Shigeyuki Onizawa

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming low-carbon CVD film for filling trenches
- Patent number 8,765,233
- Issue date Jul 1, 2014
- ASM Japan K.K.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of tailoring conformality of Si-containing film
- Patent number 8,669,185
- Issue date Mar 11, 2014
- ASM Japan K.K.
- Shigeyuki Onizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF TAILORING CONFORMALITY OF Si-CONTAINING FILM
- Publication number 20120028469
- Publication date Feb 2, 2012
- ASM JAPAN K.K.
- Shigeyuki Onizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING LOW-CARBON CVD FILM FOR FILLING TRENCHES
- Publication number 20100143609
- Publication date Jun 10, 2010
- ASM JAPAN K.K.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...