Shingo FUJITA

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,681,224
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Mutsuko Higo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,500,288
- Issue date Nov 15, 2022
- Sumitomo Chemical Company, Limited
- Mutsuko Higo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,353,790
- Issue date Jun 7, 2022
- Sumitomo Chemical Company, Limited
- Mutsuko Higo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and process for producing photoresist pattern
- Patent number 10,915,022
- Issue date Feb 9, 2021
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 9,760,005
- Issue date Sep 12, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method for producing photoresist pattern
- Patent number 9,740,102
- Issue date Aug 22, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,671,693
- Issue date Jun 6, 2017
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,638,997
- Issue date May 2, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, compound and process of producing photores...
- Patent number 9,563,123
- Issue date Feb 7, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin and photoresist composition
- Patent number 9,233,945
- Issue date Jan 12, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,921,029
- Issue date Dec 30, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,663,900
- Issue date Mar 4, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method for producing photoresist pattern
- Patent number 8,617,790
- Issue date Dec 31, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,420,294
- Issue date Apr 16, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20200233300
- Publication date Jul 23, 2020
- Sumitomo Chemical Company, Limited
- Mutsuko HIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20200233301
- Publication date Jul 23, 2020
- Sumitomo Chemical Company, Limited
- Mutsuko HIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20200064735
- Publication date Feb 27, 2020
- Sumitomo Chemical Company, Limited
- Mutsuko HIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20180373149
- Publication date Dec 27, 2018
- Sumitomo Chemical Company, Limited
- Katsuhiro KOMURO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20160377979
- Publication date Dec 29, 2016
- Sumitomo Chemical Company, Limited
- Takayuki MIYAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20160170300
- Publication date Jun 16, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160131975
- Publication date May 12, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20160130210
- Publication date May 12, 2016
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20160062233
- Publication date Mar 3, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORES...
- Publication number 20150248052
- Publication date Sep 3, 2015
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20130095424
- Publication date Apr 18, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022917
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022920
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20120270153
- Publication date Oct 25, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120156620
- Publication date Jun 21, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120135351
- Publication date May 31, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY

Shingo FUJITA

Person

Patents Grantslast 30 patents

Resin, resist composition and method for producing resist pattern

Resin, resist composition and method for producing resist pattern

Resin, resist composition and method for producing resist pattern

Photoresist composition and process for producing photoresist pattern

Salt, acid generator, resist composition and method for producing r...

Photoresist composition and method for producing photoresist pattern

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Photoresist composition, compound and process of producing photores...

Compound, resin and photoresist composition

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Photoresist composition and method for producing photoresist pattern

Salt and photoresist composition comprising the same

Patents Applicationslast 30 patents

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN

RESIST COMPOSITION

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORES...

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME