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Shoichiro Yasunami

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  • Shizuoka, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Positive resist composition
    • Patent number 8,080,362
    • Issue date Dec 20, 2011
    • FUJIFILM Corporation
    • Koji Shirakawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Negative resist composition
    • Patent number 7,432,034
    • Issue date Oct 7, 2008
    • FUJIFILM Corporation
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive resist composition
    • Patent number 7,361,446
    • Issue date Apr 22, 2008
    • FUJIFILM Corporation
    • Koji Shirakawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive resist composition and pattern-forming method using the same
    • Patent number 7,351,515
    • Issue date Apr 1, 2008
    • FUJIFILM Corporation
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Positive resist composition and process for forming pattern using t...
    • Patent number 7,332,258
    • Issue date Feb 19, 2008
    • FUJIFILM Corporation
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Positive working resist composition
    • Patent number 7,326,513
    • Issue date Feb 5, 2008
    • FUJIFILM Corporation
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive resist composition
    • Patent number 7,232,640
    • Issue date Jun 19, 2007
    • FUJIFILM Corporation
    • Kazuyoshi Mizutani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive resist composition
    • Patent number 7,217,493
    • Issue date May 15, 2007
    • FUJIFILM Corporation
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Positive resist composition
    • Patent number 7,105,273
    • Issue date Sep 12, 2006
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Negative resist composition
    • Patent number 7,090,960
    • Issue date Aug 15, 2006
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist composition
    • Patent number 7,083,892
    • Issue date Aug 1, 2006
    • Fuji Photo Film Co., Ltd.
    • Hyou Takahashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Resist composition
    • Patent number 6,902,862
    • Issue date Jun 7, 2005
    • Fuji Photo Film Co., Ltd.
    • Hyou Takahashi
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Negative-working resist composition for electron beams or x-rays
    • Patent number 6,887,647
    • Issue date May 3, 2005
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Positive resist composition
    • Patent number 6,852,467
    • Issue date Feb 8, 2005
    • Fuji Photo Film Co., Ltd.
    • Toshiaki Aoai
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Lower layer resist composition for silicon-containing two-layer resist
    • Patent number 6,777,161
    • Issue date Aug 17, 2004
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Negative resist composition
    • Patent number 6,773,862
    • Issue date Aug 10, 2004
    • Fuji Photo Film Co., Ltd.
    • Koji Shirakawa
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Negative resist composition
    • Patent number 6,746,813
    • Issue date Jun 8, 2004
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Positive resist laminate
    • Patent number 6,696,219
    • Issue date Feb 24, 2004
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive-working photoresist composition
    • Patent number 6,589,705
    • Issue date Jul 8, 2003
    • Fuji Photo Film Co., Ltd.
    • Kenichiro Sato
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive photoresist composition
    • Patent number 6,555,289
    • Issue date Apr 29, 2003
    • Fuji Photo Film Co., Ltd.
    • Tomoya Sasaki
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Positive photoresist composition
    • Patent number 6,479,213
    • Issue date Nov 12, 2002
    • Fuji Photo Film Co., Ltd.
    • Kazuyoshi Mizutani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive photoresist composition
    • Patent number 6,387,590
    • Issue date May 14, 2002
    • Fuji Photo Film Co., Ltd.
    • Kazuyoshi Mizutani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Nonaqueous secondary battery and method for preparing same
    • Patent number 6,371,995
    • Issue date Apr 16, 2002
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Positive photoresist composition
    • Patent number 6,346,363
    • Issue date Feb 12, 2002
    • Fuji Photo Film Co., Ltd.
    • Kazuyoshi Mizutani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive photoresist composition comprising a polysiloxane
    • Patent number 6,296,985
    • Issue date Oct 2, 2001
    • Fuji Photo Film Co., Ltd.
    • Kazuyoshi Mizutani
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Positive silicone-containing photosensitive composition
    • Patent number 6,270,941
    • Issue date Aug 7, 2001
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Nonaqueous secondary battery having multiple-layered negative elect...
    • Patent number 6,001,139
    • Issue date Dec 14, 1999
    • Fuji Photo Film Co., Ltd.
    • Hiroyuki Asanuma
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Non-aqueous secondary battery
    • Patent number 5,707,756
    • Issue date Jan 13, 1998
    • Fuji Photo Film Co., Ltd.
    • Noriyuki Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Non-aqueous secondary battery
    • Patent number 5,686,203
    • Issue date Nov 11, 1997
    • Fuji Photo Film Co., Ltd.
    • Yoshio Idota
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Nonaqueous secondary battery
    • Patent number 5,350,648
    • Issue date Sep 27, 1994
    • Fuji Photo Film Co., Ltd.
    • Yoshikatsu Kagawa
    • D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING

Patents Applicationslast 30 patents

  • Information Patent Application

    POSITIVE RESIST COMPOSITION
    • Publication number 20080096130
    • Publication date Apr 24, 2008
    • FUJIFILM Corporation
    • Koji Shirakawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    POSITIVE RESIST COMPOSITION
    • Publication number 20070128547
    • Publication date Jun 7, 2007
    • Fuji Photo Film Co., Ltd.
    • Kazuyoshi Mizutani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Resist composition
    • Publication number 20060147837
    • Publication date Jul 6, 2006
    • Fuji Photo Film Co., Ltd.
    • Hyou Takahashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Positive resist composition and process for forming pattern using t...
    • Publication number 20050064327
    • Publication date Mar 24, 2005
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Positive resist composition and pattern-forming method using the same
    • Publication number 20050064326
    • Publication date Mar 24, 2005
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Positive resist composition
    • Publication number 20040229161
    • Publication date Nov 18, 2004
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Positive resist composition
    • Publication number 20040197702
    • Publication date Oct 7, 2004
    • Fuji Photo Film Co., Ltd.
    • Koji Shirakawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Positive working resist composition
    • Publication number 20040175654
    • Publication date Sep 9, 2004
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Resist composition
    • Publication number 20040058272
    • Publication date Mar 25, 2004
    • Fuji Photo Film Co., Ltd.
    • Hyou Takahashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Resist composition
    • Publication number 20040053160
    • Publication date Mar 18, 2004
    • Fuji Photo Film Co., Ltd.
    • Hyou Takahashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Positive resist composition
    • Publication number 20040043323
    • Publication date Mar 4, 2004
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Negative resist composition
    • Publication number 20040033441
    • Publication date Feb 19, 2004
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Resist composition
    • Publication number 20040005513
    • Publication date Jan 8, 2004
    • Fuji Photo Film Co., Ltd.
    • Hyou Takahashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Negative resist composition
    • Publication number 20030203305
    • Publication date Oct 30, 2003
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Negative resist composition
    • Publication number 20030165776
    • Publication date Sep 4, 2003
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Negative resist composition
    • Publication number 20030165772
    • Publication date Sep 4, 2003
    • Fuji Photo Film Co., Ltd.
    • Hyou Takahashi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Negative resist composition
    • Publication number 20030124456
    • Publication date Jul 3, 2003
    • Fuji Photo Film Co., Ltd.
    • Koji Shirakawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Lower layer resist composition for silicon-containing two-layer resist
    • Publication number 20030059552
    • Publication date Mar 27, 2003
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Application

    Resist composition
    • Publication number 20030054287
    • Publication date Mar 20, 2003
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Negative-working resist composition for electron beams or X-rays
    • Publication number 20020192592
    • Publication date Dec 19, 2002
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Application

    Positive photoresist composition
    • Publication number 20020106581
    • Publication date Aug 8, 2002
    • Fuji Photo Film Co., Ltd.
    • Kazuyoshi Mizutani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Positive resist composition
    • Publication number 20020061464
    • Publication date May 23, 2002
    • Fuji Photo Film Co., Ltd.
    • Toshiaki Aoai
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Application

    Positive photoresist composition
    • Publication number 20020048720
    • Publication date Apr 25, 2002
    • Tomoya Sasaki
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Application

    Positive resist laminate
    • Publication number 20020028409
    • Publication date Mar 7, 2002
    • Fuji Photo Film Co., Ltd.
    • Shoichiro Yasunami
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Positive photoresist composition
    • Publication number 20010038967
    • Publication date Nov 8, 2001
    • Kazuyoshi Mizutani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY