Shinichi Sugimoto

Person

Kikuchi-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reduced-pressure drying unit and coating film forming method
- Patent number 7,534,467
- Issue date May 19, 2009
- Tokyo Electron Limited
- Takahiro Kitano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating film forming method and apparatus
- Patent number 7,510,611
- Issue date Mar 31, 2009
- Tokyo Electron Limited
- Tomohide Minami
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating film forming method and system
- Patent number 7,488,505
- Issue date Feb 10, 2009
- Tokyo Electron Limited
- Tomohide Minami
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Reduced pressure drying apparatus and reduced pressure drying method
- Patent number 7,343,698
- Issue date Mar 18, 2008
- Tokyo Electron Limited
- Shinichi Sugimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for drying under reduced pressure, and coating...
- Patent number 7,205,025
- Issue date Apr 17, 2007
- Tokyo Electron Limited
- Shinji Kobayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 7,179,504
- Issue date Feb 20, 2007
- Tokyo Electron Limited
- Takahiro Kitano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus and method for drying under reduced pressure, and coating...
- Patent number 6,966,949
- Issue date Nov 22, 2005
- Tokyo Electron Limited
- Shinji Kobayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating film forming method and apparatus
- Patent number 6,884,294
- Issue date Apr 26, 2005
- Tokyo Electron Limited
- Tomohide Minami
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 6,824,616
- Issue date Nov 30, 2004
- Tokyo Electron Limited
- Takahiro Kitano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Reduced-pressure drying unit and coating film forming method
- Patent number 6,808,566
- Issue date Oct 26, 2004
- Tokyo Electron Limited
- Takahiro Kitano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Coating film forming method and system
- Patent number 6,776,845
- Issue date Aug 17, 2004
- Tokyo Electron Limited
- Tomohide Minami
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing unit
- Patent number 6,773,510
- Issue date Aug 10, 2004
- Tokyo Electron Limited
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and method for drying under reduced pressure, and coating...
- Publication number 20060003105
- Publication date Jan 5, 2006
- TOKYO ELECTRON LIMITED
- Shinji Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced pressure drying apparatus and reduced pressure drying method
- Publication number 20050229427
- Publication date Oct 20, 2005
- Shinichi Sugimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Coating film forming method and apparatus
- Publication number 20050170087
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Tomohide Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing system
- Publication number 20050100679
- Publication date May 12, 2005
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reduced-pressure drying unit and coating film forming method
- Publication number 20050087129
- Publication date Apr 28, 2005
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Coating apparatus and coating method
- Publication number 20040261701
- Publication date Dec 30, 2004
- Shinji Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating film forming method and system
- Publication number 20040241320
- Publication date Dec 2, 2004
- TOKYO ELECTRON LIMITED
- Tomohide Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for drying under reduced pressure, and coating...
- Publication number 20040007173
- Publication date Jan 15, 2004
- TOKYO ELECTRON LIMITED
- Shinji Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced-pressure drying unit and coating film forming method
- Publication number 20030054668
- Publication date Mar 20, 2003
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Coating film forming method and system
- Publication number 20020176928
- Publication date Nov 28, 2002
- TOKYO ELECTRON LIMITED
- Tomohide Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing unit
- Publication number 20020148566
- Publication date Oct 17, 2002
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Coating film forming method and apparatus
- Publication number 20020150679
- Publication date Oct 17, 2002
- TOKYO ELECTRON LIMITED
- Tomohide Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing system
- Publication number 20020150691
- Publication date Oct 17, 2002
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS

Shinichi Sugimoto

Person

Patents Grantslast 30 patents

Reduced-pressure drying unit and coating film forming method

Coating film forming method and apparatus

Coating film forming method and system

Reduced pressure drying apparatus and reduced pressure drying method

Apparatus and method for drying under reduced pressure, and coating...

Substrate processing method and substrate processing system

Apparatus and method for drying under reduced pressure, and coating...

Coating film forming method and apparatus

Substrate processing method and substrate processing system

Reduced-pressure drying unit and coating film forming method

Coating film forming method and system

Substrate processing unit

Patents Applicationslast 30 patents

Apparatus and method for drying under reduced pressure, and coating...

Reduced pressure drying apparatus and reduced pressure drying method

Coating film forming method and apparatus

Substrate processing method and substrate processing system

Reduced-pressure drying unit and coating film forming method

Coating apparatus and coating method

Coating film forming method and system

Apparatus and method for drying under reduced pressure, and coating...

Reduced-pressure drying unit and coating film forming method

Coating film forming method and system

Substrate processing unit

Coating film forming method and apparatus

Substrate processing method and substrate processing system