Shinya Minegishi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive composition and resist pattern-forming method
- Patent number 11,506,976
- Issue date Nov 22, 2022
- JSR Corporation
- Hisashi Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition, pattern-forming method, and metal-...
- Patent number 11,079,676
- Issue date Aug 3, 2021
- JSR Corporation
- Yusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition and pattern-forming method
- Patent number 10,995,173
- Issue date May 4, 2021
- JSR Corporation
- Yuji Namie
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Block copolymer
- Patent number 10,308,752
- Issue date Jun 4, 2019
- JSR Corporation
- Yuji Namie
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Composition for base, and directed self-assembly lithography method
- Patent number 10,146,130
- Issue date Dec 4, 2018
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Directed self-assembly composition for pattern formation and patter...
- Patent number 9,718,950
- Issue date Aug 1, 2017
- JSR Corporation
- Shinya Minegishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for base, and directed self-assembly lithography method
- Patent number 9,690,192
- Issue date Jun 27, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Directed self-assembling composition for pattern formation, and pat...
- Patent number 9,684,235
- Issue date Jun 20, 2017
- JSR Corporation
- Yuji Namie
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Directed self-assembling composition for pattern formation, and pat...
- Patent number 9,651,861
- Issue date May 16, 2017
- JSR Corporation
- Yuji Namie
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pattern-forming method and resist underlayer film-forming composition
- Patent number 9,607,849
- Issue date Mar 28, 2017
- JSR Corporation
- Kazuhiko Koumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,599,892
- Issue date Mar 21, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method and photoresist composition
- Patent number 9,594,303
- Issue date Mar 14, 2017
- JSR Corporation
- Hitoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,587,065
- Issue date Mar 7, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Base film-forming composition, and directed self-assembly lithograp...
- Patent number 9,557,644
- Issue date Jan 31, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,534,135
- Issue date Jan 3, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,487,868
- Issue date Nov 8, 2016
- JSR Corporation
- Hiroyuki Komatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition, resist pattern-forming method, compound, method for pr...
- Patent number 9,268,225
- Issue date Feb 23, 2016
- JSR Corporation
- Kiyoshi Tanaka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming liquid immersion upper layer film, resist p...
- Patent number 9,046,775
- Issue date Jun 2, 2015
- JSR Corporation
- Shinya Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and composition for forming resist underlay...
- Patent number 9,046,769
- Issue date Jun 2, 2015
- JSR Corporation
- Yushi Matsumura
- B44 - DECORATIVE ARTS
Information Patent Grant
Method for forming resist pattern, and composition for forming resi...
- Patent number 8,956,807
- Issue date Feb 17, 2015
- JSR Corporation
- Hiromitsu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and composition for forming resist underlay...
- Patent number 8,859,191
- Issue date Oct 14, 2014
- JSR Corporation
- Yushi Matsumura
- B44 - DECORATIVE ARTS

