Sho Abe

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,005,872
- Issue date Apr 14, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming resist pattern and negative resist composition
- Patent number 8,859,187
- Issue date Oct 14, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern and negative tone-development resi...
- Patent number 8,632,960
- Issue date Jan 21, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,541,157
- Issue date Sep 24, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist composition, method of forming resist pattern and p...
- Patent number 8,404,426
- Issue date Mar 26, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Sho Abe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming resist pattern
- Patent number 8,236,483
- Issue date Aug 7, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition for immersion exposure and method of fo...
- Patent number 8,039,199
- Issue date Oct 18, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Sho Abe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,034,536
- Issue date Oct 11, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer compound, resist composition and method of forming resist p...
- Patent number 8,021,824
- Issue date Sep 20, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition and method of forming resist pattern
- Patent number 7,598,017
- Issue date Oct 6, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120214101
- Publication date Aug 23, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming resist pattern and negative tone-development resi...
- Publication number 20110262864
- Publication date Oct 27, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST P...
- Publication number 20100081080
- Publication date Apr 1, 2010
- Jun Iwashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20100081088
- Publication date Apr 1, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya KAWAUE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20100035192
- Publication date Feb 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method of forming resist pattern and p...
- Publication number 20100035178
- Publication date Feb 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Sho Abe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition and method of forming resist pattern
- Publication number 20090297980
- Publication date Dec 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND NEGATIVE RESIST COMPOSITION
- Publication number 20090191478
- Publication date Jul 30, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090111054
- Publication date Apr 30, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Method of forming resist pattern and negative resist composition

Method of forming resist pattern and negative tone-development resi...

Resist composition, method of forming resist pattern, compound and...

Negative resist composition, method of forming resist pattern and p...

Method of forming resist pattern

Negative resist composition for immersion exposure and method of fo...

Resist composition and method of forming resist pattern

Polymer compound, resist composition and method of forming resist p...

Negative resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Method of forming resist pattern and negative tone-development resi...

POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST P...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

METHOD OF FORMING RESIST PATTERN

Negative resist composition, method of forming resist pattern and p...

Resist composition and method of forming resist pattern

METHOD OF FORMING RESIST PATTERN AND NEGATIVE RESIST COMPOSITION

NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN