Shoichiro Matsuyama

Person

Yamanashi-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 12,125,679
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, focus ring, support base, plasma processing ap...
- Patent number 12,046,457
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,830,751
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrostatic attraction method, and e...
- Patent number 11,764,038
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring and substrate processing apparatus
- Patent number 11,728,144
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting stage, substrate processing device, and edge ring
- Patent number 11,538,668
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,004,717
- Issue date May 11, 2021
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrostatic attraction method, and e...
- Patent number 10,879,050
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 9,390,943
- Issue date Jul 12, 2016
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 9,230,824
- Issue date Jan 5, 2016
- Tokyo Electron Limited
- Wataru Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode and plasma processing apparatus
- Patent number 8,920,598
- Issue date Dec 30, 2014
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching unit
- Patent number 8,840,753
- Issue date Sep 23, 2014
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Table for use in plasma processing system and plasma processing system
- Patent number 8,741,098
- Issue date Jun 3, 2014
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper electrode and plasma processing apparatus
- Patent number 8,636,872
- Issue date Jan 28, 2014
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 8,293,655
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and substrate processing apparatus having same
- Patent number 8,295,026
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device
- Patent number 8,284,538
- Issue date Oct 9, 2012
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrode plate for plasma processing...
- Patent number 7,922,862
- Issue date Apr 12, 2011
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive coupling plasma processing apparatus
- Patent number 7,767,055
- Issue date Aug 3, 2010
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching unit
- Patent number 7,625,494
- Issue date Dec 1, 2009
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 7,619,870
- Issue date Nov 17, 2009
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrode plate for plasma processing...
- Patent number 7,585,386
- Issue date Sep 8, 2009
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for plasma-etching organic material film
- Patent number 7,419,613
- Issue date Sep 2, 2008
- Tokyo Electron Limited
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...
- Publication number 20240347322
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT
- Publication number 20240087857
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQU...
- Publication number 20230369019
- Publication date Nov 16, 2023
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATTRACTING METHOD
- Publication number 20230238225
- Publication date Jul 27, 2023
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20230094655
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSI...
- Publication number 20220375731
- Publication date Nov 24, 2022
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...
- Publication number 20210366694
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, SEMICONDUCTIVE MEMBER, AND SEMICONDUCT...
- Publication number 20210280397
- Publication date Sep 9, 2021
- TOKYO ELECTRON LIMITED
- Yoichi KUROSAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210233794
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210175051
- Publication date Jun 10, 2021
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATTRACTING METHOD, MOUNTING TABLE, AND PLASMA PROCESSING APPARATUS
- Publication number 20210126559
- Publication date Apr 29, 2021
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND E...
- Publication number 20210074522
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mounting Stage, Substrate Processing Device, and Edge Ring
- Publication number 20200194239
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190088523
- Publication date Mar 21, 2019
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND E...
- Publication number 20180350565
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20150179466
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Wataru TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20140284308
- Publication date Sep 25, 2014
- KABUSHIKI KAISHA TOSHIBA
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20130220547
- Publication date Aug 29, 2013
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20120206033
- Publication date Aug 16, 2012
- TOKYO ELECTRON LIMITED
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20110226420
- Publication date Sep 22, 2011
- TOKYO ELECTRON LIMITED
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TABLE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS
- Publication number 20110192540
- Publication date Aug 11, 2011
- TOKYO ELECTRON LIMITED
- Masakazu Higuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING...
- Publication number 20110162802
- Publication date Jul 7, 2011
- Katsuya OKUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110056912
- Publication date Mar 10, 2011
- TOKYO ELECTRON LIMITED
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS HAVING SAME
- Publication number 20100118464
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- Shoichiro MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD
- Publication number 20100081287
- Publication date Apr 1, 2010
- TOKYO ELECTRON LIMITED
- Masanobu HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD
- Publication number 20100068888
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD
- Publication number 20100062607
- Publication date Mar 11, 2010
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING UNIT
- Publication number 20100024983
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING...
- Publication number 20090285998
- Publication date Nov 19, 2009
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READAB...
- Publication number 20090203219
- Publication date Aug 13, 2009
- TOKYO ELECTRON LIMITED
- Shoichiro Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS

Shoichiro Matsuyama

Person

Patents Grantslast 30 patents

Plasma processing apparatus and processing method

Electrostatic chuck, focus ring, support base, plasma processing ap...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus, electrostatic attraction method, and e...

Edge ring and substrate processing apparatus

Mounting stage, substrate processing device, and edge ring

Plasma processing apparatus and plasma processing method

Plasma processing apparatus, electrostatic attraction method, and e...

Substrate processing apparatus

Method of manufacturing semiconductor device

Electrode and plasma processing apparatus

Plasma etching unit

Table for use in plasma processing system and plasma processing system

Upper electrode and plasma processing apparatus

Dry etching method

Electrostatic chuck and substrate processing apparatus having same

Electrostatic chuck device

Plasma processing apparatus, electrode plate for plasma processing...

Capacitive coupling plasma processing apparatus

Plasma etching method and plasma etching unit

Electrostatic chuck

Plasma processing apparatus, electrode plate for plasma processing...

Method and device for plasma-etching organic material film

Patents Applicationslast 30 patents

ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...

PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT

PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQU...

ATTRACTING METHOD

PLASMA PROCESSING APPARATUS AND PROCESSING METHOD

SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSI...

ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT BASE, PLASMA PROCESSING AP...

PLASMA PROCESSING APPARATUS, SEMICONDUCTIVE MEMBER, AND SEMICONDUCT...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

EDGE RING AND SUBSTRATE PROCESSING APPARATUS

ATTRACTING METHOD, MOUNTING TABLE, AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND E...

Mounting Stage, Substrate Processing Device, and Edge Ring

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, ELECTROSTATIC ATTRACTION METHOD, AND E...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

SUBSTRATE PROCESSING APPARATUS

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

ELECTRODE AND PLASMA PROCESSING APPARATUS

TABLE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS HAVING SAME

DRY ETCHING METHOD

DRY ETCHING METHOD

DRY ETCHING METHOD

PLASMA ETCHING UNIT

PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING...

PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READAB...