Shingo Asaumi

Person

Fujisawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive-working photoresist containing o-naphthoquinone diazide su...
- Patent number 5,281,508
- Issue date Jan 25, 1994
- Tokyo Ohka Kogyo Co., Ltd.
- Hidekatsu Kohara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-working photoresist composition with quinone diazide sulfo...
- Patent number 4,906,549
- Issue date Mar 6, 1990
- Tokyo Ohka Kogyo Co., Ltd.
- Shingo Asaumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-working photosensitive quinone diazide composition with al...
- Patent number 4,882,260
- Issue date Nov 21, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Hidekatsu Kohara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Containing an arylsulfonic acid, a phenol and a naphalenic solvent
- Patent number 4,844,832
- Issue date Jul 4, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Masakazu Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing solution for positive-working photoresist comprising tma...
- Patent number 4,833,067
- Issue date May 23, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for rinse treatment of a substrate
- Patent number 4,824,762
- Issue date Apr 25, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Masakazu Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Highly heat-resistant positive-working o-quinone diazide containing...
- Patent number 4,804,612
- Issue date Feb 14, 1989
- Tokyo Ohka Kogyo Co., Ltd.
- Shingo Asaumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Developing solution for positive-working photoresist comprising a m...
- Patent number 4,784,937
- Issue date Nov 15, 1988
- Tokyo Ohka Kogyo Co., Ltd.
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working O-quinone diazide photoresist composition with 2,3...
- Patent number 4,738,915
- Issue date Apr 19, 1988
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working naphthoquinone diazide photoresist composition wit...
- Patent number 4,731,319
- Issue date Mar 15, 1988
- Tokyo Ohka Kogy Co., Ltd.
- Hidekatsu Kohara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preventing leaching of contaminants from solid surfaces
- Patent number 4,385,086
- Issue date May 24, 1983
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Muneo Nakayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Positive-type O-quinone diazide containing photoresist compositions
- Patent number 4,174,222
- Issue date Nov 13, 1979
- Tokyo Ohka Kogyo Kabushiki Kaisha
- Takashi Komine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shingo Asaumi

Person

Patents Grantslast 30 patents

Positive-working photoresist containing o-naphthoquinone diazide su...

Positive-working photoresist composition with quinone diazide sulfo...

Positive-working photosensitive quinone diazide composition with al...

Containing an arylsulfonic acid, a phenol and a naphalenic solvent

Developing solution for positive-working photoresist comprising tma...

Method for rinse treatment of a substrate

Highly heat-resistant positive-working o-quinone diazide containing...

Developing solution for positive-working photoresist comprising a m...

Positive-working O-quinone diazide photoresist composition with 2,3...

Positive-working naphthoquinone diazide photoresist composition wit...

Method for preventing leaching of contaminants from solid surfaces

Positive-type O-quinone diazide containing photoresist compositions