Shingo KANAMITSU

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Template, manufacturing method of template
- Patent number 11,796,910
- Issue date Oct 24, 2023
- Kioxia Corporation
- Kosuke Takai
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Grant
Template manufacturing method and template base member
- Patent number 11,762,286
- Issue date Sep 19, 2023
- Kioxia Corporation
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Template manufacturing method and template base member
- Patent number 11,294,276
- Issue date Apr 5, 2022
- Kioxia Corporation
- Shingo Kanamitsu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Manufacturing method of replica template, manufacturing method of s...
- Patent number 11,061,324
- Issue date Jul 13, 2021
- TOSHIBA MEMORY CORPORATION
- Mana Tanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template substrate and manufacturing method thereof
- Patent number 10,459,355
- Issue date Oct 29, 2019
- TOSHIBA MEMORY CORPORATION
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and manufacturing method of mask
- Patent number 10,274,821
- Issue date Apr 30, 2019
- TOSHIBA MEMORY CORPORATION
- Keiko Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation method, control device, and semiconductor device...
- Patent number 10,241,394
- Issue date Mar 26, 2019
- TOSHIBA MEMORY CORPORATION
- Keiko Morishita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint mask, method for manufacturing the same, and method for man...
- Patent number 9,412,592
- Issue date Aug 9, 2016
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of repairing defect and method of manufacturing semiconducto...
- Patent number 9,383,641
- Issue date Jul 5, 2016
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Template substrate, method for manufacturing same, and template
- Patent number 9,377,682
- Issue date Jun 28, 2016
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask and pattern forming method
- Patent number 8,778,572
- Issue date Jul 15, 2014
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint mask, method for manufacturing the same, and method for man...
- Patent number 8,758,005
- Issue date Jun 24, 2014
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern evaluation method
- Patent number 7,947,413
- Issue date May 24, 2011
- Kabushiki Kaisha Toshiba
- Keiko Morishita
- G01 - MEASURING TESTING
Information Patent Grant
Defect correction method for EUV mask
- Patent number 7,927,770
- Issue date Apr 19, 2011
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
White defect repairing method and apparatus of photomask, manufactu...
- Patent number 7,569,313
- Issue date Aug 4, 2009
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, manufacturing method for mask, and manufacturing method for s...
- Patent number 7,541,136
- Issue date Jun 2, 2009
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing mask for focus monitoring, and method for...
- Patent number 7,371,483
- Issue date May 13, 2008
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, manufacturing method for mask, and manufacturing method for s...
- Patent number 7,094,504
- Issue date Aug 22, 2006
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask repair method and apparatus
- Patent number 6,991,878
- Issue date Jan 31, 2006
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of correcting a photomask and method of manufacturing a semi...
- Patent number 6,740,456
- Issue date May 25, 2004
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing pattern defect, photo mask using the method, a...
- Patent number 6,335,129
- Issue date Jan 1, 2002
- Kabushiki Kaisha Toshiba
- Mitsuyo Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
TEMPLATE, MANUFACTURING METHOD OF TEMPLATE
- Publication number 20220299870
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPLATE MANUFACTURING METHOD AND TEMPLATE BASE MEMBER
- Publication number 20220187704
- Publication date Jun 16, 2022
- KIOXIA Corporation
- Shingo Kanamitsu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT TEMPLATES, METHOD FOR MANUFACTURING IMPRINT TEMPLATES, AND...
- Publication number 20200249567
- Publication date Aug 6, 2020
- Toshiba Memory Corporation
- Kazuya FUKUHARA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MANUFACTURING METHOD OF REPLICA TEMPLATE, MANUFACTURING METHOD OF S...
- Publication number 20190278167
- Publication date Sep 12, 2019
- Toshiba Memory Corporation
- Mana TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPLATE MANUFACTURING METHOD AND TEMPLATE BASE MEMBER
- Publication number 20180267401
- Publication date Sep 20, 2018
- Toshiba Memory Corporation
- Shingo KANAMITSU
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MASK AND MANUFACTURING METHOD OF MASK
- Publication number 20170269471
- Publication date Sep 21, 2017
- Kabushiki Kaisha Toshiba
- Keiko MORISHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE SUBSTRATE AND MANUFACTURING METHOD THEREOF
- Publication number 20170115581
- Publication date Apr 27, 2017
- Kabushiki Kaisha Toshiba
- Shingo KANAMITSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD, CONTROL DEVICE, AND SEMICONDUCTOR DEVICE...
- Publication number 20160259240
- Publication date Sep 8, 2016
- Kabushiki Kaisha Toshiba
- Keiko MORISHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE STORING CASE, SUBSTRATE CLEANING APPARATUS AND SUBSTRATE...
- Publication number 20150258226
- Publication date Sep 17, 2015
- Kabushiki Kaisha Toshiba
- Yukio Oppata
- B08 - CLEANING
Information Patent Application
Surface State Evaluation Apparatus and Surface State Evaluation Method
- Publication number 20150092045
- Publication date Apr 2, 2015
- Kabushiki Kaisha Toshiba
- Shingo KANAMITSU
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF REPAIRING DEFECT AND METHOD OF MANUFACTURING SEMICONDUCTO...
- Publication number 20150072524
- Publication date Mar 12, 2015
- Kabushiki Kaisha Toshiba
- Shingo KANAMITSU
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MAN...
- Publication number 20140256158
- Publication date Sep 11, 2014
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING TEMPLATE FOR IM...
- Publication number 20140170565
- Publication date Jun 19, 2014
- Kabushiki Kaisha Toshiba
- Shingo KANAMITSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND PATTERN FORMING METHOD
- Publication number 20130244141
- Publication date Sep 19, 2013
- Kazuya FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPLATE SUBSTRATE AND METHOD FOR MANUFACTURING SAME
- Publication number 20130001753
- Publication date Jan 3, 2013
- Shingo Kanamitsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MAN...
- Publication number 20110290134
- Publication date Dec 1, 2011
- Masamitsu ITOH
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
FOREIGN MATTER REMOVING METHOD FOR LITHOGRAPHIC PLATE AND METHOD FO...
- Publication number 20100186768
- Publication date Jul 29, 2010
- Shingo KANAMITSU
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEFECT CORRECTION METHOD FOR EUV MASK
- Publication number 20100112464
- Publication date May 6, 2010
- Shingo KANAMITSU
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR REPAIRING PHOTO MASK, SYSTEM FOR REPAIRING PHOTO MASK AN...
- Publication number 20100092876
- Publication date Apr 15, 2010
- Shingo KANAMITSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOREIGN OBJECT REMOVAL METHOD AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20100051056
- Publication date Mar 4, 2010
- Shingo KANAMITSU
- G01 - MEASURING TESTING
Information Patent Application
Pattern Evaluation Method
- Publication number 20090098472
- Publication date Apr 16, 2009
- Keiko MORISHITA
- G01 - MEASURING TESTING
Information Patent Application
White defect repairing method and apparatus of photomask, manufactu...
- Publication number 20070166629
- Publication date Jul 19, 2007
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask, manufacturing method for mask, and manufacturing method for s...
- Publication number 20060240341
- Publication date Oct 26, 2006
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing mask for focus monitoring, and method for...
- Publication number 20040265709
- Publication date Dec 30, 2004
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask, manufacturing method for mask, and manufacturing method for s...
- Publication number 20040131951
- Publication date Jul 8, 2004
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask repair method and apparatus
- Publication number 20030215722
- Publication date Nov 20, 2003
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of correcting a photomask and method of manufacturing a semi...
- Publication number 20020122992
- Publication date Sep 5, 2002
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shingo KANAMITSU

