Shreeram Jyoti Dash

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING
- Publication number 20240162007
- Publication date May 16, 2024
- Applied Materials, Inc.
- Deyang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240145215
- Publication date May 2, 2024
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE COMPENSATION FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240055244
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Analyzing and Intelligently Collecting Sens...
- Publication number 20230282465
- Publication date Sep 7, 2023
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS