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Shiyu Liu

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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    • Publication number 20230176468
    • Publication date Jun 8, 2023
    • Applied Materials, Inc.
    • Shuwei Liu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    • Publication number 20220350233
    • Publication date Nov 3, 2022
    • Applied Materials, Inc.
    • Shuwei Liu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Extreme Ultraviolet Mask Blank Structure
    • Publication number 20220252971
    • Publication date Aug 11, 2022
    • Applied Materials, Inc.
    • Shuwei Liu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    • Publication number 20220236634
    • Publication date Jul 28, 2022
    • Applied Materials, Inc.
    • Shuwei Liu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Extreme Ultraviolet Mask Absorber Materials
    • Publication number 20220221783
    • Publication date Jul 14, 2022
    • Applied Materials, Inc.
    • Shiyu Liu
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    EUV Mask Blank Absorber Defect Reduction
    • Publication number 20220187696
    • Publication date Jun 16, 2022
    • Applied Materials, Inc.
    • Binni Varghese
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    • Publication number 20220107556
    • Publication date Apr 7, 2022
    • Applied Materials, Inc.
    • Shuwei Liu
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    • Publication number 20220011663
    • Publication date Jan 13, 2022
    • Applied Materials, Inc.
    • Shuwei Liu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
    • Publication number 20210341828
    • Publication date Nov 4, 2021
    • Applied Materials, Inc.
    • Shiyu Liu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Extreme Ultraviolet Mask Absorber Materials
    • Publication number 20210302826
    • Publication date Sep 30, 2021
    • Applied Materials, Inc.
    • Shuwei Liu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Extreme Ultraviolet Mask Absorber Materials
    • Publication number 20210232042
    • Publication date Jul 29, 2021
    • Applied Materials, Inc.
    • Shuwei Liu
    • C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
  • Information Patent Application

    EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS
    • Publication number 20210124252
    • Publication date Apr 29, 2021
    • Applied Materials, Inc.
    • Wen Xiao
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Physical Vapor Deposition Chamber Cleaning Processes
    • Publication number 20210032742
    • Publication date Feb 4, 2021
    • Applied Materials, Inc.
    • Vibhu Jindal
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...