Shin YAMAGUCHI

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,293,903
- Issue date May 6, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,272,528
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and electrostatic chuck
- Patent number 12,217,943
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Kohei Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,896
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Akira Nagayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature adjustment method
- Patent number 12,068,143
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 11,935,729
- Issue date Mar 19, 2024
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,908,666
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature adjustment system
- Patent number 11,869,799
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support
- Patent number 11,791,139
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and plasma processing apparatus
- Patent number 11,476,095
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,437,223
- Issue date Sep 6, 2022
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus for processing target object
- Patent number 11,404,251
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method
- Patent number 11,236,420
- Issue date Feb 1, 2022
- Tokyo Electron Limited
- Akiyoshi Mitsumori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooling system
- Patent number 11,060,770
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Shin Yamaguchi
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Electrostatic chuck and plasma processing apparatus
- Patent number 10,825,660
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Shin Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of operating electrostatic chuck of plasma processing apparatus
- Patent number 10,818,480
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Akiyoshi Mitsumori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus for target object and inspection method for pr...
- Patent number 10,796,889
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Akira Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature control method
- Patent number 10,665,432
- Issue date May 26, 2020
- Tokyo Electron Limited
- Akiyoshi Mitsumori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 10,340,174
- Issue date Jul 2, 2019
- Tokyo Electron Limited
- Shin Yamaguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250132136
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250087469
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kohei OTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240339303
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Shin YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240194458
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20240194457
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20240153749
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220415693
- Publication date Dec 29, 2022
- TOKYO ELECTRON LIMITED
- Hideto SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20220406576
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Kohei OTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20220384155
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20220285138
- Publication date Sep 8, 2022
- TOKYO ELECTRON LIMITED
- Shin YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210327741
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Akira NAGAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE ADJUSTMENT SYSTEM
- Publication number 20210327747
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE ADJUSTMENT METHOD
- Publication number 20210319990
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20210305025
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS
- Publication number 20210005432
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Shin YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20200402777
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL METHOD
- Publication number 20190326102
- Publication date Oct 24, 2019
- TOKYO ELECTRON LIMITED
- Akiyoshi MITSUMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE ADJUSTMENT SYSTEM
- Publication number 20190304759
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Akiyoshi MITSUMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD
- Publication number 20190304761
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Akiyoshi MITSUMORI
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Application
TEMPERATURE ADJUSTMENT METHOD
- Publication number 20190304760
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Akiyoshi MITSUMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING SYSTEM
- Publication number 20190249911
- Publication date Aug 15, 2019
- TOKYO ELECTRON LIMITED
- Shin Yamaguchi
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
PROCESSING APPARATUS FOR TARGET OBJECT AND INSPECTION METHOD FOR PR...
- Publication number 20190027345
- Publication date Jan 24, 2019
- TOKYO ELECTRON LIMITED
- Akira Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS
- Publication number 20180350561
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Shin YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING ELECTROSTATIC CHUCK OF PLASMA PROCESSING APPARATUS
- Publication number 20180350568
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Akiyoshi MITSUMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS FOR PROCESSING TARGET OBJECT
- Publication number 20180218887
- Publication date Aug 2, 2018
- TOKYO ELECTRON LIMITED
- Takehiko Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS FOR PROCESSING TARGET OBJECT
- Publication number 20180218886
- Publication date Aug 2, 2018
- TOKYO ELECTRON LIMITED
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
- Publication number 20140202635
- Publication date Jul 24, 2014
- TOKYO ELECTRON LIMITED
- Shin YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS

Shin YAMAGUCHI

Person

Patents Grantslast 30 patents

Substrate support and plasma processing apparatus

Stage and plasma processing apparatus

Substrate processing apparatus and electrostatic chuck

Substrate support and substrate processing apparatus

Temperature adjustment method

Substrate support and plasma processing apparatus

Stage and plasma processing apparatus

Temperature adjustment system

Substrate support

Electrostatic chuck and plasma processing apparatus

Stage and plasma processing apparatus

Processing apparatus for processing target object

Cleaning method

Cooling system

Electrostatic chuck and plasma processing apparatus

Method of operating electrostatic chuck of plasma processing apparatus

Processing apparatus for target object and inspection method for pr...

Temperature control method

Mounting table and plasma processing apparatus

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

STAGE AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

STAGE AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

TEMPERATURE ADJUSTMENT SYSTEM

TEMPERATURE ADJUSTMENT METHOD

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS

STAGE AND PLASMA PROCESSING APPARATUS

TEMPERATURE CONTROL METHOD

TEMPERATURE ADJUSTMENT SYSTEM

CLEANING METHOD

TEMPERATURE ADJUSTMENT METHOD

COOLING SYSTEM

PROCESSING APPARATUS FOR TARGET OBJECT AND INSPECTION METHOD FOR PR...

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS

METHOD OF OPERATING ELECTROSTATIC CHUCK OF PLASMA PROCESSING APPARATUS

PROCESSING APPARATUS FOR PROCESSING TARGET OBJECT

PROCESSING APPARATUS FOR PROCESSING TARGET OBJECT

MOUNTING TABLE AND PLASMA PROCESSING APPARATUS