Shinya Hasegawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Thin film forming apparatus, thin film forming method, and shield c...
- Patent number 9,194,038
- Issue date Nov 24, 2015
- Canon Anelva Corporation
- Akihiro Egami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate heating apparatus, heating method, and semiconductor devi...
- Patent number 7,897,523
- Issue date Mar 1, 2011
- Canon Anelva Engineering Corporation
- Masami Shibagaki
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
High frequency sputtering device
- Patent number 6,878,249
- Issue date Apr 12, 2005
- Anelva Corporation
- Yuka Kouyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system
- Patent number 6,664,496
- Issue date Dec 16, 2003
- Anelva Corporation
- Yoshimi Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a substrate and apparatus for the method
- Patent number 6,059,985
- Issue date May 9, 2000
- Anelva Corporation
- Takanori Yoshimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,016,765
- Issue date Jan 25, 2000
- Anelva Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing thin films by plasma-enhanced chemical vapor d...
- Patent number 5,956,616
- Issue date Sep 21, 1999
- Anelva Corporation
- Shigeru Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD apparatus
- Patent number 5,676,758
- Issue date Oct 14, 1997
- Anelva Corporation
- Shinya Hasegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, AND SHIELD C...
- Publication number 20110155059
- Publication date Jun 30, 2011
- Canon ANELVA Corporation
- Akihiro Egami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Heating Apparatus, Heating Method, and Semiconductor Devi...
- Publication number 20090191724
- Publication date Jul 30, 2009
- CANON ANELVA ENGINEERING CORPORATION
- Masami Shibagaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system
- Publication number 20020144980
- Publication date Oct 10, 2002
- ANELVA CORPORATION
- Yoshimi Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High frequency sputtering device
- Publication number 20010052458
- Publication date Dec 20, 2001
- Yuka Kouyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shinya Hasegawa

Person

Patents Grantslast 30 patents

Thin film forming apparatus, thin film forming method, and shield c...

Substrate heating apparatus, heating method, and semiconductor devi...

High frequency sputtering device

Plasma processing system

Method of processing a substrate and apparatus for the method

Plasma processing apparatus

Method of depositing thin films by plasma-enhanced chemical vapor d...

CVD apparatus

Patents Applicationslast 30 patents

THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, AND SHIELD C...

Substrate Heating Apparatus, Heating Method, and Semiconductor Devi...

Plasma processing system

High frequency sputtering device