Shota ISHIBASHI

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and apparatus
- Patent number 12,027,353
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shota Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus
- Patent number 12,014,911
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Shota Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for performing sputtering process
- Patent number 11,851,750
- Issue date Dec 26, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern forming method
- Patent number 11,776,817
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Shota Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and film forming method
- Patent number 11,742,190
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming system, magnetization characteristic measuring device,...
- Patent number 11,715,671
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Hiroaki Chihaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus and sputtering method
- Patent number 11,705,315
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Shota Ishibashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and method
- Patent number 11,479,848
- Issue date Oct 25, 2022
- Tokyo Electron Limited
- Shota Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPAR...
- Publication number 20240021423
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Yasuhiko KOJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS AND CONTROL METHOD
- Publication number 20230175114
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230175112
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS AND SPUTTERING METHOD
- Publication number 20220148863
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING SYSTEM, AND FILM FORMING METHOD
- Publication number 20220081757
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20220051900
- Publication date Feb 17, 2022
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS AND FILM FORMING METHOD
- Publication number 20220044920
- Publication date Feb 10, 2022
- TOKYO ELECTRON LIMITED
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PERFORMING SPUTTERING PROCESS
- Publication number 20220025511
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- G02 - OPTICS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20210305032
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20210296103
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND METHOD
- Publication number 20210207261
- Publication date Jul 8, 2021
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING SYSTEM, MAGNETIZATION CHARACTERISTIC MEASURING DEVICE,...
- Publication number 20210082777
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Hiroaki CHIHAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20200227273
- Publication date Jul 16, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki TOSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shota ISHIBASHI

Person

Patents Grantslast 30 patents

Substrate processing method and apparatus

Sputtering apparatus

Apparatus and method for performing sputtering process

Pattern forming method

Sputtering apparatus and film forming method

Film forming system, magnetization characteristic measuring device,...

Sputtering apparatus and sputtering method

Film forming apparatus and method

Patents Applicationslast 30 patents

FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPAR...

SPUTTERING APPARATUS AND CONTROL METHOD

FILM FORMING METHOD AND FILM FORMING APPARATUS

SPUTTERING APPARATUS AND SPUTTERING METHOD

FILM FORMING APPARATUS, FILM FORMING SYSTEM, AND FILM FORMING METHOD

PATTERN FORMING METHOD

SPUTTERING APPARATUS AND FILM FORMING METHOD

APPARATUS AND METHOD FOR PERFORMING SPUTTERING PROCESS

SUBSTRATE PROCESSING METHOD AND APPARATUS

SPUTTERING APPARATUS

FILM FORMING APPARATUS AND METHOD

FILM FORMING SYSTEM, MAGNETIZATION CHARACTERISTIC MEASURING DEVICE,...

HARD MASK AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD