Shinji Tarutani

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method and resist composition
- Patent number 10,126,653
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,897,922
- Issue date Feb 20, 2018
- Fujifilm Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,709,892
- Issue date Jul 18, 2017
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Curable composition for imprints and method of storing the same
- Patent number 9,663,671
- Issue date May 30, 2017
- FUJIFILM Corporation
- Yuichiro Enomoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 9,551,935
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlay film composition for imprints and method of forming patter...
- Patent number 9,507,263
- Issue date Nov 29, 2016
- FUJIFILM Corporation
- Kunihiko Kodama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,482,958
- Issue date Nov 1, 2016
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,223,219
- Issue date Dec 29, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 9,116,437
- Issue date Aug 25, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 9,097,973
- Issue date Aug 4, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,999,621
- Issue date Apr 7, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Curable composition for imprint, pattern-forming method and pattern
- Patent number 8,933,144
- Issue date Jan 13, 2015
- FUJIFILM Corporation
- Yuichiro Enomoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method of forming pattern using actinic-ray or radiation-sensitive...
- Patent number 8,911,930
- Issue date Dec 16, 2014
- FUJIFILM Corporation
- Yuichiro Enomoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing curable composition for imprints
- Patent number 8,877,828
- Issue date Nov 4, 2014
- FUJIFILM Corporation
- Yuichiro Enomoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming pattern and developer for use in the method
- Patent number 8,871,642
- Issue date Oct 28, 2014
- FUJIFILM Corporation
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing curable composition for imprints
- Patent number 8,820,541
- Issue date Sep 2, 2014
- FUJIFILM Corporation
- Yuichiro Enomoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method, pattern, chemical amplification resist comp...
- Patent number 8,808,965
- Issue date Aug 19, 2014
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,753,802
- Issue date Jun 17, 2014
- FUJIFILM Corporation
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method using developer containing organic solvent a...
- Patent number 8,709,704
- Issue date Apr 29, 2014
- FUJIFILM Corporation
- Sou Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, chemical amplification resist composition a...
- Patent number 8,647,812
- Issue date Feb 11, 2014
- FUJIFILM Corporation
- Kana Fujii
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 8,632,938
- Issue date Jan 21, 2014
- FUJIFILM Corporation
- Shinichi Sugiyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, and resist composition, developer and rinsi...
- Patent number 8,603,733
- Issue date Dec 10, 2013
- FUJIFILM Corporation
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, resist composition to be used in the patter...
- Patent number 8,241,840
- Issue date Aug 14, 2012
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming method
- Patent number 8,088,550
- Issue date Jan 3, 2012
- FUJIFILM Corporation
- Shinji Tarutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, resist composition to be used in the patter...
- Patent number 8,034,547
- Issue date Oct 11, 2011
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, and resist composition, developer and rinsi...
- Patent number 8,017,304
- Issue date Sep 13, 2011
- FUJIFILM Corporation
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and resist composition used therefor
- Patent number 7,635,553
- Issue date Dec 22, 2009
- FUJIFILM Corporation
- Shinji Tarutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification resist composition and pattern-forming metho...
- Patent number 7,425,404
- Issue date Sep 16, 2008
- FUJIFILM Corporation
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,338,744
- Issue date Mar 4, 2008
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification-type resist composition and production proce...
- Patent number 7,294,450
- Issue date Nov 13, 2007
- FUJIFILM Corporation
- Shinji Tarutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20160349620
- Publication date Dec 1, 2016
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20150293454
- Publication date Oct 15, 2015
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CURABLE COMPOSITION FOR IMPRINT, PATTERN-FORMING METHOD AND PATTERN
- Publication number 20140255662
- Publication date Sep 11, 2014
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
CURABLE COMPOSITION FOR IMPRINTS AND METHOD OF STORING THE SAME
- Publication number 20140227493
- Publication date Aug 14, 2014
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTER...
- Publication number 20140220353
- Publication date Aug 7, 2014
- FUJIFILM CORPORATION
- Kunihiko KODAMA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20130113082
- Publication date May 9, 2013
- FUJIFILM Corporation
- Yuichiro Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN
- Publication number 20130052431
- Publication date Feb 28, 2013
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130045365
- Publication date Feb 21, 2013
- FUJIFILM CORPORATION
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20130017377
- Publication date Jan 17, 2013
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20130011619
- Publication date Jan 10, 2013
- FUJIFILM CORPORATION
- Kana Fujii
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20130011785
- Publication date Jan 10, 2013
- FUJIFILM Corporation
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20120322007
- Publication date Dec 20, 2012
- FUJIFILM CORPORATION
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20120321855
- Publication date Dec 20, 2012
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMP...
- Publication number 20120288691
- Publication date Nov 15, 2012
- FUJIFILM CORPORATION
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20120282548
- Publication date Nov 8, 2012
- FUJIFILM CORPORATION
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS
- Publication number 20120207943
- Publication date Aug 16, 2012
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20120148957
- Publication date Jun 14, 2012
- FUJIFILM CORPORATION
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS
- Publication number 20120076948
- Publication date Mar 29, 2012
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF FORMING PATTERN USING ACTINIC-RAY OR RADIATION-SENSITIVE...
- Publication number 20120077131
- Publication date Mar 29, 2012
- FUJIFILM Corporation
- Yuichiro Enomoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...
- Publication number 20120058427
- Publication date Mar 8, 2012
- FUJIFILM CORPORATION
- Yuichiro Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- Publication number 20120003591
- Publication date Jan 5, 2012
- FUJIFILM CORPORATION
- Yuichiro ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR NEGATIVE-TONE DEVELOPMENT AND PATTERN FORMIN...
- Publication number 20110311914
- Publication date Dec 22, 2011
- FUJIFILM CORPORATION
- Sou Kamimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...
- Publication number 20110305992
- Publication date Dec 15, 2011
- FUJIFILM CORPORATION
- Shinji TARUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT A...
- Publication number 20110229832
- Publication date Sep 22, 2011
- FUJIFILM CORPORATION
- Sou Kamimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTER...
- Publication number 20100330507
- Publication date Dec 30, 2010
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20100248136
- Publication date Sep 30, 2010
- FUJIFILM CORPORATION
- Shinichi SUGIYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...
- Publication number 20100040971
- Publication date Feb 18, 2010
- FUJIFILM Corporaion
- Shinji TARUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...
- Publication number 20100040972
- Publication date Feb 18, 2010
- FUJIFILM CORPORATION
- Shinji TARUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSI...
- Publication number 20100028803
- Publication date Feb 4, 2010
- FUJIFILM CORPORATION
- Naoya SUGIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE TREATING AGENT FOR RESIST-PATTERN, AND PATTERN-FORMING METH...
- Publication number 20090280440
- Publication date Nov 12, 2009
- FUJIFILM CORPORATION
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shinji Tarutani

