Shinya Morisawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 11,426,834
- Issue date Aug 30, 2022
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 10,486,285
- Issue date Nov 26, 2019
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 9,687,957
- Issue date Jun 27, 2017
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 9,358,662
- Issue date Jun 7, 2016
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus, substrate processing method, substr...
- Patent number 8,795,032
- Issue date Aug 5, 2014
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Plating apparatus and plating method
- Patent number 7,736,474
- Issue date Jun 15, 2010
- Ebara Corporation
- Keiichi Kurashina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus
- Patent number 7,037,853
- Issue date May 2, 2006
- Ebara Corporation
- Akihisa Hongo
- B08 - CLEANING
Information Patent Grant
Revolution member supporting apparatus and semiconductor substrate...
- Patent number 6,921,466
- Issue date Jul 26, 2005
- Ebara Corporation
- Akihisa Hongo
- B24 - GRINDING POLISHING
Information Patent Grant
Method of and apparatus for cleaning substrate
- Patent number 6,745,784
- Issue date Jun 8, 2004
- Ebara Corporation
- Ichiro Katakabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus
- Patent number 6,615,854
- Issue date Sep 9, 2003
- Ebara Corporation
- Akihisa Hongo
- B08 - CLEANING
Information Patent Grant
Method of and apparatus for cleaning substrate
- Patent number 6,558,478
- Issue date May 6, 2003
- Ebara Corporation
- Ichiro Katakabe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...
- Publication number 20200047309
- Publication date Feb 13, 2020
- Mitsuru MIYAZAKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...
- Publication number 20170252894
- Publication date Sep 7, 2017
- EBARA CORPORATION
- Mitsuru Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...
- Publication number 20150050863
- Publication date Feb 19, 2015
- EBARA CORPORATION
- Mitsuru MIYAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...
- Publication number 20140302676
- Publication date Oct 9, 2014
- Mitsuru MIYAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLATING APPARATUS AND PLATING METHOD
- Publication number 20100219078
- Publication date Sep 2, 2010
- Keiichi Kurashina
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Substrate processing apparatus, substrate processing method, substr...
- Publication number 20090305612
- Publication date Dec 10, 2009
- EBARA CORPORATION
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Application
Substrate cleaning apparatus
- Publication number 20090101181
- Publication date Apr 23, 2009
- EBARA CORPORATION
- Shinya Morisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Revolution member supporting apparatus and semiconductor substrate...
- Publication number 20090026068
- Publication date Jan 29, 2009
- Akihisa Hongo
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Revolution member supporting apparatus and semiconductor substrate...
- Publication number 20070113977
- Publication date May 24, 2007
- Akihisa Hongo
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Plating apparatus and plating method
- Publication number 20060086616
- Publication date Apr 27, 2006
- Keiichi Kurashina
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Revolution member supporting apparatus and semiconductor substrate...
- Publication number 20050087441
- Publication date Apr 28, 2005
- Akihisa Hongo
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Plating apparatus, plating method and substrate processing apparatus
- Publication number 20050023149
- Publication date Feb 3, 2005
- Tsutomu Nakada
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Wafer cleaning apparatus
- Publication number 20040007559
- Publication date Jan 15, 2004
- Akihisa Hongo
- B08 - CLEANING
Information Patent Application
Method of and apparatus for cleaning substrate
- Publication number 20030168089
- Publication date Sep 11, 2003
- Ichiro Katakabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Revolution member supporting apparatus and semiconductor substrate...
- Publication number 20020006876
- Publication date Jan 17, 2002
- Akihisa Hongo
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Shinya Morisawa

Person

Patents Grantslast 30 patents

Substrate processing apparatus, substrate processing method, substr...

Substrate processing apparatus, substrate processing method, substr...

Substrate processing apparatus, substrate processing method, substr...

Substrate processing apparatus, substrate processing method, substr...

Substrate processing apparatus, substrate processing method, substr...

Plating apparatus and plating method

Wafer cleaning apparatus

Revolution member supporting apparatus and semiconductor substrate...

Method of and apparatus for cleaning substrate

Wafer cleaning apparatus

Method of and apparatus for cleaning substrate

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SUBSTR...

PLATING APPARATUS AND PLATING METHOD

Substrate processing apparatus, substrate processing method, substr...

Substrate cleaning apparatus

Revolution member supporting apparatus and semiconductor substrate...

Revolution member supporting apparatus and semiconductor substrate...

Plating apparatus and plating method

Revolution member supporting apparatus and semiconductor substrate...

Plating apparatus, plating method and substrate processing apparatus

Wafer cleaning apparatus

Method of and apparatus for cleaning substrate

Revolution member supporting apparatus and semiconductor substrate...