Shinya ISHIKAWA

Person

Sendai-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method, substrate processing apparatus, and substrate proce...
- Patent number 12,112,954
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,071,687
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 11,961,755
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shinya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 11,955,337
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Toru Hisamatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetoresistance effect element and magnetic memory
- Patent number 11,690,299
- Issue date Jun 27, 2023
- TOHOKU UNIVERSITY
- Hideo Sato
Information Patent Grant
Etching method, substrate processing apparatus, and substrate proce...
- Patent number 11,651,971
- Issue date May 16, 2023
- Max Co., Ltd.
- Kenta Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for substrate processing
- Patent number 11,488,836
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, plasma processing apparatus, and substrate processi...
- Patent number 11,476,123
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and plasma processing apparatus
- Patent number 11,469,111
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Shinya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,459,655
- Issue date Oct 4, 2022
- Tokyo Electron Limited
- Michiko Nakaya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage and electrode member
- Patent number 11,421,323
- Issue date Aug 23, 2022
- Tokyo Electron Limited
- Daisuke Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method, substrate processing apparatus, and substrate proce...
- Patent number 11,355,350
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Shinya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method, substrate processing apparatus, and substrate proce...
- Patent number 11,328,933
- Issue date May 10, 2022
- Tokyo Electron Limited
- Shinya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,264,236
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Toru Hisamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, plasma processing apparatus, and processing system
- Patent number 11,244,804
- Issue date Feb 8, 2022
- Tokyo Electron Limited
- Daisuke Nishide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,114,304
- Issue date Sep 7, 2021
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate
- Patent number 10,777,425
- Issue date Sep 15, 2020
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle cleaning device, nozzle cleaning method, and substrate proce...
- Patent number 10,700,166
- Issue date Jun 30, 2020
- Tokyo Electron Limited
- Yoshihiro Kai
- B08 - CLEANING
Information Patent Grant
Magnetoresistance effect element and magnetic memory
- Patent number 10,263,180
- Issue date Apr 16, 2019
- Tohoku University
- Hideo Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetoresistance effect element and magnetic memory
- Patent number 9,577,182
- Issue date Feb 21, 2017
- Tohoku University
- Shoji Ikeda
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240404799
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Shota EZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, ELECTR...
- Publication number 20240297054
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240290577
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20240282578
- Publication date Aug 22, 2024
- TOKYO ELECTRON LIMITED
- Toru HISAMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT BODY
- Publication number 20240266154
- Publication date Aug 8, 2024
- TOKYO ELECTRON LIMITED
- Daiki HARIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND ETCHING...
- Publication number 20240112918
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Noboru SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240071772
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240047220
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Kenta ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240047223
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230282447
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Takahiro YONEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20230268216
- Publication date Aug 24, 2023
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POTENTIAL CONTROL METHOD
- Publication number 20230187184
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230134436
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230090650
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230087660
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSI...
- Publication number 20230058079
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230018151
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR SUBSTRATE PROCESSING
- Publication number 20230010069
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220411928
- Publication date Dec 29, 2022
- TOKYO ELECTRO LIMITED
- Michiko NAKAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220384151
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...
- Publication number 20220262645
- Publication date Aug 18, 2022
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220254671
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Shinya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND PROCESSING SYSTEM
- Publication number 20220122802
- Publication date Apr 21, 2022
- TOKYO ELECTRON LIMITED
- Daisuke NISHIDE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20220115235
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Toru HISAMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...
- Publication number 20210398818
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Kenta ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...
- Publication number 20210233778
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...
- Publication number 20210202260
- Publication date Jul 1, 2021
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...
- Publication number 20210193477
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210098263
- Publication date Apr 1, 2021
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSI...
- Publication number 20210082713
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS

Shinya ISHIKAWA

Person

Patents Grantslast 30 patents

Etching method, substrate processing apparatus, and substrate proce...

Plasma processing method and plasma processing apparatus

Substrate support and substrate processing apparatus

Substrate processing method and substrate processing system

Magnetoresistance effect element and magnetic memory

Etching method, substrate processing apparatus, and substrate proce...

Apparatus for substrate processing

Etching method, plasma processing apparatus, and substrate processi...

Substrate processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Stage and electrode member

Etching method, substrate processing apparatus, and substrate proce...

Etching method, substrate processing apparatus, and substrate proce...

Substrate processing method

Etching method, plasma processing apparatus, and processing system

Substrate processing method

Method of processing substrate

Nozzle cleaning device, nozzle cleaning method, and substrate proce...

Magnetoresistance effect element and magnetic memory

Magnetoresistance effect element and magnetic memory

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, ELECTR...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT BODY

PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND ETCHING...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND POTENTIAL CONTROL METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSI...

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

APPARATUS FOR SUBSTRATE PROCESSING

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSI...