Shintaro Kawata

Person

Kitasoma-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and methods for blocking highly scattered charged particl...
- Patent number 6,894,291
- Issue date May 17, 2005
- Nikon Corporation
- Teruaki Okino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stencil reticles for use in charged-particle-beam microlithography,...
- Patent number 6,830,852
- Issue date Dec 14, 2004
- Nikon Corporation
- Shintaro Kawata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scattering-reticle assemblies for electron-beam microlithography in...
- Patent number 6,767,691
- Issue date Jul 27, 2004
- Nikon Corporation
- Shintaro Kawata
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged-particle-beam microlithography apparatus and methods includ...
- Patent number 6,657,207
- Issue date Dec 2, 2003
- Nikon Corporation
- Shintaro Kawata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scattering-reticle assemblies for electron-beam microlithography in...
- Patent number 6,620,558
- Issue date Sep 16, 2003
- Nikon Corporation
- Shintaro Kawata
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Beam-adjustment methods and apparatus for charged-particle-beam mic...
- Patent number 6,403,971
- Issue date Jun 11, 2002
- Nikon Corporation
- Shintaro Kawata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticles for charged-particle beam microlithography
- Patent number 6,403,268
- Issue date Jun 11, 2002
- Nikon Corporation
- Shintaro Kawata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged-particle-beam projection-exposure methods exhibiting more u...
- Patent number 6,277,542
- Issue date Aug 21, 2001
- Nikon Corporation
- Teruaki Okino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam transfer method
- Patent number 6,140,021
- Issue date Oct 31, 2000
- Nakasuji; Mamoru
- Mamoru Nakasuji
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam projection-exposure apparatus with integrated...
- Patent number 6,124,718
- Issue date Sep 26, 2000
- Nikon Corporation
- Shintaro Kawata
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam (CPB) lithography apparatus, evaluation metho...
- Patent number 6,087,667
- Issue date Jul 11, 2000
- Nikon Corporation
- Mamoru Nakasuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron-beam-projection-exposure apparatus with integrated mask in...
- Patent number 6,038,015
- Issue date Mar 14, 2000
- Nikon Corporation
- Shintaro Kawata
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High-throughput direct-write electron-beam exposure system and method
- Patent number 5,969,362
- Issue date Oct 19, 1999
- Nikon Corporation
- Shintaro Kawata
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing method for mask for charged-particle-beam transfer or...
- Patent number 5,876,881
- Issue date Mar 2, 1999
- Nikon Corporation
- Shintaro Kawata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Masks for charged-particle beam microlithography
- Patent number 5,798,194
- Issue date Aug 25, 1998
- Nikon Corporation
- Mamoru Nakasuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for projection system using charged particle beam
- Patent number 5,728,492
- Issue date Mar 17, 1998
- Nikon Corporation
- Shintaro Kawata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning photoelectron microscope
- Patent number 5,563,411
- Issue date Oct 8, 1996
- Nikon Corporation
- Shintaro Kawata
- G01 - MEASURING TESTING
Information Patent Grant
Scanning photoelectron microscope
- Patent number 5,446,282
- Issue date Aug 29, 1995
- Nikon Corporation
- Shintaro Kawata
- G01 - MEASURING TESTING
Information Patent Grant
Scan type electron microscope
- Patent number 5,396,067
- Issue date Mar 7, 1995
- Nikon Corporation
- Shohei Suzuki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Exposure systems including devices for inhibiting heating caused by...
- Publication number 20070279605
- Publication date Dec 6, 2007
- NIKON CORPORATION
- Shintaro Kawata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scattering-reticle assemblies for electron-beam microlithography in...
- Publication number 20040081916
- Publication date Apr 29, 2004
- NIKON CORPORATION
- Shintaro Kawata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged-particle-beam microlithography reticles including exposure...
- Publication number 20030049546
- Publication date Mar 13, 2003
- NIKON CORPORATION
- Shintaro Kawata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stencil reticles for use in charged-particle-beam microlithography,...
- Publication number 20030017401
- Publication date Jan 23, 2003
- Niko Corporation
- Shintaro L. Kawata
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus and methods for blocking highly scattered charged particl...
- Publication number 20020123168
- Publication date Sep 5, 2002
- NIKON CORPORATION
- Teruaki Okino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Scattering-reticle assemblies for electron-beam microlithography in...
- Publication number 20020042006
- Publication date Apr 11, 2002
- NIKON CORPORATION
- Shintaro Kawata
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Charged-particle-beam microlithography apparatus and methods includ...
- Publication number 20010052579
- Publication date Dec 20, 2001
- Shintaro Kawata
- B82 - NANO-TECHNOLOGY

Shintaro Kawata

Person

Patents Grantslast 30 patents

Apparatus and methods for blocking highly scattered charged particl...

Stencil reticles for use in charged-particle-beam microlithography,...

Scattering-reticle assemblies for electron-beam microlithography in...

Charged-particle-beam microlithography apparatus and methods includ...

Scattering-reticle assemblies for electron-beam microlithography in...

Beam-adjustment methods and apparatus for charged-particle-beam mic...

Reticles for charged-particle beam microlithography

Charged-particle-beam projection-exposure methods exhibiting more u...

Charged particle beam transfer method

Charged-particle-beam projection-exposure apparatus with integrated...

Charged-particle-beam (CPB) lithography apparatus, evaluation metho...

Electron-beam-projection-exposure apparatus with integrated mask in...

High-throughput direct-write electron-beam exposure system and method

Manufacturing method for mask for charged-particle-beam transfer or...

Masks for charged-particle beam microlithography

Mask for projection system using charged particle beam

Scanning photoelectron microscope

Scanning photoelectron microscope

Scan type electron microscope

Patents Applicationslast 30 patents

Exposure systems including devices for inhibiting heating caused by...

Scattering-reticle assemblies for electron-beam microlithography in...

Charged-particle-beam microlithography reticles including exposure...

Stencil reticles for use in charged-particle-beam microlithography,...

Apparatus and methods for blocking highly scattered charged particl...

Scattering-reticle assemblies for electron-beam microlithography in...

Charged-particle-beam microlithography apparatus and methods includ...