Shiwen Li

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Kawasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Projection exposure apparatus and method
- Patent number 6,639,732
- Issue date Oct 28, 2003
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Stage device and exposure apparatus
- Patent number 6,417,914
- Issue date Jul 9, 2002
- Nikon Corporation
- Shiwen Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method
- Patent number 6,195,213
- Issue date Feb 27, 2001
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Charged-particle-beam microlithography systems that detect and offs...
- Publication number 20040113101
- Publication date Jun 17, 2004
- NIKON CORPORATION
- Shiwen Li
- B82 - NANO-TECHNOLOGY
Information Patent Application
Projection exposure apparatus and method
- Publication number 20030137749
- Publication date Jul 24, 2003
- NIKON CORPORATION
- Yasuhiro Omura
- G02 - OPTICS