Shinya Kikugawa

Person

Sugita Isogo-ku, Yokohama-shi, Kanagawa-Pref., JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for bonding
- Patent number 10,731,233
- Issue date Aug 4, 2020
- AGC Inc.
- Minoru Yamada
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Synthetic silica glass optical component and process for its produc...
- Patent number 8,402,786
- Issue date Mar 26, 2013
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Mask blanks
- Patent number 8,323,856
- Issue date Dec 4, 2012
- Asahi Glass Company, Limited
- Shinya Kikugawa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Artificial quartz member, process for producing the same, and optic...
- Patent number 8,257,675
- Issue date Sep 4, 2012
- Tokyo Denpa Co., Ltd.
- Noriyuki Agata
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
TiO2-containing silica glass and optical member for EUV lithography...
- Patent number 8,178,450
- Issue date May 15, 2012
- Asahi Glass Company, Limited
- Akio Koike
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
TiO2-containing silica glass and optical member for EUV lithography...
- Patent number 8,093,165
- Issue date Jan 10, 2012
- Asahi Glass Company, Limited
- Akio Koike
- B82 - NANO-TECHNOLOGY
Information Patent Grant
TIO2-containing silica glass and optical member for lithography usi...
- Patent number 8,034,731
- Issue date Oct 11, 2011
- Asahi Glass Company, Limited
- Akio Koike
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
TiO2-containing silica glass and optical member for lithography usi...
- Patent number 7,998,892
- Issue date Aug 16, 2011
- Asahi Glass Company, Limited
- Akio Koike
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
TiO2-containing silica glass
- Patent number 7,989,378
- Issue date Aug 2, 2011
- Asahi Glass Company, Limited
- Akio Koike
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Optical member made of synthetic quartz glass, and process for its...
- Patent number 7,784,307
- Issue date Aug 31, 2010
- Asahi Glass Company, Limited
- Tomonori Ogawa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Quartz glass substrate and process for its production
- Patent number 7,592,063
- Issue date Sep 22, 2009
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass and optical material
- Patent number 7,585,800
- Issue date Sep 8, 2009
- Asahi Glass Company, Limited
- Mitsuhiro Kawata
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Photomask substrate made of synthetic quartz glass and photomask
- Patent number 7,491,475
- Issue date Feb 17, 2009
- Asahi Glass Company, Limited
- Shinya Kikugawa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass containing TiO2 and process for its production
- Patent number 7,419,924
- Issue date Sep 2, 2008
- Asahi Glass Company, Limited
- Akio Koike
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic quartz glass and process for producing it
- Patent number 7,022,633
- Issue date Apr 4, 2006
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Ultraviolet and vacuum ultraviolet antireflection substrate
- Patent number 6,829,084
- Issue date Dec 7, 2004
- Asahi Glass Company, Limited
- Satoru Takaki
- G02 - OPTICS
Information Patent Grant
Structure for attaching a pellicle to a photo-mask
- Patent number 6,795,170
- Issue date Sep 21, 2004
- Asahi Glass Company, Limited
- Hitoshi Mishiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle
- Patent number 6,744,562
- Issue date Jun 1, 2004
- Asahi Glass Company, Limited
- Kaname Okada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and method of using the same
- Patent number 6,713,200
- Issue date Mar 30, 2004
- Asahi Glass Company, Limited
- Hiroshi Arishima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Ultraviolet and vacuum ultraviolet antireflection substrate
- Patent number 6,628,456
- Issue date Sep 30, 2003
- Asahi Glass Company, Limited
- Satoru Takaki
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, semiconductor device, and photomask
- Patent number 6,611,317
- Issue date Aug 26, 2003
- Asahi Glass Company, Limited
- Tohru Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Synthetic quartz glass and method for preparing the same
- Patent number 6,576,578
- Issue date Jun 10, 2003
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic quartz glass for optical member, process for producing th...
- Patent number 6,544,914
- Issue date Apr 8, 2003
- Asahi Glass Company, Limited
- Shinya Kikugawa
- B08 - CLEANING
Information Patent Grant
Synthetic quartz glass and method for production thereof
- Patent number 6,499,317
- Issue date Dec 31, 2002
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Pellicle and method for manufacture thereof
- Patent number 6,475,575
- Issue date Nov 5, 2002
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silicon carbide and process for its production
- Patent number 6,436,361
- Issue date Aug 20, 2002
- Asahi Glass Company, Limited
- Youichi Kamisuki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Quartz glass substrate for polysilicon thin film transistor liquid...
- Patent number 5,330,941
- Issue date Jul 19, 1994
- Asahi Glass Company Ltd.
- Susumu Yaba
- G02 - OPTICS
Information Patent Grant
Transparent quartz glass and process for its production
- Patent number 5,326,729
- Issue date Jul 5, 1994
- Asahi Glass Company Ltd.
- Susumu Yaba
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Solar cell substrate and process for its production
- Patent number 5,252,140
- Issue date Oct 12, 1993
- Shigeyoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR BONDING
- Publication number 20180230575
- Publication date Aug 16, 2018
- Asahi Glass Company, Limited
- Minoru YAMADA
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
GLASS SUBSTRATE FOR FORMING THROUGH-SUBSTRATE VIA OF SEMICONDUCTOR...
- Publication number 20130034688
- Publication date Feb 7, 2013
- ASAHI GLASS COMPANY, LIMITED
- Akio Koike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GLASS SUBSTRATE FOR FORMING THROUGH-SUBSTRATE VIA OF SEMICONDUCTOR...
- Publication number 20130034687
- Publication date Feb 7, 2013
- ASAHI GLASS COMPANY, LIMITED
- Akio KOIKE
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROCESS FOR PRODUCING ARTICLE HAVING FINE CONCAVE AND CONVEX STRUCT...
- Publication number 20120292793
- Publication date Nov 22, 2012
- ASAHI GLASS COMPANY, LIMITED
- Akio KOIKE
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
- Publication number 20120149543
- Publication date Jun 14, 2012
- ASAHI GLASS COMPANY, LIMITED
- Akio KOIKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANKS
- Publication number 20110053059
- Publication date Mar 3, 2011
- Asahi Glass Co., LTD.
- Shinya KIKUGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY...
- Publication number 20100323872
- Publication date Dec 23, 2010
- Asahi Glass Company, Limited
- Akio KOIKE
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USI...
- Publication number 20100323873
- Publication date Dec 23, 2010
- ASAHI GLASS COMPANY, LIMITED
- Akio Koike
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY...
- Publication number 20100323871
- Publication date Dec 23, 2010
- Asahi Glass Company, Limited
- Akio Koike
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USI...
- Publication number 20100317505
- Publication date Dec 16, 2010
- ASAHI GLASS COMPANY, LIMITED
- Akio KOIKE
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
TIO2-CONTAINING SILICA GLASS
- Publication number 20100261597
- Publication date Oct 14, 2010
- ASAHI GLASS COMPANY LIMITED
- Akio KOIKE
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MAT...
- Publication number 20090242387
- Publication date Oct 1, 2009
- Asahi Glass Co., LTD.
- Akio KOIKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ARTIFICIAL QUARTZ MEMBER, PROCESS FOR PRODUCING THE SAME, AND OPTIC...
- Publication number 20090104103
- Publication date Apr 23, 2009
- Tokyo Denpa Co., Ltd.
- Noriyuki AGATA
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICA GLASS AND OPTICAL MATERIAL
- Publication number 20080103038
- Publication date May 1, 2008
- Asahi Glass Co., LTD.
- Mitsuhiro Kawata
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Quartz glass substrate and process for its production
- Publication number 20080057291
- Publication date Mar 6, 2008
- ASAHI GLASS COMPANY LIMITED
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
QUARTZ-TYPE GLASS AND PROCESS FOR ITS PRODUCTION
- Publication number 20080039310
- Publication date Feb 14, 2008
- Asahi Glass Company, Limited
- Hideaki HAYASHI
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
MASK BLANKS
- Publication number 20080032213
- Publication date Feb 7, 2008
- Asahi Glass Co., LTD.
- Shinya KIKUGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MAT...
- Publication number 20070207911
- Publication date Sep 6, 2007
- Asahi Glass Co., LTD.
- Akio KOIKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silica glass containing TiO2 and process for its production
- Publication number 20070042893
- Publication date Feb 22, 2007
- ASAHI GLASS COMPANY, LIMITED
- Akio Koike
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Optical member made of synthetic quartz glass, and process for its...
- Publication number 20070027018
- Publication date Feb 1, 2007
- ASAHI GLASS COMPANY, LIMITED
- Tomonori Ogawa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Photomask substrate made of synthetic quartz glass and photomask
- Publication number 20060246363
- Publication date Nov 2, 2006
- ASAHI GLASS COMPANY, LIMITED
- Shinya Kikugawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Ultraviolet and vacuum ultraviolet antireflection substrate
- Publication number 20030214704
- Publication date Nov 20, 2003
- ASAHI GLASS COMPANY LIMITED
- Satoru Takaki
- G02 - OPTICS
Information Patent Application
Synthetic quartz glass and process for producing it
- Publication number 20030195107
- Publication date Oct 16, 2003
- ASAHI GLASS COMPANY LIMITED
- Yoshiaki Ikuta
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Structure for attaching a pellicle to a photo-mask
- Publication number 20030095245
- Publication date May 22, 2003
- ASAHI GLASS COMPANY, LIMITED
- Hitoshi Mishiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Synthetic silica glass optical component and process for its produc...
- Publication number 20030051507
- Publication date Mar 20, 2003
- ASAHI GLASS COMPANY, LIMITED
- Yoshiaki Ikuta
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Pellicle
- Publication number 20030035222
- Publication date Feb 20, 2003
- ASAHI GLASS COMPANY, LIMITED
- Kaname Okada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ultraviolet and vacuum ultraviolet antireflection substrate
- Publication number 20030025991
- Publication date Feb 6, 2003
- ASAHI GLASS COMPANY LIMITED
- Satoru Takaki
- G02 - OPTICS
Information Patent Application
Pellicle and method of using the same
- Publication number 20020007907
- Publication date Jan 24, 2002
- ASAHI GLASS COMPANY, LIMITED
- Hiroshi Arishima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Container for an optical article
- Publication number 20010035361
- Publication date Nov 1, 2001
- ASAHI GLASS COMPANY, LIMITED
- Hitoshi Mishiro
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL

