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Shinichi Hidesaka
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Resist pattern formation method and resist composition
Patent number
9,740,105
Issue date
Aug 22, 2017
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
Patent number
8,367,297
Issue date
Feb 5, 2013
Tokyo Ohka Kogyo Co., Ltd.
Akiya Kawaue
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
Patent number
7,927,780
Issue date
Apr 19, 2011
Tokyo Ohka Kogyo Co., Ltd.
Akiya Kawaue
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Positive resist composition and method for forming resist pattern
Patent number
7,858,286
Issue date
Dec 28, 2010
Tokyo Ohka Kogyo Co., Ltd.
Yohei Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive resist composition and resist pattern forming method
Patent number
7,781,144
Issue date
Aug 24, 2010
Tokyo Ohka Kogyo Co., Ltd.
Yohei Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method for forming resist pattern
Patent number
7,582,406
Issue date
Sep 1, 2009
Tokyo Ohka Kogyo Co., Ltd.
Yusuke Nakagawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemical amplified positive photo resist composition and method for...
Patent number
7,329,478
Issue date
Feb 12, 2008
Tokyo Ohka Kogyo Co., Ltd.
Yusuke Nakagawa
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive photoresist composition
Patent number
6,551,755
Issue date
Apr 22, 2003
Tokyo Ohka Kogyo Co., Ltd.
Shinichi Hidesaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive photoresist composition
Patent number
6,312,863
Issue date
Nov 6, 2001
Tokyo Ohka Kogyo Co., Ltd.
Shinichi Hidesaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive photoresist coating solution comprising a mixed solvent of...
Patent number
5,702,862
Issue date
Dec 30, 1997
Tokyo Ohka Kogyo Co., Ltd.
Hayato Ohno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RESIST PATTERN FORMATION METHOD AND RESIST COMPOSITION
Publication number
20140093827
Publication date
Apr 3, 2014
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist composition, method of forming resist pattern, novel compoun...
Publication number
20100196820
Publication date
Aug 5, 2010
Akiya Kawaue
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20090098483
Publication date
Apr 16, 2009
TOKYO OHA KOGYO CO., LTD.
Yohei Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
Publication number
20090068591
Publication date
Mar 12, 2009
Tokyo Ohka Kogyo Co., Ltd.
Akiya Kawaue
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20090035698
Publication date
Feb 5, 2009
Tokyo Ohka Kogyo Co., Ltd.
Yohei Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Resist Composition And Method For Forming Resist Pattern
Publication number
20090004598
Publication date
Jan 1, 2009
Tokyo Ohka Kogyo Co., Ltd.
Yusuke Nakagawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Chemical amplified positive photo resist composition and method for...
Publication number
20060003260
Publication date
Jan 5, 2006
Yusuke Nakagawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive photoresist composition
Publication number
20020061458
Publication date
May 23, 2002
Tokyo Ohka Kogyo Co., Ltd.
Shinichi Hidesaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY