Shiono Daiju

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Undercoat agent and method of forming pattern of layer containing b...
- Patent number 9,834,696
- Issue date Dec 5, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of producing structure containing phase-separated structure
- Patent number 9,816,003
- Issue date Nov 14, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Negative resist composition, method of forming resist pattern and c...
- Patent number 9,499,646
- Issue date Nov 22, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,475,088
- Issue date Oct 25, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,442,371
- Issue date Sep 13, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Negative resist composition, method of forming resist pattern, and...
- Patent number 9,366,960
- Issue date Jun 14, 2016
- TOKYO OHA KOGYO CO., LTD.
- Naoki Yamashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming resist pattern and negative tone-development resi...
- Patent number 9,250,531
- Issue date Feb 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,169,421
- Issue date Oct 27, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 9,133,102
- Issue date Sep 15, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming polymeric compound, resist composition and method...
- Patent number 9,023,580
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,023,581
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,012,125
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji Kumada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,986,919
- Issue date Mar 24, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,980,524
- Issue date Mar 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,927,191
- Issue date Jan 6, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,911,928
- Issue date Dec 16, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing block copolymeric compound
- Patent number 8,846,838
- Issue date Sep 30, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition, method of forming resist pattern, and polymeric...
- Patent number 8,778,595
- Issue date Jul 15, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition, method of forming resist pattern and p...
- Patent number 8,771,921
- Issue date Jul 8, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Abe Sho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,742,038
- Issue date Jun 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,735,045
- Issue date May 27, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,685,620
- Issue date Apr 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, and method of forming resist pattern
- Patent number 8,658,343
- Issue date Feb 25, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,642,244
- Issue date Feb 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming resist pattern and negative tone-development resi...
- Patent number 8,632,960
- Issue date Jan 21, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,586,288
- Issue date Nov 19, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,541,529
- Issue date Sep 24, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,501,387
- Issue date Aug 6, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,487,056
- Issue date Jul 16, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,475,997
- Issue date Jul 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...
- Publication number 20160280906
- Publication date Sep 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi KUROSAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND C...
- Publication number 20160259244
- Publication date Sep 8, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki YAMASHITA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING B...
- Publication number 20160257838
- Publication date Sep 8, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro SENZAKI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150205207
- Publication date Jul 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20150192851
- Publication date Jul 9, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
- Publication number 20150118397
- Publication date Apr 30, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150093507
- Publication date Apr 2, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150044371
- Publication date Feb 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Kurosawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20140238954
- Publication date Aug 28, 2014
- TOKYO INSTITUTE OF TECHNOLOGY
- Tasuku Matsumiya
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20140221673
- Publication date Aug 7, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESI...
- Publication number 20140004467
- Publication date Jan 2, 2014
- TOKYO OHKA KOGYO CO., LTD.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING B...
- Publication number 20130243958
- Publication date Sep 19, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
- Publication number 20130157201
- Publication date Jun 20, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD...
- Publication number 20130137049
- Publication date May 30, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju SHIONO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20130115554
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130089819
- Publication date Apr 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...
- Publication number 20130053518
- Publication date Feb 28, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku MATSUMIYA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120329969
- Publication date Dec 27, 2012
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20120308928
- Publication date Dec 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20120208131
- Publication date Aug 16, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20120208128
- Publication date Aug 16, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20120202151
- Publication date Aug 9, 2012
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120196226
- Publication date Aug 2, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shinji Kumada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20120183900
- Publication date Jul 19, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND P...
- Publication number 20120164581
- Publication date Jun 28, 2012
- Abe Sho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition, and method of forming resist pattern
- Publication number 20120148953
- Publication date Jun 14, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
- Publication number 20120100487
- Publication date Apr 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120094236
- Publication date Apr 19, 2012
- Daiju SHIONO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120077125
- Publication date Mar 29, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110311913
- Publication date Dec 22, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Kenta SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shiono Daiju

Person

Patents Grantslast 30 patents

Undercoat agent and method of forming pattern of layer containing b...

Method of producing structure containing phase-separated structure

Negative resist composition, method of forming resist pattern and c...

Method of producing structure containing phase-separated structure,...

Method of producing structure containing phase-separated structure,...

Negative resist composition, method of forming resist pattern, and...

Method of forming resist pattern and negative tone-development resi...

Method of producing structure containing phase-separated structure,...

Resist composition, method of forming resist pattern and polymeric...

Method of forming polymeric compound, resist composition and method...

Resist composition, method of forming resist pattern, polymeric com...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and polymeric...

Positive resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and polymeric...

Resist composition, method of forming resist pattern, polymeric com...

Fluorine-containing block copolymeric compound

Resist composition, method of forming resist pattern, and polymeric...

Negative resist composition, method of forming resist pattern and p...

Resist composition for immersion exposure, method of forming resist...

Positive resist composition, method of forming resist pattern, and...

Resist composition, method of forming resist pattern and polymeric...

Resist composition, and method of forming resist pattern

Resist composition for immersion exposure, method of forming resist...

Method of forming resist pattern and negative tone-development resi...

Method of forming resist pattern

Positive resist composition, method of forming resist pattern, and...

Resist composition for immersion exposure, method of forming resist...

Positive resist composition and method of forming resist pattern

Resist composition for immersion exposure, method of forming resist...

Patents Applicationslast 30 patents

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND C...

UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING B...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESI...

UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING B...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...

METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND P...

Resist composition, and method of forming resist pattern

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN