Shintarou NAKATANI

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,224,157
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode cover for a plasma processing apparatus
- Patent number D1005245
- Issue date Nov 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Shintarou Nakatani
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Plasma processing apparatus
- Patent number 10,964,513
- Issue date Mar 30, 2021
- HITACHI HIGH-TECH CORPORATION
- Shintarou Nakatani
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240055232
- Publication date Feb 15, 2024
- Hitachi High-Tech Corporation
- Yuki TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240047181
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Shintarou Nakatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220037127
- Publication date Feb 3, 2022
- Hitachi High-Tech Corporation
- Shintarou Nakatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200066492
- Publication date Feb 27, 2020
- Hitachi High-Technologies Corporation
- Shintarou NAKATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160217980
- Publication date Jul 28, 2016
- Hitachi High-Technologies Corporation
- Shintarou NAKATANI
- H01 - BASIC ELECTRIC ELEMENTS