Shogo Matsumaru

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,324,377
- Issue date Jun 18, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 10,101,658
- Issue date Oct 16, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, metal oxide film-forming material and metho...
- Patent number 8,349,543
- Issue date Jan 8, 2013
- Tokyo Ohka Kogyo Co. Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, dissolution inhibitor, positive type resist composition,...
- Patent number 8,304,163
- Issue date Nov 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Film-forming material and method of forming pattern
- Patent number 8,101,013
- Issue date Jan 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo MatsuMaru
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,034,536
- Issue date Oct 11, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Compound, dissolution inhibitor, positive type resist composition,...
- Patent number 7,943,284
- Issue date May 17, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern coating material and pattern forming method
- Patent number 7,932,013
- Issue date Apr 26, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, positive resist composition and resist pattern fo...
- Patent number 7,851,127
- Issue date Dec 14, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin for photoresist composition, photoresist composition and meth...
- Patent number 7,829,259
- Issue date Nov 9, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin for photoresist composition, photoresist composition and meth...
- Patent number 7,592,123
- Issue date Sep 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, acid generator, positive resist composition, and...
- Patent number 7,482,108
- Issue date Jan 27, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20160363860
- Publication date Dec 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Taku HIRAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20160209745
- Publication date Jul 21, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Taku HIRAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...
- Publication number 20110091810
- Publication date Apr 21, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR RESIST PAT...
- Publication number 20100028799
- Publication date Feb 4, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiromitsu Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, METAL OXIDE FILM-FORMING MATERIAL AND METHO...
- Publication number 20100003622
- Publication date Jan 7, 2010
- Tokyo Ohka Kogy Co., Ltd
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and method of forming resist pattern
- Publication number 20090297980
- Publication date Dec 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FO...
- Publication number 20090162784
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METH...
- Publication number 20090142700
- Publication date Jun 4, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN
- Publication number 20090134119
- Publication date May 28, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...
- Publication number 20090081580
- Publication date Mar 26, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN COATING MATERIAL AND PATTERN FORMING METHOD
- Publication number 20090029284
- Publication date Jan 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer Compound, Acid Generator, Positive Resist Composition, and...
- Publication number 20070231708
- Publication date Oct 4, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resin for photoresist composition, photoresist composition and meth...
- Publication number 20070065748
- Publication date Mar 22, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shogo Matsumaru

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Pattern-forming method, metal oxide film-forming material and metho...

Compound, dissolution inhibitor, positive type resist composition,...

Film-forming material and method of forming pattern

Resist composition and method of forming resist pattern

Compound, dissolution inhibitor, positive type resist composition,...

Pattern coating material and pattern forming method

Polymer compound, positive resist composition and resist pattern fo...

Resin for photoresist composition, photoresist composition and meth...

Resin for photoresist composition, photoresist composition and meth...

Polymer compound, acid generator, positive resist composition, and...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...

RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR RESIST PAT...

PATTERN-FORMING METHOD, METAL OXIDE FILM-FORMING MATERIAL AND METHO...

Resist composition and method of forming resist pattern

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FO...

RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METH...

FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN

COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...

PATTERN COATING MATERIAL AND PATTERN FORMING METHOD

Polymer Compound, Acid Generator, Positive Resist Composition, and...

Resin for photoresist composition, photoresist composition and meth...