Shintaro Ueda

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming SiOCH film using organoaminosilane annealing
- Patent number 9,190,263
- Issue date Nov 17, 2015
- ASM IP Holding B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for filling recesses using pre-treatment with hydrocarbon-co...
- Patent number 9,117,657
- Issue date Aug 25, 2015
- ASM IP Holding B.V.
- Akinori Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating SiOCH film with hydrogen plasma
- Patent number 9,029,272
- Issue date May 12, 2015
- ASM IP Holding B.V.
- Akinori Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition for controlling vertical film growth
- Patent number 8,592,005
- Issue date Nov 26, 2013
- ASM Japan K.K.
- Shintaro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing film by atomic layer deposition with pulse-tim...
- Patent number 8,465,811
- Issue date Jun 18, 2013
- ASM Japan K.K.
- Shintaro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing flowable material using alkoxysilane or amino...
- Patent number 7,825,040
- Issue date Nov 2, 2010
- ASM Japan K.K.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150361557
- Publication date Dec 17, 2015
- ASM IP HOLDING B.V.
- Shintaro UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Treating SiOCH Film With Hydrogen Plasma
- Publication number 20150118864
- Publication date Apr 30, 2015
- ASM IP HOLDING B.V.
- Akinori Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming SiOCH Film Using Organoaminosilane Annealing
- Publication number 20150056821
- Publication date Feb 26, 2015
- ASM IP HOLDING B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Filling Recesses Using Pre-Treatment With Hydrocarbon-Co...
- Publication number 20140363983
- Publication date Dec 11, 2014
- Akinori Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic Layer Deposition For Controlling Vertical Film Growth
- Publication number 20120276306
- Publication date Nov 1, 2012
- ASM JAPAN K.K.
- Shintaro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING FILM BY ATOMIC LAYER DEPOSITION WITH PULSE-TIM...
- Publication number 20120196048
- Publication date Aug 2, 2012
- ASM JAPAN K.K.
- Shintaro Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shintaro Ueda

Person

Patents Grantslast 30 patents

Method for forming SiOCH film using organoaminosilane annealing

Method for filling recesses using pre-treatment with hydrocarbon-co...

Method for treating SiOCH film with hydrogen plasma

Atomic layer deposition for controlling vertical film growth

Method of depositing film by atomic layer deposition with pulse-tim...

Method for depositing flowable material using alkoxysilane or amino...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Method for Treating SiOCH Film With Hydrogen Plasma

Method for Forming SiOCH Film Using Organoaminosilane Annealing

Method For Filling Recesses Using Pre-Treatment With Hydrocarbon-Co...

Atomic Layer Deposition For Controlling Vertical Film Growth

METHOD OF DEPOSITING FILM BY ATOMIC LAYER DEPOSITION WITH PULSE-TIM...