Shiho Sasaki

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Tokyo-to, JP

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Patents Grantslast 30 patents

Information Patent Grant
Post exposure modification of critical dimensions in mask fabrication
- Patent number 7,045,259
- Issue date May 16, 2006
- Intel Corporation
- Takeshi Ohfuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post exposure modification of critical dimensions in mask fabrication
- Patent number 7,045,260
- Issue date May 16, 2006
- Intel Corporation
- Takeshi Ohfuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post exposure modification of critical dimensions in mask fabrication
- Patent number 6,801,295
- Issue date Oct 5, 2004
- Intel Corporation
- Hiroyuki Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Post exposure modification of critical dimensions in mask fabrication
- Publication number 20040197713
- Publication date Oct 7, 2004
- Takeshi Ohfuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing resist pattern
- Publication number 20030194619
- Publication date Oct 16, 2003
- Shiho Sasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of photomask
- Publication number 20030143472
- Publication date Jul 31, 2003
- Yasuhiro Koizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post exposure modification of critical dimensions in mask fabrication
- Publication number 20030059688
- Publication date Mar 27, 2003
- Hiroyuki Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post exposure modification of critical dimensions in mask fabrication
- Publication number 20030059719
- Publication date Mar 27, 2003
- Takeshi Ohfuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY