Shingo Nakamura

Person

Settsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for producing halogenated alkene compound and fluorinated a...
- Patent number 11,655,199
- Issue date May 23, 2023
- Daikin Industries, Ltd.
- Yuusuke Etou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition including fluoromethane and method for producing same
- Patent number 10,597,343
- Issue date Mar 24, 2020
- Daikin Industries, Ltd.
- Shingo Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Methyl fluoride production method
- Patent number 10,392,327
- Issue date Aug 27, 2019
- Daikin Industries, Ltd.
- Shingo Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing dry etching gas
- Patent number 10,011,553
- Issue date Jul 3, 2018
- Daikin Industries, Ltd.
- Shingo Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing fluorinated methane
- Patent number 9,988,328
- Issue date Jun 5, 2018
- Daikin Industries, Ltd.
- Yuusuke Etou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for manufacturing methyl fluoride
- Patent number 9,919,990
- Issue date Mar 20, 2018
- Daikin Industries, Ltd.
- Shingo Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Etching solution
- Patent number 9,399,734
- Issue date Jul 26, 2016
- Daikin Industries, Ltd.
- Mitsushi Itano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Solution for removing residue after semiconductor dry process and m...
- Patent number 8,822,396
- Issue date Sep 2, 2014
- Daikin Industries, Ltd.
- Shingo Nakamura
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Solution for removing residue after semiconductor dry process and m...
- Patent number 8,759,268
- Issue date Jun 24, 2014
- Daikin Industries, Ltd.
- Shingo Nakamura
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Solution for removal of residue after semiconductor dry process and...
- Patent number 8,747,564
- Issue date Jun 10, 2014
- Daikin Industries, Ltd.
- Shingo Nakamura
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Dry etching gas and method for dry etching
- Patent number 7,931,820
- Issue date Apr 26, 2011
- Daikin Industries, Ltd.
- Masataka Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removing solution
- Patent number 7,833,957
- Issue date Nov 16, 2010
- Daikin Industries, Ltd.
- Mitsushi Itano
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING FLUOROALKYNE COMPOUND
- Publication number 20240076253
- Publication date Mar 7, 2024
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHODS FOR PRODUCING HALOGENATED ALKENE COMPOUND AND FLUORINATED A...
- Publication number 20230242466
- Publication date Aug 3, 2023
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING ALKANE COMPOUND
- Publication number 20220289649
- Publication date Sep 15, 2022
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
DEHYDRATION METHOD FOR FLUORINE-BASED HYDROCARBON COMPOUND
- Publication number 20220281786
- Publication date Sep 8, 2022
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ALKANE PRODUCTION METHOD
- Publication number 20220119327
- Publication date Apr 21, 2022
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING ALKANE
- Publication number 20220119325
- Publication date Apr 21, 2022
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR PRODUCING HALOGENATED CYCLOALKANE COMPOUND
- Publication number 20220009858
- Publication date Jan 13, 2022
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS FOR PRODUCING HALOGENATED ALKENE COMPOUND AND FLUORINATED A...
- Publication number 20210380506
- Publication date Dec 9, 2021
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION INCLUDING FLUOROMETHANE AND METHOD FOR PRODUCING SAME
- Publication number 20200172456
- Publication date Jun 4, 2020
- DAIKIN INDUSTRIES, LTD.
- Shingo NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION INCLUDING FLUOROMETHANE AND METHOD FOR PRODUCING SAME
- Publication number 20180141886
- Publication date May 24, 2018
- DAIKIN INDUSTRIES, LTD.
- Shingo NAKAMURA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHYL FLUORIDE PRODUCTION METHOD
- Publication number 20180002257
- Publication date Jan 4, 2018
- DAIKIN INDUSTRIES, LTD.
- Shingo NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING FLUORINATED METHANE
- Publication number 20170334814
- Publication date Nov 23, 2017
- DAIKIN INDUSTRIES, LTD.
- Yuusuke ETOU
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR MANUFACTURING METHYL FLUORIDE
- Publication number 20160168060
- Publication date Jun 16, 2016
- DAIKIN INDUSTRIES, LTD.
- Shingo NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING DRY ETCHING GAS
- Publication number 20150299088
- Publication date Oct 22, 2015
- DAIKIN INDUSTRIES, LTD.
- Shingo NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SOLUTION FOR REMOVAL OF RESIDUE AFTER SEMICONDUCTOR DRY PROCESS AND...
- Publication number 20110143547
- Publication date Jun 16, 2011
- Daikin Industries, Ltd.
- Shingo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLUTION FOR REMOVING RESIDUE AFTER SEMICONDUCTOR DRY PROCESS AND M...
- Publication number 20100248486
- Publication date Sep 30, 2010
- DAIKIN INDUSTRIES, LTD.
- Shingo Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION FOR REMOVING RESIDUE AFTER SEMICONDUCTOR DRY PROCESS AND M...
- Publication number 20100203735
- Publication date Aug 12, 2010
- DAIKIN INDUSTRIES, LTD.
- Shingo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING SOLUTION
- Publication number 20100112821
- Publication date May 6, 2010
- DAIKIN INDUSTRIES, LTD.
- Mitsushi Itano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Removing solution
- Publication number 20060138399
- Publication date Jun 29, 2006
- Mitsushi Itano
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Dry etching gas and method for dry etching
- Publication number 20040035825
- Publication date Feb 26, 2004
- Shingo Nakamura
- H01 - BASIC ELECTRIC ELEMENTS

Shingo Nakamura

Person

Patents Grantslast 30 patents

Methods for producing halogenated alkene compound and fluorinated a...

Composition including fluoromethane and method for producing same

Methyl fluoride production method

Method for producing dry etching gas

Method for producing fluorinated methane

Method for manufacturing methyl fluoride

Etching solution

Solution for removing residue after semiconductor dry process and m...

Solution for removing residue after semiconductor dry process and m...

Solution for removal of residue after semiconductor dry process and...

Dry etching gas and method for dry etching

Removing solution

Patents Applicationslast 30 patents

METHOD FOR PRODUCING FLUOROALKYNE COMPOUND

METHODS FOR PRODUCING HALOGENATED ALKENE COMPOUND AND FLUORINATED A...

METHOD FOR PRODUCING ALKANE COMPOUND

DEHYDRATION METHOD FOR FLUORINE-BASED HYDROCARBON COMPOUND

ALKANE PRODUCTION METHOD

METHOD FOR PRODUCING ALKANE

METHOD FOR PRODUCING HALOGENATED CYCLOALKANE COMPOUND

METHODS FOR PRODUCING HALOGENATED ALKENE COMPOUND AND FLUORINATED A...

COMPOSITION INCLUDING FLUOROMETHANE AND METHOD FOR PRODUCING SAME

COMPOSITION INCLUDING FLUOROMETHANE AND METHOD FOR PRODUCING SAME

METHYL FLUORIDE PRODUCTION METHOD

METHOD FOR PRODUCING FLUORINATED METHANE

METHOD FOR MANUFACTURING METHYL FLUORIDE

METHOD FOR PRODUCING DRY ETCHING GAS

SOLUTION FOR REMOVAL OF RESIDUE AFTER SEMICONDUCTOR DRY PROCESS AND...

SOLUTION FOR REMOVING RESIDUE AFTER SEMICONDUCTOR DRY PROCESS AND M...

SOLUTION FOR REMOVING RESIDUE AFTER SEMICONDUCTOR DRY PROCESS AND M...

ETCHING SOLUTION

Removing solution

Dry etching gas and method for dry etching