Shizu FUKUZUMI

Person

Chiyoda-ku, Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor element mounting structure, and combination of semico...
- Patent number 11,444,054
- Issue date Sep 13, 2022
- SHOWA DENKO MATERIALS CO., LTD.
- Hitoshi Onozeki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive element, laminate, permanent mask resist, method for...
- Patent number 11,054,744
- Issue date Jul 6, 2021
- SHOWA DENKO MATERIALS CO., LTD.
- Toshimasa Nagoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
- Publication number 20240347436
- Publication date Oct 17, 2024
- Resonac Corporation
- Tomoaki SHIBATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, CLEANING DEVICE, CLE...
- Publication number 20240321818
- Publication date Sep 26, 2024
- Resonac Corporation
- Toshiaki SHIRASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE...
- Publication number 20240170475
- Publication date May 23, 2024
- Resonac Corporation
- Shizu FUKUZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, IN...
- Publication number 20240170447
- Publication date May 23, 2024
- Tomoaki SHIBATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRODUCTION METHOD FOR SEMICONDUCTOR PACKAGES
- Publication number 20230207334
- Publication date Jun 29, 2023
- Shizu FUKUZUMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ELEMENT MOUNTING STRUCTURE, AND COMBINATION OF SEMICO...
- Publication number 20200273837
- Publication date Aug 27, 2020
- Hitachi Chemical Company, Ltd.
- Hitoshi ONOZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE ELEMENT, LAMINATE, PERMANENT MASK RESIST, METHOD FOR...
- Publication number 20170045817
- Publication date Feb 16, 2017
- Hitachi Chemical Company, Ltd.
- Toshimasa NAGOSHI
- H01 - BASIC ELECTRIC ELEMENTS

Shizu FUKUZUMI

Person

Patents Grantslast 30 patents

Semiconductor element mounting structure, and combination of semico...

Photosensitive element, laminate, permanent mask resist, method for...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, CLEANING DEVICE, CLE...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, IN...

PRODUCTION METHOD FOR SEMICONDUCTOR PACKAGES

SEMICONDUCTOR ELEMENT MOUNTING STRUCTURE, AND COMBINATION OF SEMICO...

PHOTOSENSITIVE ELEMENT, LAMINATE, PERMANENT MASK RESIST, METHOD FOR...