Person

Patents Grantslast 30 patents

Template, manufacturing method of template

Template manufacturing method and template base member

Template manufacturing method and template base member

Manufacturing method of replica template, manufacturing method of s...

Template substrate and manufacturing method thereof

Mask and manufacturing method of mask

Pattern formation method, control device, and semiconductor device...

Imprint mask, method for manufacturing the same, and method for man...

Method of repairing defect and method of manufacturing semiconducto...

Template substrate, method for manufacturing same, and template

Photomask and pattern forming method

Imprint mask, method for manufacturing the same, and method for man...

Pattern evaluation method

Defect correction method for EUV mask

White defect repairing method and apparatus of photomask, manufactu...

Mask, manufacturing method for mask, and manufacturing method for s...

Method for manufacturing mask for focus monitoring, and method for...

Mask, manufacturing method for mask, and manufacturing method for s...

Photomask repair method and apparatus

Method of correcting a photomask and method of manufacturing a semi...

Method for repairing pattern defect, photo mask using the method, a...

Patents Applicationslast 30 patents

TEMPLATE, MANUFACTURING METHOD OF TEMPLATE

TEMPLATE MANUFACTURING METHOD AND TEMPLATE BASE MEMBER

IMPRINT TEMPLATES, METHOD FOR MANUFACTURING IMPRINT TEMPLATES, AND...

MANUFACTURING METHOD OF REPLICA TEMPLATE, MANUFACTURING METHOD OF S...

TEMPLATE MANUFACTURING METHOD AND TEMPLATE BASE MEMBER

MASK AND MANUFACTURING METHOD OF MASK

TEMPLATE SUBSTRATE AND MANUFACTURING METHOD THEREOF

PATTERN FORMATION METHOD, CONTROL DEVICE, AND SEMICONDUCTOR DEVICE...

SUBSTRATE STORING CASE, SUBSTRATE CLEANING APPARATUS AND SUBSTRATE...

Surface State Evaluation Apparatus and Surface State Evaluation Method

METHOD OF REPAIRING DEFECT AND METHOD OF MANUFACTURING SEMICONDUCTO...

IMPRINT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MAN...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING TEMPLATE FOR IM...

PHOTOMASK AND PATTERN FORMING METHOD

TEMPLATE SUBSTRATE AND METHOD FOR MANUFACTURING SAME

IMPRINT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MAN...

FOREIGN MATTER REMOVING METHOD FOR LITHOGRAPHIC PLATE AND METHOD FO...

DEFECT CORRECTION METHOD FOR EUV MASK

METHOD FOR REPAIRING PHOTO MASK, SYSTEM FOR REPAIRING PHOTO MASK AN...

FOREIGN OBJECT REMOVAL METHOD AND METHOD FOR MANUFACTURING SEMICOND...

Pattern Evaluation Method

White defect repairing method and apparatus of photomask, manufactu...

Mask, manufacturing method for mask, and manufacturing method for s...

Method for manufacturing mask for focus monitoring, and method for...

Mask, manufacturing method for mask, and manufacturing method for s...

Photomask repair method and apparatus

Method of correcting a photomask and method of manufacturing a semi...