Shinji KUBOTA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,033,832
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring device and method of obtaining thickness of sheath
- Patent number 11,898,840
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,871,503
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,791,135
- Issue date Oct 17, 2023
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,764,082
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,742,181
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,742,182
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,631,572
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 11,581,170
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,476,089
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,387,077
- Issue date Jul 12, 2022
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,337,297
- Issue date May 17, 2022
- Tokyo Electron Limited
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,282,701
- Issue date Mar 22, 2022
- Tokyo Electron Limited
- Takashi Dokan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,205,561
- Issue date Dec 21, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,170,978
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power source and plasma processing apparatus
- Patent number 11,087,960
- Issue date Aug 10, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, impedance matching method, and plasma...
- Patent number 11,017,985
- Issue date May 25, 2021
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for generating plasma
- Patent number 10,978,274
- Issue date Apr 13, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,971,336
- Issue date Apr 6, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,886,135
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,707,054
- Issue date Jul 7, 2020
- Tokyo Electron Limited
- Shinji Kubota
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,672,616
- Issue date Jun 2, 2020
- Tokyo Electon Limited
- Shinji Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 10,665,416
- Issue date May 26, 2020
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,622,197
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method with a car...
- Patent number 10,217,612
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and waveform correction method
- Patent number 9,934,947
- Issue date Apr 3, 2018
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,859,101
- Issue date Jan 2, 2018
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having a multilayer structure for attracting an...
- Patent number 5,539,179
- Issue date Jul 23, 1996
- Tokyo Electron Limited
- Toshihisa Nozawa
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230377843
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220301825
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220216036
- Publication date Jul 7, 2022
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220159820
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220122810
- Publication date Apr 21, 2022
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220068604
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MEASURING DEVICE AND METHOD OF OBTAINING THICKNESS OF SHEATH
- Publication number 20210396506
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- G01 - MEASURING TESTING
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210327681
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MEASURING APPARATUS AND PLASMA MEASURING METHOD
- Publication number 20210289612
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA MEASURING APPARATUS AND PLASMA MEASURING METHOD
- Publication number 20210287887
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210159049
- Publication date May 27, 2021
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20210066040
- Publication date Mar 4, 2021
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210051792
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210043472
- Publication date Feb 11, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200411286
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200294770
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR GENERATING PLASMA
- Publication number 20200286714
- Publication date Sep 10, 2020
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY POWER SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20200251308
- Publication date Aug 6, 2020
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PLASMA PROCESSING APPARATUS, IMPEDANCE MATCHING METHOD, AND PLASMA...
- Publication number 20200203129
- Publication date Jun 25, 2020
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200118814
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Takashi DOKAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200027688
- Publication date Jan 23, 2020
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190148155
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190148115
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180211818
- Publication date Jul 26, 2018
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180090301
- Publication date Mar 29, 2018
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND WAVEFORM CORRECTION METHOD
- Publication number 20170365445
- Publication date Dec 21, 2017
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170345664
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170330730
- Publication date Nov 16, 2017
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20170137944
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shinji KUBOTA

Person

Patents Grantslast 30 patents

Control method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Measuring device and method of obtaining thickness of sheath

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and processing method

Control method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Radio frequency power source and plasma processing apparatus

Plasma processing apparatus, impedance matching method, and plasma...

Plasma processing apparatus and method for generating plasma

Plasma processing apparatus and plasma processing method

Substrate processing method and substrate processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method with a car...

Plasma processing apparatus and waveform correction method

Plasma processing apparatus and plasma processing method

Electrostatic chuck having a multilayer structure for attracting an...

Patents Applicationslast 30 patents

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

MEASURING DEVICE AND METHOD OF OBTAINING THICKNESS OF SHEATH

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA MEASURING APPARATUS AND PLASMA MEASURING METHOD

PLASMA MEASURING APPARATUS AND PLASMA MEASURING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR GENERATING PLASMA

RADIO FREQUENCY POWER SOURCE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, IMPEDANCE MATCHING METHOD, AND PLASMA...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND WAVEFORM CORRECTION METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD