Shinya Yoshimoto

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatuses for flowable gap-fill
- Patent number 12,129,546
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming an electronic structure using reforming gas, syst...
- Patent number 11,908,684
- Issue date Feb 20, 2024
- ASM IP Holding B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an electronic structure using reforming gas, syst...
- Patent number 11,476,109
- Issue date Oct 18, 2022
- ASM IP Holding B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250054753
- Publication date Feb 13, 2025
- ASM IP HOLDING B.V.
- KiHun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUSES FOR FLOWABLE GAP-FILL
- Publication number 20250011927
- Publication date Jan 9, 2025
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20240162037
- Publication date May 16, 2024
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING MATERIAL WITHIN A RECESS
- Publication number 20240060174
- Publication date Feb 22, 2024
- ASM IP HOLDING B.V.
- Makoto Igarashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUSES FOR FLOWABLE GAP FILL
- Publication number 20230399745
- Publication date Dec 14, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER D...
- Publication number 20230335392
- Publication date Oct 19, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20230298885
- Publication date Sep 21, 2023
- ASM IP HOLDING, B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20230005734
- Publication date Jan 5, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APARATUSES FOR FLOWABLE GAP-FILL
- Publication number 20220119944
- Publication date Apr 21, 2022
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20220122841
- Publication date Apr 21, 2022
- ASM IP HOLDING B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20200395209
- Publication date Dec 17, 2020
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS

Shinya Yoshimoto

Person

Patents Grantslast 30 patents

Methods and apparatuses for flowable gap-fill

Method of forming an electronic structure using reforming gas, syst...

Method of forming an electronic structure using reforming gas, syst...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD

METHODS AND APPARATUSES FOR FLOWABLE GAP-FILL

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...

METHOD OF FORMING MATERIAL WITHIN A RECESS

METHODS AND APPARATUSES FOR FLOWABLE GAP FILL

DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER D...

METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...

METHODS AND APARATUSES FOR FLOWABLE GAP-FILL

METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...