Shinya Arase

Person

Funabashi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Production method of microlens
- Patent number 8,766,158
- Issue date Jul 1, 2014
- Nissan Chemical Industries, Ltd.
- Shinya Arase
- G02 - OPTICS
Information Patent Grant
Positive resist composition and method for producing microlens
- Patent number 8,722,311
- Issue date May 13, 2014
- Nissan Chemical Industries, Ltd.
- Shojiro Yukawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming anti-reflective coat
- Patent number 7,947,424
- Issue date May 24, 2011
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type photosensitive resin composition
- Patent number 7,847,003
- Issue date Dec 7, 2010
- Nissan Chemical Industries, Ltd.
- Shinsuke Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming anti-reflective coating for use in lithography
- Patent number 7,425,403
- Issue date Sep 16, 2008
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Alkali-soluble gap fill material forming composition for lithography
- Patent number 7,361,718
- Issue date Apr 22, 2008
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming anti-reflective coating for use in lithography
- Patent number 7,332,266
- Issue date Feb 19, 2008
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming anti-reflective coating for use in lithography
- Patent number 7,326,509
- Issue date Feb 5, 2008
- Nissan Chemical Industries, Ltd.
- Shinya Arase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bottom anti-reflective coat forming composition for lithography
- Patent number 6,927,266
- Issue date Aug 9, 2005
- Nissan Chemical Industries, Ltd.
- Shinya Arase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PRODUCTION METHOD OF MICROLENS
- Publication number 20120298842
- Publication date Nov 29, 2012
- Nissan Chemical Industries, Ltd.
- Shinya Arase
- G02 - OPTICS
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS
- Publication number 20120292487
- Publication date Nov 22, 2012
- Nissan Chemical Industries, Ltd.
- Shojiro Yukawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Composition for forming anti-reflective coating for use in lithography
- Publication number 20060216652
- Publication date Sep 28, 2006
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive type photosensitive resin composition
- Publication number 20060211797
- Publication date Sep 21, 2006
- Nissan Chemical Industries, Ltd.
- Shinsuke Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alkali-soluble gap filling material forming composition for lithogr...
- Publication number 20060041078
- Publication date Feb 23, 2006
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for antireflection film formation
- Publication number 20050175927
- Publication date Aug 11, 2005
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming anti-reflective coating for use in lithography
- Publication number 20040197709
- Publication date Oct 7, 2004
- Shinya Arase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming antireflection film for lithography
- Publication number 20040110096
- Publication date Jun 10, 2004
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Bottom anti-reflective coat forming composition for lithography
- Publication number 20020156148
- Publication date Oct 24, 2002
- Nissan Chemical Industries, Ltd.
- Shinya Arase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shinya Arase

Person

Patents Grantslast 30 patents

Production method of microlens

Positive resist composition and method for producing microlens

Composition for forming anti-reflective coat

Positive type photosensitive resin composition

Composition for forming anti-reflective coating for use in lithography

Alkali-soluble gap fill material forming composition for lithography

Composition for forming anti-reflective coating for use in lithography

Composition for forming anti-reflective coating for use in lithography

Bottom anti-reflective coat forming composition for lithography

Patents Applicationslast 30 patents

PRODUCTION METHOD OF MICROLENS

POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS

Composition for forming anti-reflective coating for use in lithography

Positive type photosensitive resin composition

Alkali-soluble gap filling material forming composition for lithogr...

Composition for antireflection film formation

Composition for forming anti-reflective coating for use in lithography

Composition for forming antireflection film for lithography

Bottom anti-reflective coat forming composition for lithography