Shinji Kishimura

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist material and pattern formation method
- Patent number 7,588,876
- Issue date Sep 15, 2009
- Panasonic Corporation
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonamide compound, polymer compound, resist material and pattern...
- Patent number 7,413,843
- Issue date Aug 19, 2008
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist material and pattern formation method
- Patent number 7,378,216
- Issue date May 27, 2008
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, resist composition, and patterning process
- Patent number 7,241,553
- Issue date Jul 10, 2007
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer compound, resist material and pattern formation method
- Patent number 7,169,530
- Issue date Jan 30, 2007
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,169,869
- Issue date Jan 30, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonamide compound, polymer compound, resist material and pattern...
- Patent number 7,166,418
- Issue date Jan 23, 2007
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,125,643
- Issue date Oct 24, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonates, polymers, resist compositions and patterning process
- Patent number 7,125,642
- Issue date Oct 24, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,125,641
- Issue date Oct 24, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,078,147
- Issue date Jul 18, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,067,231
- Issue date Jun 27, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, resist material and pattern formation method
- Patent number 7,060,775
- Issue date Jun 13, 2006
- Matsushita Electronic Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming material and method of forming pattern
- Patent number 7,041,428
- Issue date May 9, 2006
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,005,228
- Issue date Feb 28, 2006
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist compositions and patterning process
- Patent number 7,001,707
- Issue date Feb 21, 2006
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,946,235
- Issue date Sep 20, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,933,095
- Issue date Aug 23, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Esters, polymers, resist compositions and patterning process
- Patent number 6,916,592
- Issue date Jul 12, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,875,556
- Issue date Apr 5, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,872,514
- Issue date Mar 29, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,864,037
- Issue date Mar 8, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,861,197
- Issue date Mar 1, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist compositions and patterning process
- Patent number 6,855,477
- Issue date Feb 15, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming material and method of pattern formation
- Patent number 6,830,869
- Issue date Dec 14, 2004
- Atsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 6,824,955
- Issue date Nov 30, 2004
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern formation material and pattern formation method
- Patent number 6,806,029
- Issue date Oct 19, 2004
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,790,586
- Issue date Sep 14, 2004
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern formation material and pattern formation method
- Patent number 6,753,132
- Issue date Jun 22, 2004
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern formation material and method
- Patent number 6,737,213
- Issue date May 18, 2004
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Sulfonamide compound, polymer compound, resist material and pattern...
- Publication number 20070099117
- Publication date May 3, 2007
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist material and pattern formation method
- Publication number 20050277057
- Publication date Dec 15, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist material and pattern formation method
- Publication number 20050266337
- Publication date Dec 1, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist material and pattern formation method
- Publication number 20050266338
- Publication date Dec 1, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20050267275
- Publication date Dec 1, 2005
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer, resist composition, and patterning process
- Publication number 20050221221
- Publication date Oct 6, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer compound, resist material and pattern formation method
- Publication number 20050186501
- Publication date Aug 25, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, resist composition, and patterning process
- Publication number 20050175935
- Publication date Aug 11, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20050089797
- Publication date Apr 28, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist compositions and patterning process
- Publication number 20050084796
- Publication date Apr 21, 2005
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer compound, resist material and pattern formation method
- Publication number 20050074693
- Publication date Apr 7, 2005
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonamide compound, polymer compound, resist material and pattern...
- Publication number 20050058935
- Publication date Mar 17, 2005
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonates, polymers, resist compositions and patterning process
- Publication number 20040157156
- Publication date Aug 12, 2004
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20040157155
- Publication date Aug 12, 2004
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist compositions and patterning process
- Publication number 20040144752
- Publication date Jul 29, 2004
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming material and method of pattern formation
- Publication number 20040043321
- Publication date Mar 4, 2004
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20040030079
- Publication date Feb 12, 2004
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Pattern-forming material and method of forming pattern
- Publication number 20040029035
- Publication date Feb 12, 2004
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel esters, polymers, resist compositions and patterning process
- Publication number 20030219678
- Publication date Nov 27, 2003
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030215740
- Publication date Nov 20, 2003
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030215739
- Publication date Nov 20, 2003
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030165773
- Publication date Sep 4, 2003
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern formation material and pattern formation method
- Publication number 20030113670
- Publication date Jun 19, 2003
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified resist compositions and patterning process
- Publication number 20030099901
- Publication date May 29, 2003
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL ESTER COMPOUNDS
- Publication number 20030100791
- Publication date May 29, 2003
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Pattern formation material and pattern formation method
- Publication number 20030091930
- Publication date May 15, 2003
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern formation method
- Publication number 20030091941
- Publication date May 15, 2003
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern formation material and pattern formation method
- Publication number 20030087184
- Publication date May 8, 2003
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030082479
- Publication date May 1, 2003
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymers, resist compositions and patterning process
- Publication number 20030031953
- Publication date Feb 13, 2003
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Shinji Kishimura

Person

Patents Grantslast 30 patents

Resist material and pattern formation method

Sulfonamide compound, polymer compound, resist material and pattern...

Resist material and pattern formation method

Polymer, resist composition, and patterning process

Polymer compound, resist material and pattern formation method

Polymers, resist compositions and patterning process

Sulfonamide compound, polymer compound, resist material and pattern...

Polymers, resist compositions and patterning process

Sulfonates, polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymer compound, resist material and pattern formation method

Pattern-forming material and method of forming pattern

Polymers, resist compositions and patterning process

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Esters, polymers, resist compositions and patterning process

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Chemically amplified resist compositions and patterning process

Pattern forming material and method of pattern formation

Polymers, resist compositions and patterning process

Pattern formation material and pattern formation method

Resist compositions and patterning process

Pattern formation material and pattern formation method

Pattern formation material and method

Patents Applicationslast 30 patents

Sulfonamide compound, polymer compound, resist material and pattern...

Resist material and pattern formation method

Resist material and pattern formation method

Resist material and pattern formation method

Polymers, resist compositions and patterning process

Polymer, resist composition, and patterning process

Polymer compound, resist material and pattern formation method

Polymer, resist composition, and patterning process

Polymers, resist compositions and patterning process

Resist compositions and patterning process

Polymer compound, resist material and pattern formation method

Sulfonamide compound, polymer compound, resist material and pattern...

Sulfonates, polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Resist compositions and patterning process

Pattern forming material and method of pattern formation

Polymers, resist compositions and patterning process

Pattern-forming material and method of forming pattern

Novel esters, polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Pattern formation material and pattern formation method

Chemically amplified resist compositions and patterning process

NOVEL ESTER COMPOUNDS

Pattern formation material and pattern formation method

Pattern formation method

Pattern formation material and pattern formation method

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process