issue date Apr 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist stripping solution
- Patent number 8,114,825
- Issue date Feb 14, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Material for formation of protective film, method for formation of...
- Patent number 8,097,397
- Issue date Jan 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning composition and method of cleaning semiconductor substrate
- Patent number 7,442,675
- Issue date Oct 28, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Liquid coating composition for forming a top antireflective film an...
- Patent number 7,129,020
- Issue date Oct 31, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for processing coating film and method for manufacturing sem...
- Patent number 6,746,963
- Issue date Jun 8, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for lithographic anti-reflection coating, and resist la...
- Patent number 6,416,930
- Issue date Jul 9, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING
- Publication number 20110195573
- Publication date Aug 11, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ohhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR STRIPPING PHOTORESIST
- Publication number 20110000874
- Publication date Jan 6, 2011
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING LIQUID USED IN PHOTOLITHOGRAPHY AND A METHOD FOR TREATING...
- Publication number 20100304312
- Publication date Dec 2, 2010
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid used in process for forming dual damascene structur...
- Publication number 20100248477
- Publication date Sep 30, 2010
- Shigeru Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20100190112
- Publication date Jul 29, 2010
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20100112495
- Publication date May 6, 2010
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF...
- Publication number 20100086879
- Publication date Apr 8, 2010
- Toshikazu Takayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid used in process for forming dual damascene structur...
- Publication number 20100051582
- Publication date Mar 4, 2010
- Shigeru Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treating liquid for photoresist removal and method for treating sub...
- Publication number 20100056411
- Publication date Mar 4, 2010
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution
- Publication number 20100022426
- Publication date Jan 28, 2010
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Method for stripping photoresist
- Publication number 20090291565
- Publication date Nov 26, 2009
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND NEGATIVE RESIST COMPOSITION
- Publication number 20090191478
- Publication date Jul 30, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treating liquid for photoresist removal, and method for treating su...
- Publication number 20090176677
- Publication date Jul 9, 2009
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid used in process for forming dual damascene structur...
- Publication number 20090156005
- Publication date Jun 18, 2009
- Shigeru Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for stripping photoresist
- Publication number 20080280452
- Publication date Nov 13, 2008
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20080241758
- Publication date Oct 2, 2008
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treating liquid for photoresist removal, and method for treating su...
- Publication number 20080242575
- Publication date Oct 2, 2008
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20080011714
- Publication date Jan 17, 2008
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for stripping photoresist
- Publication number 20070298619
- Publication date Dec 27, 2007
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20070243494
- Publication date Oct 18, 2007
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and method of treating substrate wit...
- Publication number 20070105035
- Publication date May 10, 2007
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution
- Publication number 20070078072
- Publication date Apr 5, 2007
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20070037087
- Publication date Feb 15, 2007
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid used in photolithography and a method for treating...
- Publication number 20070027052
- Publication date Feb 1, 2007
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20070003859
- Publication date Jan 4, 2007
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20070004933
- Publication date Jan 4, 2007
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid used in process for forming dual damascene structur...
- Publication number 20060241012
- Publication date Oct 26, 2006
- Shigeru Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treating liquid for photoresist removal, and method for treating su...
- Publication number 20060110690
- Publication date May 25, 2006
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and method of treating substrate wit...
- Publication number 20060063688
- Publication date Mar 23, 2006
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and a method of stripping photoresis...
- Publication number 20060035176
- Publication date Feb 16, 2006
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shigeru Yokoi

Person

Patents Grantslast 30 patents

Method of forming resist pattern and negative resist composition

Photoresist stripping solution and a method of stripping photoresis...

Cleaning liquid used in photolithography and a method for treating...

Method for stripping photoresist

Cleaning liquid for lithography and method for forming wiring

Photoresist stripping solution and a method of stripping photoresis...

Cleaning liquid used in process for forming dual damascene structur...

Photoresist stripping solution

Material for formation of protective film, method for formation of...

Cleaning composition and method of cleaning semiconductor substrate

Liquid coating composition for forming a top antireflective film an...

Method for processing coating film and method for manufacturing sem...

Composition for lithographic anti-reflection coating, and resist la...

Patents Applicationslast 30 patents

CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING

METHOD FOR STRIPPING PHOTORESIST

CLEANING LIQUID USED IN PHOTOLITHOGRAPHY AND A METHOD FOR TREATING...

Cleaning liquid used in process for forming dual damascene structur...

Photoresist stripping solution and a method of stripping photoresis...

Photoresist stripping solution and a method of stripping photoresis...

MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF...

Cleaning liquid used in process for forming dual damascene structur...

Treating liquid for photoresist removal and method for treating sub...

Photoresist stripping solution

Method for stripping photoresist

METHOD OF FORMING RESIST PATTERN AND NEGATIVE RESIST COMPOSITION

Treating liquid for photoresist removal, and method for treating su...

Cleaning liquid used in process for forming dual damascene structur...

Method for stripping photoresist

Photoresist stripping solution and a method of stripping photoresis...

Treating liquid for photoresist removal, and method for treating su...

Photoresist stripping solution and a method of stripping photoresis...

Method for stripping photoresist

Photoresist stripping solution and a method of stripping photoresis...

Photoresist stripping solution and method of treating substrate wit...

Photoresist stripping solution

Photoresist stripping solution and a method of stripping photoresis...

Cleaning liquid used in photolithography and a method for treating...

Photoresist stripping solution and a method of stripping photoresis...

Photoresist stripping solution and a method of stripping photoresis...

Cleaning liquid used in process for forming dual damascene structur...

Treating liquid for photoresist removal, and method for treating su...

Photoresist stripping solution and method of treating substrate wit...

Photoresist stripping solution and a method of stripping photoresis...