Shin Okamoto

Person

Hsin-chu City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,495,439
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Kohei Mizota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processing method
- Patent number 9,496,150
- Issue date Nov 15, 2016
- Tokyo Electron Limited
- Hiromasa Mochiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processing method
- Patent number 9,373,521
- Issue date Jun 21, 2016
- Tokyo Electron Limited
- Hiromasa Mochiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method and storage medium
- Patent number 8,641,916
- Issue date Feb 4, 2014
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,287,750
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,799,238
- Issue date Sep 21, 2010
- Tokyo Electron Limited
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating a dielectric film to reduce damage
- Patent number 7,622,390
- Issue date Nov 24, 2009
- Tokyo Electron Limited
- Kelvin Kyaw Zin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,541,283
- Issue date Jun 2, 2009
- Tokyo Electron Limited
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,300,881
- Issue date Nov 27, 2007
- Tokyo Electron Limited
- Kazuya Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 7,119,011
- Issue date Oct 10, 2006
- Tokyo Electron Limited
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 6,589,435
- Issue date Jul 8, 2003
- Tokyo Electron Limited
- Shin Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 6,488,863
- Issue date Dec 3, 2002
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a substrate
- Patent number 5,721,090
- Issue date Feb 24, 1998
- Tokyo Electron Limited
- Shin Okamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching method
- Patent number 5,705,081
- Issue date Jan 6, 1998
- Tokyo Electron Limited
- Koichiro Inazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 5,595,627
- Issue date Jan 21, 1997
- Tokyo Electron Limited
- Koichiro Inazawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS, AND METHOD OF MAINTAINING INTERIOR OF...
- Publication number 20210066048
- Publication date Mar 4, 2021
- TOKYO ELECTRON LIMITED
- Kohei MIZOTA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ETCHING PROCESSING METHOD
- Publication number 20150170933
- Publication date Jun 18, 2015
- TOKYO ELECTRON LIMITED
- Hiromasa MOCHIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PROCESSING METHOD
- Publication number 20110244691
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Hiromasa MOCHIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD AND STORAGE MEDIUM
- Publication number 20100190350
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20100112819
- Publication date May 6, 2010
- TOKYO ELECTRON LIMITED
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20090212017
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for treating a dielectric film to reduce damage
- Publication number 20080311755
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Kelvin Kyaw ZIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20050142873
- Publication date Jun 30, 2005
- TOKYO ELECTRON LIMITED
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma ashing method
- Publication number 20050106875
- Publication date May 19, 2005
- TOKYO ELECTRON LIMITED
- Kazuhiro Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20050101137
- Publication date May 12, 2005
- TOKYO ELECTRON LIMITED
- Kazuya Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method thereof
- Publication number 20040256726
- Publication date Dec 23, 2004
- Akitoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching dual damascene structure
- Publication number 20040026364
- Publication date Feb 12, 2004
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20020084254
- Publication date Jul 4, 2002
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS

Shin Okamoto

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Etching processing method

Etching processing method

Plasma etching apparatus, plasma etching method and storage medium

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Method for treating a dielectric film to reduce damage

Plasma processing method and plasma processing apparatus

Plasma etching method

Semiconductor device and manufacturing method thereof

Plasma etching method

Plasma etching method

Method of etching a substrate

Etching method

Plasma etching method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS, AND METHOD OF MAINTAINING INTERIOR OF...

ETCHING PROCESSING METHOD

ETCHING PROCESSING METHOD

PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD AND STORAGE MEDIUM

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Method for treating a dielectric film to reduce damage

Plasma processing method and plasma processing apparatus

Plasma ashing method

Plasma etching method

Semiconductor device and manufacturing method thereof

Method of etching dual damascene structure

Plasma etching method