Person

Patents Grantslast 30 patents

Pattern forming method and resist composition

Method of forming pattern and developer for use in the method

Actinic-ray- or radiation-sensitive resin composition and method of...

Curable composition for imprints and method of storing the same

Pattern forming method and resist composition

Underlay film composition for imprints and method of forming patter...

Method of forming pattern and developer for use in the method

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, chemical amplification resist composition a...

Method of forming pattern and developer for use in the method

Pattern forming method, chemical amplification resist composition a...

Curable composition for imprint, pattern-forming method and pattern

Method of forming pattern using actinic-ray or radiation-sensitive...

Method for producing curable composition for imprints

Method of forming pattern and developer for use in the method

Method for producing curable composition for imprints

Pattern forming method, pattern, chemical amplification resist comp...

Pattern forming method, chemical amplification resist composition a...

Pattern forming method using developer containing organic solvent a...

Pattern forming method, chemical amplification resist composition a...

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method, and resist composition, developer and rinsi...

Pattern forming method, resist composition to be used in the patter...

Positive resist composition and pattern forming method

Pattern forming method, resist composition to be used in the patter...

Pattern forming method, and resist composition, developer and rinsi...

Pattern forming method and resist composition used therefor

Chemical amplification resist composition and pattern-forming metho...

Positive resist composition and pattern forming method using the same

Chemical amplification-type resist composition and production proce...

Patents Applicationslast 30 patents

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

CURABLE COMPOSITION FOR IMPRINT, PATTERN-FORMING METHOD AND PATTERN

CURABLE COMPOSITION FOR IMPRINTS AND METHOD OF STORING THE SAME

UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTER...

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

PATTERN FORMING METHOD AND RESIST COMPOSITION

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

PATTERN FORMING METHOD AND RESIST COMPOSITION

PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMP...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS

METHOD OF FORMING PATTERN USING ACTINIC-RAY OR RADIATION-SENSITIVE...

PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION A...

METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD

RESIST COMPOSITION FOR NEGATIVE-TONE DEVELOPMENT AND PATTERN FORMIN...

PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...

PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT A...

PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTER...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...

PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...

SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSI...

SURFACE TREATING AGENT FOR RESIST-PATTERN, AND PATTERN-FORMING METH...