Shinya MORIKITA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Treatment method
- Patent number 11,728,176
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Kiyohito Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma processing
- Patent number 11,594,398
- Issue date Feb 28, 2023
- Tokyo Electron Limited
- Yusuke Aoki
- B08 - CLEANING
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,569,094
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Kota Ishiharada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed capacitively coupled plasma processes
- Patent number 11,545,364
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,251,048
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Yusuke Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 11,145,490
- Issue date Oct 12, 2021
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, device manufacturing method, and pl...
- Patent number 11,081,351
- Issue date Aug 3, 2021
- Tokyo Electron Limited
- Yusuke Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,062,882
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Yusuke Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 10,991,551
- Issue date Apr 27, 2021
- Tokyo Electron Limited
- Mohd Fairuz Bin Budiman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,957,515
- Issue date Mar 23, 2021
- Tokyo Electron Limited
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 10,950,458
- Issue date Mar 16, 2021
- Tokyo Electron Limited
- Yasutaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,886,138
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Timothy Tianshyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,770,268
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- Shinya Morikita
- B08 - CLEANING
Information Patent Grant
Method of processing target object
- Patent number 10,707,088
- Issue date Jul 7, 2020
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing workpiece
- Patent number 10,692,726
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,546,723
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,192,750
- Issue date Jan 29, 2019
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS,...
- Publication number 20240212987
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240162045
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Fumiya TAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230386794
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Satoru NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR ALIGNING RING MEMBER
- Publication number 20230386798
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230086580
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Fumiya TAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulsed Capacitively Coupled Plasma Processes
- Publication number 20230081352
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230005753
- Publication date Jan 5, 2023
- TOKYO ELECTRON LIMITED
- Fumiya TAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220406613
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Fumiya TAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING S...
- Publication number 20220351981
- Publication date Nov 3, 2022
- TOKYO ELECTRON LIMITED
- Takuma SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220344128
- Publication date Oct 27, 2022
- TOKYO ELECTRON LIMITED
- Shinya MORIKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED CAPACITIVELY COUPLED PLASMA PROCESSES
- Publication number 20220059358
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210335598
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Takahiro Tokuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT METHOD
- Publication number 20210313187
- Publication date Oct 7, 2021
- TOKYO ELECTRON LIMITED
- Kiyohito ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210305057
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Kota ISHIHARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210296090
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Satoru NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, DEVICE MANUFACTURING METHOD, AND PL...
- Publication number 20210057212
- Publication date Feb 25, 2021
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200402805
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200328064
- Publication date Oct 15, 2020
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20200266036
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200234925
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200126759
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190355588
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Timothy Tianshyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING WORKPIECE
- Publication number 20190252198
- Publication date Aug 15, 2019
- TOKYO ELECTRON LIMITED
- Shinya MORIKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20190214269
- Publication date Jul 11, 2019
- TOKYO ELECTRON LIMITED
- Yasutaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20190096635
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180233331
- Publication date Aug 16, 2018
- TOKYO ELECTRON LIMITED
- Masanori HOSOYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180197720
- Publication date Jul 12, 2018
- TOKYO ELECTRON LIMITED
- Shinya MORIKITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING TARGET OBJECT
- Publication number 20180047578
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20170345666
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Shinya MORIKITA
- H01 - BASIC ELECTRIC ELEMENTS

Shinya MORIKITA

Person

Patents Grantslast 30 patents

Treatment method

Apparatus and method for plasma processing

Etching method and plasma processing apparatus

Pulsed capacitively coupled plasma processes

Plasma processing method and plasma processing apparatus

Plasma processing method

Method of processing substrate, device manufacturing method, and pl...

Plasma processing apparatus and plasma processing method

Cleaning method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Etching method

Substrate processing method and substrate processing apparatus

Plasma processing method and plasma processing apparatus

Method of processing target object

Method for processing workpiece

Plasma processing method

Plasma processing method

Patents Applicationslast 30 patents

GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS,...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR ALIGNING RING MEMBER

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

Pulsed Capacitively Coupled Plasma Processes

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD, PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING S...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PULSED CAPACITIVELY COUPLED PLASMA PROCESSES

PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

TREATMENT METHOD

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF PROCESSING SUBSTRATE, DEVICE MANUFACTURING METHOD, AND PL...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CLEANING METHOD AND PLASMA PROCESSING APPARATUS

APPARATUS AND METHOD FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR PROCESSING WORKPIECE

ETCHING METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF PROCESSING TARGET OBJECT

PLASMA PROCESSING METHOD