Shinji Kumada

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Surface treatment liquid, surface treatment method, and method for...
- Patent number 10,961,422
- Issue date Mar 30, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji Kumada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for forming photosensitive resin layer, method for producing...
- Patent number 10,353,291
- Issue date Jul 16, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Eiichi Shimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, and compound
- Patent number 9,164,381
- Issue date Oct 20, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,012,125
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji Kumada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,338,075
- Issue date Dec 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
AQUEOUS CLEANING LIQUID
- Publication number 20240279569
- Publication date Aug 22, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takumi NAMIKI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, AND METHOD FOR...
- Publication number 20190194512
- Publication date Jun 27, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji KUMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR FORMING PHOTOSENSITIVE RESIN LAYER, METHOD FOR PRODUCING...
- Publication number 20160274459
- Publication date Sep 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Eiichi SHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING FILM
- Publication number 20140316054
- Publication date Oct 23, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji Kumada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
- Publication number 20130323645
- Publication date Dec 5, 2013
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120196226
- Publication date Aug 2, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji Kumada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100047724
- Publication date Feb 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shinji Kumada

Person

Patents Grantslast 30 patents

Surface treatment liquid, surface treatment method, and method for...

Method for forming photosensitive resin layer, method for producing...

Resist composition, method of forming resist pattern, and compound

Resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

AQUEOUS CLEANING LIQUID

SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, AND METHOD FOR...

METHOD FOR FORMING PHOTOSENSITIVE RESIN LAYER, METHOD FOR PRODUCING...

METHOD OF FORMING FILM

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN