Shin Hirotsu

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,830,704
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,574,798
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 10,672,589
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching etching target layer
- Patent number 9,418,863
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Shin Hirotsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching insulation film
- Patent number 9,312,105
- Issue date Apr 12, 2016
- Tokyo Electron Limited
- Akira Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device and storage medium
- Patent number 8,097,534
- Issue date Jan 17, 2012
- Tokyo Electron Limited
- Shuhei Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and computer readable storage medium
- Patent number 7,943,523
- Issue date May 17, 2011
- Tokyo Electron Limited
- Shin Hirotsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method, plasma etching apparatus, control program an...
- Patent number 7,465,670
- Issue date Dec 16, 2008
- Tokyo Electron Limited
- Shin Hirotsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20230162946
- Publication date May 25, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20200273670
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20200118794
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING INSULATION FILM
- Publication number 20150371830
- Publication date Dec 24, 2015
- TOKYO ELECTRON LIMITED
- Akira TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING ETCHING TARGET LAYER
- Publication number 20150332932
- Publication date Nov 19, 2015
- TOKYO ELECTRON LIMITED
- Shin HIROTSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device and storage medium
- Publication number 20090047794
- Publication date Feb 19, 2009
- TOKYO ELECTRON LIMITED
- Shuhei Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND COMPUTER READABLE STORAGE MEDIUM
- Publication number 20080045031
- Publication date Feb 21, 2008
- TOKYO ELECTRON LIMITED
- Shin HIROTSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device and plasma processing...
- Publication number 20080020584
- Publication date Jan 24, 2008
- Shin Hirotsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method, plasma etching apparatus, control program an...
- Publication number 20060213866
- Publication date Sep 28, 2006
- TOKYO ELECTRON LIMITED
- Shin Hirotsu
- H01 - BASIC ELECTRIC ELEMENTS

Shin Hirotsu

Person

Patents Grantslast 30 patents

Plasma processing apparatus and control method

Plasma processing apparatus and control method

Plasma processing apparatus and control method

Method for etching etching target layer

Method for etching insulation film

Method for manufacturing semiconductor device and storage medium

Plasma etching method and computer readable storage medium

Plasma etching method, plasma etching apparatus, control program an...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

METHOD FOR ETCHING INSULATION FILM

METHOD FOR ETCHING ETCHING TARGET LAYER

Method for manufacturing semiconductor device and storage medium

PLASMA ETCHING METHOD AND COMPUTER READABLE STORAGE MEDIUM

Method of manufacturing semiconductor device and plasma processing...

Plasma etching method, plasma etching apparatus, control program an...