SHINN-SHENG YU

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 12,235,589
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Geometric mask rule check with favorable and unfavorable zones
- Patent number 12,019,974
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Geometric mask rule check with favorable and unfavorable zones
- Patent number 11,714,951
- Issue date Aug 1, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 11,709,435
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vertex-based OPC for opening patterning
- Patent number 11,675,962
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photolithography method and apparatus
- Patent number 11,429,027
- Issue date Aug 30, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 11,320,747
- Issue date May 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vertex-based OPC for opening patterning
- Patent number 11,295,056
- Issue date Apr 5, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to mitigate defect printability for ID pattern
- Patent number 11,086,227
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Grant
Mask with multilayer structure and manufacturing method by using th...
- Patent number 11,073,755
- Issue date Jul 27, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system, device, and method for prin...
- Patent number 10,976,655
- Issue date Apr 13, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography method with reduced impacts of mask defects
- Patent number 10,955,746
- Issue date Mar 23, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of making mask using transmission cross coefficient (TCC) m...
- Patent number 10,867,112
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Ting Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 10,866,525
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV mask and fabrication thereof
- Patent number 10,831,094
- Issue date Nov 10, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask with multilayer structure and manufacturing method by using th...
- Patent number 10,747,097
- Issue date Aug 18, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system, device, and method for prin...
- Patent number 10,691,014
- Issue date Jun 23, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to mitigate defect printability for ID pattern
- Patent number 10,684,552
- Issue date Jun 16, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Grant
Pellicle for EUV mask and fabrication thereof
- Patent number 10,520,806
- Issue date Dec 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV pellicle fabrication methods and structures thereof
- Patent number 10,274,819
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for integrated circuit patterning
- Patent number 10,276,372
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask with multilayer structure and manufacturing method by using th...
- Patent number 10,168,611
- Issue date Jan 1, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system, device, and method for prin...
- Patent number 10,162,257
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV mask and fabrication thereof
- Patent number 10,031,411
- Issue date Jul 24, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography process and mask
- Patent number 10,007,174
- Issue date Jun 26, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography process and mask
- Patent number 9,996,013
- Issue date Jun 12, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to mitigate defect printability for ID pattern
- Patent number 9,964,850
- Issue date May 8, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method providing for asymmetric pupil configuration for an extreme...
- Patent number 9,886,543
- Issue date Feb 6, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chun Chung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography process
- Patent number 9,869,939
- Issue date Jan 16, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing a mask
- Patent number 9,870,612
- Issue date Jan 16, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
GEOMETRIC MASK RULE CHECK WITH FAVORABLE AND UNFAVORABLE ZONES
- Publication number 20240311545
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20230333486
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Geometric Mask Rule Check With Favorable and Unfavorable Zones
- Publication number 20230325579
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Geometric Mask Rule Check With Favorable and Unfavorable Zones
- Publication number 20220365419
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND APPARATUS
- Publication number 20220365438
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20220260931
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VERTEX-BASED OPC FOR OPENING PATTERNING
- Publication number 20220229968
- Publication date Jul 21, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
VERTEX-BASED OPC FOR OPENING PATTERNING
- Publication number 20210240087
- Publication date Aug 5, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithography Method With Reduced Impacts of Mask Defects
- Publication number 20210208505
- Publication date Jul 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20210096475
- Publication date Apr 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask with Multilayer Structure and Manufacturing Method by Using th...
- Publication number 20200379335
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Lithography System, Device, and Method for Prin...
- Publication number 20200319545
- Publication date Oct 8, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to Mitigate Defect Printability for ID Pattern
- Publication number 20200310250
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND APPARATUS
- Publication number 20200057375
- Publication date Feb 20, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle for EUV Mask and Fabrication Thereof
- Publication number 20200050100
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20200041915
- Publication date Feb 6, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK MAKING METHOD
- Publication number 20200004135
- Publication date Jan 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsu-Ting HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Extreme Ultraviolet Lithography System, Device, and Method for Prin...
- Publication number 20190121228
- Publication date Apr 25, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask with Multilayer Structure and Manufacturing Method by Using th...
- Publication number 20190113835
- Publication date Apr 18, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Method with Reduced Impacts of Mask Defects
- Publication number 20190033720
- Publication date Jan 31, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV MASK AND FABRICATION THEREOF
- Publication number 20180341174
- Publication date Nov 29, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to Mitigate Defect Printability for ID Pattern
- Publication number 20180253008
- Publication date Sep 6, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, DEVICE, AND METHOD FOR PRIN...
- Publication number 20180173089
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REPAIRING A MASK
- Publication number 20170352144
- Publication date Dec 7, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Shinn-Sheng YU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK WITH MULTILAYER STRUCTURE AND MANUFACTURING METHOD BY USING TH...
- Publication number 20170343892
- Publication date Nov 30, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Integrated Circuit Patterning
- Publication number 20170338103
- Publication date Nov 23, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD PROVIDING FOR ASYMMETRIC PUPIL CONFIGURATION FOR AN EXTREME...
- Publication number 20170228490
- Publication date Aug 10, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Chun Chung
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK FOR FORMING MULTIPLE LAYER PATTERNS WITH A SINGLE EXPOSURE
- Publication number 20170110366
- Publication date Apr 20, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK WITH REDUCED SHADO...
- Publication number 20170052441
- Publication date Feb 23, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method To Define Multiple Layer Patterns With A Single Exposure By...
- Publication number 20170045827
- Publication date Feb 16, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

SHINN-SHENG YU

Person

Patents Grantslast 30 patents

Method of manufacturing a semiconductor device and apparatus for ma...

Geometric mask rule check with favorable and unfavorable zones

Geometric mask rule check with favorable and unfavorable zones

Method of manufacturing a semiconductor device and apparatus for ma...

Vertex-based OPC for opening patterning

Photolithography method and apparatus

Method of manufacturing a semiconductor device and apparatus for ma...

Vertex-based OPC for opening patterning

Method to mitigate defect printability for ID pattern

Mask with multilayer structure and manufacturing method by using th...

Extreme ultraviolet lithography system, device, and method for prin...

Lithography method with reduced impacts of mask defects

Methods of making mask using transmission cross coefficient (TCC) m...

Method of manufacturing a semiconductor device and apparatus for ma...

Pellicle for EUV mask and fabrication thereof

Mask with multilayer structure and manufacturing method by using th...

Extreme ultraviolet lithography system, device, and method for prin...

Method to mitigate defect printability for ID pattern

Pellicle for EUV mask and fabrication thereof

EUV pellicle fabrication methods and structures thereof

Method for integrated circuit patterning

Mask with multilayer structure and manufacturing method by using th...

Extreme ultraviolet lithography system, device, and method for prin...

Pellicle for EUV mask and fabrication thereof

Extreme ultraviolet lithography process and mask

Extreme ultraviolet lithography process and mask

Method to mitigate defect printability for ID pattern

Method providing for asymmetric pupil configuration for an extreme...

Lithography process

Method for repairing a mask

Patents Applicationslast 30 patents

GEOMETRIC MASK RULE CHECK WITH FAVORABLE AND UNFAVORABLE ZONES

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

Geometric Mask Rule Check With Favorable and Unfavorable Zones

Geometric Mask Rule Check With Favorable and Unfavorable Zones

PHOTOLITHOGRAPHY METHOD AND APPARATUS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

VERTEX-BASED OPC FOR OPENING PATTERNING

VERTEX-BASED OPC FOR OPENING PATTERNING

Lithography Method With Reduced Impacts of Mask Defects

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

Mask with Multilayer Structure and Manufacturing Method by Using th...

Extreme Ultraviolet Lithography System, Device, and Method for Prin...

Method to Mitigate Defect Printability for ID Pattern

PHOTOLITHOGRAPHY METHOD AND APPARATUS

Pellicle for EUV Mask and Fabrication Thereof

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

MASK MAKING METHOD

Extreme Ultraviolet Lithography System, Device, and Method for Prin...

Mask with Multilayer Structure and Manufacturing Method by Using th...

Lithography Method with Reduced Impacts of Mask Defects

PELLICLE FOR EUV MASK AND FABRICATION THEREOF

Method to Mitigate Defect Printability for ID Pattern

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, DEVICE, AND METHOD FOR PRIN...

METHOD FOR REPAIRING A MASK

MASK WITH MULTILAYER STRUCTURE AND MANUFACTURING METHOD BY USING TH...

Method for Integrated Circuit Patterning

METHOD PROVIDING FOR ASYMMETRIC PUPIL CONFIGURATION FOR AN EXTREME...

PHOTOMASK FOR FORMING MULTIPLE LAYER PATTERNS WITH A SINGLE EXPOSURE

EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK WITH REDUCED SHADO...

Method To Define Multiple Layer Patterns With A Single Exposure By...