Shintaro Aoyama

Person

Kohfu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming tungsten film
- Patent number 10,886,170
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Koji Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a tungsten film having a low resistance
- Patent number 10,612,139
- Issue date Apr 7, 2020
- Tokyo Electron Limited
- Koji Maekawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method and substrate treatment s...
- Patent number 9,418,837
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Koji Akiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Structures and techniques for atomic layer deposition
- Patent number 8,722,548
- Issue date May 13, 2014
- International Business Machines Corporation
- Shintaro Aoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for modifying high-k dielectric thin film and semiconductor...
- Patent number 7,867,920
- Issue date Jan 11, 2011
- Tokyo Electron Limited
- Kazuyoshi Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-dielectric film substrate processing method
- Patent number 7,858,509
- Issue date Dec 28, 2010
- Tokyo Electron Limited
- Miki Aruga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method
- Patent number 7,754,293
- Issue date Jul 13, 2010
- Tokyo Electron Limited
- Shintaro Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma igniting method and substrate processing method
- Patent number 7,497,964
- Issue date Mar 3, 2009
- Tokyo Electron Limited
- Masanobu Igeta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulating film on substrate, method for manufac...
- Patent number 7,378,358
- Issue date May 27, 2008
- Tokyo Electron Limited
- Masanobu Igeta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and a computer readable storage medium...
- Patent number 7,129,185
- Issue date Oct 31, 2006
- Tokyo Electron Limited
- Shintaro Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for processing substrate, and apparatus for manuf...
- Patent number 7,125,799
- Issue date Oct 24, 2006
- Tokyo Electron Limited
- Shintaro Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing oxide film on a substrate with hydrogen and fluo...
- Patent number 7,105,101
- Issue date Sep 12, 2006
- Tokyo Electron Limited
- Hiroshi Shinriki
- B08 - CLEANING
Information Patent Grant
Radical processing of a sub-nanometer insulation film
- Patent number 6,927,112
- Issue date Aug 9, 2005
- Tokyo Electron Limited
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a dielectric film
- Patent number 6,866,890
- Issue date Mar 15, 2005
- Tokyo Electron Limited
- Hideki Kiryu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for forming a stacked gate insulating film
- Patent number 6,617,207
- Issue date Sep 9, 2003
- Tokyo Electron Limited
- Hideki Kiryu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method
- Patent number 6,467,491
- Issue date Oct 22, 2002
- Tokyo Electron Limited
- Masahito Sugiura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING TUNGSTEN FILM
- Publication number 20190161853
- Publication date May 30, 2019
- TOKYO ELECTRON LIMITED
- Shintaro Aoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING TUNGSTEN FILM
- Publication number 20180315649
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Koji Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN FILM FORMING METHOD
- Publication number 20180312972
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Koji MAEKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device Manufacturing Method and Substrate Treatment S...
- Publication number 20150017813
- Publication date Jan 15, 2015
- TOKYO ELECTRON LIMITED
- Koji AKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING...
- Publication number 20140242808
- Publication date Aug 28, 2014
- TOKYO ELECTRON LIMITED
- Koji Akiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Structures And Techniques For Atomic Layer Deposition
- Publication number 20120074533
- Publication date Mar 29, 2012
- Tokyo Electron (TEL)Limited
- Shintaro Aoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MODIFYING HIGH-K DIELECTRIC THIN FILM AND SEMICONDUCTOR...
- Publication number 20090302433
- Publication date Dec 10, 2009
- TOKYO ELECTRON LIMITED
- Kazuyoshi Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING APPARATUS, FILM-FORMING METHOD AND RECORDING MEDIUM
- Publication number 20090269494
- Publication date Oct 29, 2009
- TOKYO ELECTRON LIMITED
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Substrate Treatment, Computer-Readable Recording Medium,...
- Publication number 20080254644
- Publication date Oct 16, 2008
- Tokyo Electron Limited
- Miki Aruga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM
- Publication number 20080242113
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Shintaro AOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of Gate Insulation Film
- Publication number 20080233764
- Publication date Sep 25, 2008
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radical Processing of a Sub-Nanometer Insulation Film
- Publication number 20080139000
- Publication date Jun 12, 2008
- TOKYO ELECTRON LIMITED
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE TREATER, A...
- Publication number 20070190802
- Publication date Aug 16, 2007
- TOKYO ELECTRON LIMITED
- SHINTARO AOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming metal silicate film, and method fo...
- Publication number 20070141257
- Publication date Jun 21, 2007
- TOKYO ELECTRON LIMITED
- Tsuyoshi Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film forming method
- Publication number 20060234515
- Publication date Oct 19, 2006
- TOKYO ELECTRON LIMITED
- Shintaro Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of removing oxide film on a substrate with hydrogen and fluo...
- Publication number 20060207724
- Publication date Sep 21, 2006
- TOKYO ELECTRON LIMITED
- Hiroshi Shinriki
- B08 - CLEANING
Information Patent Application
Plasma igniting method and substrate processing method
- Publication number 20060205188
- Publication date Sep 14, 2006
- TOKYO ELECTRON LIMITED
- Masanobu Igeta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treating apparatus and method of substrate treatment
- Publication number 20060174833
- Publication date Aug 10, 2006
- TOKYO ELECTRON LIMITED
- Kazuyoshi Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming insulating film on substrate, method for manufac...
- Publication number 20060009044
- Publication date Jan 12, 2006
- Masanobu Igeta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radical processing of a sub-nanometer insulation film
- Publication number 20050170541
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing method and a computer readable storage medium...
- Publication number 20050079720
- Publication date Apr 14, 2005
- TOKYO ELECTRON LIMITED
- Shintaro Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of and apparatus for processing substrates
- Publication number 20040251235
- Publication date Dec 16, 2004
- TOKYO ELECTRON LIMITED
- Hiroshi Shinriki
- B08 - CLEANING
Information Patent Application
Method and device for processing substrate, and apparatus for manuf...
- Publication number 20040241991
- Publication date Dec 2, 2004
- Shintaro Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for film formation of gate insulator, apparatus for film for...
- Publication number 20040053472
- Publication date Mar 18, 2004
- Hideki Kiryu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for manufacturing semiconductor device, substrate treater, a...
- Publication number 20040023513
- Publication date Feb 5, 2004
- Shintaro Aoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a dielectric film
- Publication number 20040005408
- Publication date Jan 8, 2004
- Hideki Kiryu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radical processing of a sub-nanometer insulation film
- Publication number 20030170945
- Publication date Sep 11, 2003
- TOKYO ELECTRON LIMITED
- Masanobu Igeta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shintaro Aoyama

