Shoichi Takamizawa

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Annaka-shi, Gunma, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing nitride semiconductor self-supporting subs...
- Patent number 9,127,376
- Issue date Sep 8, 2015
- Shin-Etsu Handotai Co., Ltd.
- Shoichi Takamizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon single crystal wafer process apparatus, silicon single crys...
- Patent number 7,214,271
- Issue date May 8, 2007
- Shin-Etsu Handotai Co., Ltd.
- Ryuji Kono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon wafer having plasma CVD gettering layer with components/com...
- Patent number 5,998,283
- Issue date Dec 7, 1999
- Shin-Etsu Handotai Co., Ltd.
- Shoichi Takamizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing mirror-polished silicon wafers, and apparat...
- Patent number 5,993,493
- Issue date Nov 30, 1999
- Shin-Etsu Handotai Co., Ltd.
- Shoichi Takamizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon wafer including amorphous silicon layer formed by PCVD and...
- Patent number 5,970,365
- Issue date Oct 19, 1999
- Shin-Etsu Handotai., Ltd.
- Shoichi Takamizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor wafers
- Patent number 5,899,744
- Issue date May 4, 1999
- Shin-Etsu Handotai Co., Ltd.
- Kohei Toyama
- B28 - WORKING CEMENT, CLAY, OR STONE

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR SELF-SUPPORTING SUBS...
- Publication number 20100001376
- Publication date Jan 7, 2010
- Shin-Etsu Handotai Co., Ltd.
- Shoichi Takamizawa
- C30 - CRYSTAL GROWTH
Information Patent Application
Silicon monocrystal wafer processing device, and method of manufact...
- Publication number 20040241992
- Publication date Dec 2, 2004
- Ryuji Kono
- C30 - CRYSTAL GROWTH