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20200356000
- Publication date Nov 12, 2020
- JSR Corporation
- Shinya MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20200166840
- Publication date May 28, 2020
- JSR Corporation
- Hisashi Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20200004144
- Publication date Jan 2, 2020
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20190354010
- Publication date Nov 21, 2019
- JSR Corporation
- Shinya MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL O...
- Publication number 20190310551
- Publication date Oct 10, 2019
- JSR Corporation
- Shinya MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METAL-...
- Publication number 20190310552
- Publication date Oct 10, 2019
- JSR Corporation
- Yusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20190241695
- Publication date Aug 8, 2019
- JSR Corporation
- Yuji NAMIE
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
- Publication number 20170248847
- Publication date Aug 31, 2017
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BLOCK COPOLYMER
- Publication number 20170204216
- Publication date Jul 20, 2017
- JSR Corporation
- Yuji NAMIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...
- Publication number 20170088740
- Publication date Mar 30, 2017
- JSR Corporation
- Hiroyuki KOMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150323870
- Publication date Nov 12, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
- Publication number 20150301445
- Publication date Oct 22, 2015
- JSR Corporation
- Hiroyuki Komatsu
- G02 - OPTICS
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150277223
- Publication date Oct 1, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION
- Publication number 20150252216
- Publication date Sep 10, 2015
- JSR Corporation
- Shinya MINEGISHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150253671
- Publication date Sep 10, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150253663
- Publication date Sep 10, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20150225601
- Publication date Aug 13, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20150191829
- Publication date Jul 9, 2015
- JSR Corporation
- Hiroyuki KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...
- Publication number 20150187581
- Publication date Jul 2, 2015
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD
- Publication number 20150093508
- Publication date Apr 2, 2015
- JSR Corporation
- Tomoki NAGAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION
- Publication number 20150010866
- Publication date Jan 8, 2015
- JSR Corporation
- Hitoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST P...
- Publication number 20140377707
- Publication date Dec 25, 2014
- JSR Corporation
- Shinya MINEGISHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAY...
- Publication number 20140371466
- Publication date Dec 18, 2014
- JSR Corporation
- Yushi MATSUMURA
- B44 - DECORATIVE ARTS
Information Patent Application
COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PR...
- Publication number 20140248563
- Publication date Sep 4, 2014
- JSR Corporation
- Kiyoshi TANAKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
DIRECTED SELF-ASSEMBLING COMPOSITION FOR PATTERN FORMATION, AND PAT...
- Publication number 20140238956
- Publication date Aug 28, 2014
- JSR Corporation
- Yuji NAMIE
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PATTERN-FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20140220783
- Publication date Aug 7, 2014
- JSR Corporation
- Kazuhiko KOUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST P...
- Publication number 20140093826
- Publication date Apr 3, 2014
- JSR Corporation
- Shinya MINEGISHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DIRECTED SELF-ASSEMBLY COMPOSITION FOR PATTERN FORMATION AND PATTER...
- Publication number 20130344249
- Publication date Dec 26, 2013
- Shinya MINEGISHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESI...
- Publication number 20130101942
- Publication date Apr 25, 2013
- JSR Corporation
- Hiromitsu TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAY...
- Publication number 20120285929
- Publication date Nov 15, 2012
- JSR Corporation
- Yushi MATSUMURA
- B44 - DECORATIVE ARTS

Shinya Minegishi

Person

Patents Grantslast 30 patents

Radiation-sensitive composition and resist pattern-forming method

Radiation-sensitive composition, pattern-forming method, and metal-...

Composition and pattern-forming method

Block copolymer

Composition for base, and directed self-assembly lithography method

Directed self-assembly composition for pattern formation and patter...

Composition for base, and directed self-assembly lithography method

Directed self-assembling composition for pattern formation, and pat...

Directed self-assembling composition for pattern formation, and pat...

Pattern-forming method and resist underlayer film-forming composition

Composition for pattern formation, and pattern-forming method

Resist pattern-forming method and photoresist composition

Composition for pattern formation, and pattern-forming method

Base film-forming composition, and directed self-assembly lithograp...

Composition for pattern formation, and pattern-forming method

Pattern-forming method

Composition, resist pattern-forming method, compound, method for pr...

Composition for forming liquid immersion upper layer film, resist p...

Pattern-forming method, and composition for forming resist underlay...

Method for forming resist pattern, and composition for forming resi...

Pattern-forming method, and composition for forming resist underlay...

Patents Applicationslast 30 patents

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL O...

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METAL-...

COMPOSITION AND PATTERN-FORMING METHOD

COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD

BLOCK COPOLYMER

BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

PATTERN-FORMING METHOD

BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...

COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION

COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST P...

PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAY...

COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PR...

DIRECTED SELF-ASSEMBLING COMPOSITION FOR PATTERN FORMATION, AND PAT...

PATTERN-FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST P...

DIRECTED SELF-ASSEMBLY COMPOSITION FOR PATTERN FORMATION AND PATTER...

METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESI...

PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAY...