Shivani Srivastava

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatuses including Finfets having different gate oxide configura...
- Patent number 12,199,094
- Issue date Jan 14, 2025
- Micron Technology, Inc.
- Hyuck Soo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge device
- Patent number 11,811,874
- Issue date Nov 7, 2023
- Micron Technology, Inc.
- Sharmila Velamur
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Edge device
- Patent number 11,323,521
- Issue date May 3, 2022
- Micron Technology, Inc.
- Sharmila Velamur
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Methods of forming semiconductor devices using aspect ratio depende...
- Patent number 10,991,700
- Issue date Apr 27, 2021
- Micron Technology, Inc.
- Song Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices using aspect ratio depende...
- Patent number 10,593,678
- Issue date Mar 17, 2020
- Micron Technology, Inc.
- Song Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM cells and methods of forming silicon dioxide
- Patent number 9,064,692
- Issue date Jun 23, 2015
- Micron Technology, Inc.
- Shivani Srivastava
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MEMORY ARRAY - PERIPHERY INTEGRATION WITH SPLIT BARRIER METAL STACK
- Publication number 20240074161
- Publication date Feb 29, 2024
- Micron Technology, Inc.
- Russell Allen Benson
Information Patent Application
SACRIFICIAL POLYSILICON IN INTEGRATION OF MEMORY ARRAY WITH PERIPHERY
- Publication number 20240074159
- Publication date Feb 29, 2024
- Micron Technology, Inc.
- Shivani Srivastava
Information Patent Application
INTEGRATION OF MEMORY ARRAY WITH PERIPHERY
- Publication number 20240074160
- Publication date Feb 29, 2024
- Micron Technology, Inc.
- Shivani Srivastava
Information Patent Application
METAL SILICIDE IN INTEGRATION OF MEMORY ARRAY WITH PERIPHERY
- Publication number 20240074166
- Publication date Feb 29, 2024
- Micron Technology, Inc.
- Shivani Srivastava
Information Patent Application
THICK GATE OXIDE TRANSISTOR DEVICE AND METHOD
- Publication number 20240055523
- Publication date Feb 15, 2024
- Micron Technology, Inc.
- Bingwu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY DEVICE ISOLATION STRUCTURE AND METHOD
- Publication number 20230335582
- Publication date Oct 19, 2023
- Micron Technology, Inc.
- Shivani Srivastava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFETS HAVING VARIOUS DIFFERENT THICKNESSES OF GATE OXIDES AND REL...
- Publication number 20230141716
- Publication date May 11, 2023
- Micron Technology, Inc.
- Hyuck Soo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE DEVICE
- Publication number 20220329657
- Publication date Oct 13, 2022
- Micron Technology, Inc.
- Sharmila Velamur
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR DEVICES USING ASPECT RATIO DEPENDE...
- Publication number 20200185389
- Publication date Jun 11, 2020
- Micron Technology, Inc.
- Song Guo
- G11 - INFORMATION STORAGE
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR DEVICES USING ASPECT RATIO DEPENDE...
- Publication number 20200066730
- Publication date Feb 27, 2020
- Micron Technology, Inc.
- Song Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM Cells and Methods of Forming Silicon Dioxide
- Publication number 20150279694
- Publication date Oct 1, 2015
- Micron Technology, Inc.
- Shivani Srivastava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM Cells and Methods of Forming Silicon Dioxide
- Publication number 20130277723
- Publication date Oct 24, 2013
- Micron Technology, Inc.
- Shivani Srivastava
- H01 - BASIC ELECTRIC ELEMENTS

Shivani Srivastava

Person

Patents Grantslast 30 patents

Apparatuses including Finfets having different gate oxide configura...

Edge device

Edge device

Methods of forming semiconductor devices using aspect ratio depende...

Methods of forming semiconductor devices using aspect ratio depende...

DRAM cells and methods of forming silicon dioxide

Patents Applicationslast 30 patents

MEMORY ARRAY - PERIPHERY INTEGRATION WITH SPLIT BARRIER METAL STACK

SACRIFICIAL POLYSILICON IN INTEGRATION OF MEMORY ARRAY WITH PERIPHERY

INTEGRATION OF MEMORY ARRAY WITH PERIPHERY

METAL SILICIDE IN INTEGRATION OF MEMORY ARRAY WITH PERIPHERY

THICK GATE OXIDE TRANSISTOR DEVICE AND METHOD

MEMORY DEVICE ISOLATION STRUCTURE AND METHOD

FINFETS HAVING VARIOUS DIFFERENT THICKNESSES OF GATE OXIDES AND REL...

EDGE DEVICE

METHODS OF FORMING SEMICONDUCTOR DEVICES USING ASPECT RATIO DEPENDE...

METHODS OF FORMING SEMICONDUCTOR DEVICES USING ASPECT RATIO DEPENDE...

DRAM Cells and Methods of Forming Silicon Dioxide

DRAM Cells and Methods of Forming Silicon Dioxide