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Shimao Yoneyama
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Yamanashi, JP
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last 30 patents
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Patent Grant
Process depending on plasma discharges sustained by inductive coupling
Patent number
6,858,112
Issue date
Feb 22, 2005
Hitachi Kokusai Electric Co., Ltd.
Daniel L. Flamm
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Patent Grant
High frequency plasma process wherein the plasma is executed by an...
Patent number
5,965,034
Issue date
Oct 12, 1999
M. C. Electronics Co., Ltd.
Georgy Vinogradov
H01 - BASIC ELECTRIC ELEMENTS