Shinya Kikugawa

Person

Patents Grantslast 30 patents

Composition for bonding

Synthetic silica glass optical component and process for its produc...

Mask blanks

Artificial quartz member, process for producing the same, and optic...

TiO2-containing silica glass and optical member for EUV lithography...

TiO2-containing silica glass and optical member for EUV lithography...

TIO2-containing silica glass and optical member for lithography usi...

TiO2-containing silica glass and optical member for lithography usi...

TiO2-containing silica glass

Optical member made of synthetic quartz glass, and process for its...

Quartz glass substrate and process for its production

Silica glass and optical material

Photomask substrate made of synthetic quartz glass and photomask

Silica glass containing TiO2 and process for its production

Synthetic quartz glass and process for producing it

Ultraviolet and vacuum ultraviolet antireflection substrate

Structure for attaching a pellicle to a photo-mask

Pellicle

Pellicle and method of using the same

Ultraviolet and vacuum ultraviolet antireflection substrate

Exposure apparatus, semiconductor device, and photomask

Synthetic quartz glass and method for preparing the same

Synthetic quartz glass for optical member, process for producing th...

Synthetic quartz glass and method for production thereof

Pellicle and method for manufacture thereof

Silicon carbide and process for its production

Quartz glass substrate for polysilicon thin film transistor liquid...

Transparent quartz glass and process for its production

Solar cell substrate and process for its production

Patents Applicationslast 30 patents

COMPOSITION FOR BONDING

GLASS SUBSTRATE FOR FORMING THROUGH-SUBSTRATE VIA OF SEMICONDUCTOR...

GLASS SUBSTRATE FOR FORMING THROUGH-SUBSTRATE VIA OF SEMICONDUCTOR...

PROCESS FOR PRODUCING ARTICLE HAVING FINE CONCAVE AND CONVEX STRUCT...

TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY

MASK BLANKS

TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY...

TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USI...

TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY...

TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USI...

TIO2-CONTAINING SILICA GLASS

PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MAT...

ARTIFICIAL QUARTZ MEMBER, PROCESS FOR PRODUCING THE SAME, AND OPTIC...

SILICA GLASS AND OPTICAL MATERIAL

Quartz glass substrate and process for its production

QUARTZ-TYPE GLASS AND PROCESS FOR ITS PRODUCTION

MASK BLANKS

PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MAT...

Silica glass containing TiO2 and process for its production

Optical member made of synthetic quartz glass, and process for its...

Photomask substrate made of synthetic quartz glass and photomask

Ultraviolet and vacuum ultraviolet antireflection substrate

Synthetic quartz glass and process for producing it

Structure for attaching a pellicle to a photo-mask

Synthetic silica glass optical component and process for its produc...

Pellicle

Ultraviolet and vacuum ultraviolet antireflection substrate

Pellicle and method of using the same

Container for an optical article