Shin MATSUURA

Person

Kurokawa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and transfer method
- Patent number 12,165,893
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,068,139
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method of driving relay member
- Patent number 12,027,346
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and edge ring replacement method
- Patent number 11,901,163
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Shin Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,152,196
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Shin Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pin control method and substrate processing apparatus
- Patent number 10,910,251
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Shin Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Condensation suppressing method and processing apparatus
- Patent number 10,866,017
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Shin Matsuura
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Plasma processing apparatus and upper electrode assembly
- Patent number 10,811,234
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substratre delivery method and substrate processing apparatus
- Patent number 10,777,435
- Issue date Sep 15, 2020
- Tokyo Electron Limited
- Shin Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pin control method
- Patent number 10,438,834
- Issue date Oct 8, 2019
- Tokyo Electron Limited
- Shin Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and upper electrode assembly
- Patent number 9,941,101
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and upper electrode assembly
- Patent number 9,773,647
- Issue date Sep 26, 2017
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method, and non-tran...
- Patent number 9,396,964
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Shin Matsuura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,173,036
- Issue date May 8, 2012
- Tokyo Electron Limited
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240371609
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD
- Publication number 20240234102
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD
- Publication number 20240136158
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230317425
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Ryoya ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD
- Publication number 20230215753
- Publication date Jul 6, 2023
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND RING REPLACEMEN...
- Publication number 20230178417
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM AND METHOD OF MOUNTING ANNULAR MEMBER
- Publication number 20220310366
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220122816
- Publication date Apr 21, 2022
- TOKYO ELECTRON LIMITED
- Nobutaka SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF DRIVING RELAY MEMBER
- Publication number 20220037125
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Nobutaka SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD
- Publication number 20210280395
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT, PLASMA PROCESSING SYSTEM, AND METHOD OF PLACING...
- Publication number 20210280396
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDENSATION SUPPRESSING METHOD AND PROCESSING APPARATUS
- Publication number 20190310002
- Publication date Oct 10, 2019
- TOKYO ELECTRON LIMITED
- Shin Matsuura
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Application
PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190287844
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATRE DELIVERY METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180350644
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180301369
- Publication date Oct 18, 2018
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND UPPER ELECTRODE ASSEMBLY
- Publication number 20180240650
- Publication date Aug 23, 2018
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180061619
- Publication date Mar 1, 2018
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170213707
- Publication date Jul 27, 2017
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND UPPER ELECTRODE ASSEMBLY
- Publication number 20160013028
- Publication date Jan 14, 2016
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND UPPER ELECTRODE ASSEMBLY
- Publication number 20160013026
- Publication date Jan 14, 2016
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND NON-TRAN...
- Publication number 20120152914
- Publication date Jun 21, 2012
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma processing method and apparatus
- Publication number 20060196847
- Publication date Sep 7, 2006
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shin MATSUURA

Person

Patents Grantslast 30 patents

Substrate support and substrate processing apparatus

Substrate processing system and transfer method

Plasma processing apparatus

Substrate processing apparatus and method of driving relay member

Plasma processing system and edge ring replacement method

Substrate processing apparatus

Pin control method and substrate processing apparatus

Condensation suppressing method and processing apparatus

Plasma processing apparatus and upper electrode assembly

Substratre delivery method and substrate processing apparatus

Pin control method

Plasma processing apparatus and upper electrode assembly

Plasma processing apparatus and upper electrode assembly

Plasma processing apparatus, plasma processing method, and non-tran...

Plasma processing method and apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD

PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD

SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND RING REPLACEMEN...

PLASMA PROCESSING SYSTEM AND METHOD OF MOUNTING ANNULAR MEMBER

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND METHOD OF DRIVING RELAY MEMBER

PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD

SUBSTRATE SUPPORT, PLASMA PROCESSING SYSTEM, AND METHOD OF PLACING...

CONDENSATION SUPPRESSING METHOD AND PROCESSING APPARATUS

PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATRE DELIVERY METHOD AND SUBSTRATE PROCESSING APPARATUS

PIN CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND UPPER ELECTRODE ASSEMBLY

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND UPPER ELECTRODE ASSEMBLY

PLASMA PROCESSING APPARATUS AND UPPER ELECTRODE ASSEMBLY

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND NON-TRAN...

Plasma processing method and apparatus