Person

Patents Grantslast 30 patents

Method of forming tungsten film

Method of forming a tungsten film having a low resistance

Semiconductor device manufacturing method and substrate treatment s...

Structures and techniques for atomic layer deposition

Method for modifying high-k dielectric thin film and semiconductor...

High-dielectric film substrate processing method

Film forming method

Plasma igniting method and substrate processing method

Method for forming insulating film on substrate, method for manufac...

Substrate processing method and a computer readable storage medium...

Method and device for processing substrate, and apparatus for manuf...

Method of removing oxide film on a substrate with hydrogen and fluo...

Radical processing of a sub-nanometer insulation film

Method of forming a dielectric film

Method and system for forming a stacked gate insulating film

Processing apparatus and processing method

Patents Applicationslast 30 patents

METHOD FOR FORMING TUNGSTEN FILM

METHOD OF FORMING TUNGSTEN FILM

TUNGSTEN FILM FORMING METHOD

Semiconductor Device Manufacturing Method and Substrate Treatment S...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING...

Structures And Techniques For Atomic Layer Deposition

METHOD FOR MODIFYING HIGH-K DIELECTRIC THIN FILM AND SEMICONDUCTOR...

FILM-FORMING APPARATUS, FILM-FORMING METHOD AND RECORDING MEDIUM

Method of Substrate Treatment, Computer-Readable Recording Medium,...

FILM FORMING METHOD OF HIGH-K DIELECTRIC FILM

Formation of Gate Insulation Film

Radical Processing of a Sub-Nanometer Insulation Film

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE TREATER, A...

Method and apparatus for forming metal silicate film, and method fo...

Film forming method

Method of removing oxide film on a substrate with hydrogen and fluo...

Plasma igniting method and substrate processing method

Substrate treating apparatus and method of substrate treatment

Method for forming insulating film on substrate, method for manufac...

Radical processing of a sub-nanometer insulation film

Substrate processing method and a computer readable storage medium...

Method of and apparatus for processing substrates

Method and device for processing substrate, and apparatus for manuf...

Method for film formation of gate insulator, apparatus for film for...

Method for manufacturing semiconductor device, substrate treater, a...

Method of forming a dielectric film

Radical processing of a sub-nanometer insulation film